The present disclosure relates to a crosslinking ligand, a method for patterning a nanoparticle layer, a quantum dot light-emitting device, and a display device. The crosslinking ligand includes: at least two coordinating groups, at least one photosensitive degradation group and at least one thermosensitive crosslinking group, both of which are connected between the coordinating groups. The method for patterning the nanoparticle layer includes: forming a nanoparticle layer on a substrate; attaching a solution containing the crosslinking ligand to the substrate, to allow the crosslinking ligand to form a crosslinking between nanoparticles; performing a light irradiation treatment on a preset region of the substrate; removing the nanoparticles in the preset region; and performing a heat treatment on the substrate. The present disclosure does not need to design the structure of the ligand of the nanoparticles, and can form a nanoparticle layer with high resolution, simple process and high realizability.

The present disclosure relates to a crosslinking ligand, a method for patterning a nanoparticle layer, a quantum dot light-emitting device, and a display device. The crosslinking ligand includes: at least two coordinating groups, at least one photosensitive degradation group and at least one thermosensitive crosslinking group, both of which are connected between the coordinating groups. The method for patterning the nanoparticle layer includes: forming a nanoparticle layer on a substrate; attaching a solution containing the crosslinking ligand to the substrate, to allow the crosslinking ligand to form a crosslinking between nanoparticles; performing a light irradiation treatment on a preset region of the substrate; removing the nanoparticles in the preset region; and performing a heat treatment on the substrate. The present disclosure does not need to design the structure of the ligand of the nanoparticles, and can form a nanoparticle layer with high resolution, simple process and high realizability.

Provided is a method for producing (alkyl)arene compounds represented by Formulae 3-1, 3-2, and 3-3 by the Friedel-Crafts alkylation reaction of alkyl halide compounds and arene compounds using organic phosphine compounds as a catalyst. ##STR00001##

Provided is a method for producing (alkyl)arene compounds represented by Formulae 3-1, 3-2, and 3-3 by the Friedel-Crafts alkylation reaction of alkyl halide compounds and arene compounds using organic phosphine compounds as a catalyst. ##STR00001##

This heat-sensitive recording material is configured to contain, as a color-developing compound, at least one compound represented by one of formulas (1)-(3):

##STR00001##

This heat-sensitive recording material is configured to contain, as a color-developing compound, at least one compound represented by one of formulas (1)-(3):

##STR00001##

In one aspect, the invention provides a method of promoting a carbon-sulfur bond forming reaction. In certain embodiments, the reaction comprises cross-coupling of a(n) (hetero)aryl halide with a thiol to form the carbon-sulfur bond, wherein the method is promoted by light irradiation in the absence of a photocatalyst. In other embodiments, the cross-coupling reaction can be promoted through visible light irradiation, including sunlight.

In one aspect, the invention provides a method of promoting a carbon-sulfur bond forming reaction. In certain embodiments, the reaction comprises cross-coupling of a(n) (hetero)aryl halide with a thiol to form the carbon-sulfur bond, wherein the method is promoted by light irradiation in the absence of a photocatalyst. In other embodiments, the cross-coupling reaction can be promoted through visible light irradiation, including sunlight.

The present invention relates to a process of a cis/trans isomerization of an unsaturated compound A being selected from the group consisting of unsaturated ketones, unsaturated ketals, unsaturated aldehydes, unsaturated acetals, unsaturated carboxylic acids, esters of an unsaturated carboxylic acid and amides of an unsaturated carboxylic acid using polythiol as cis/trans isomerization catalyst. It has been observed that the isomerization is very efficient and fast.

The present invention relates to a process of a cis/trans isomerization of an unsaturated compound A being selected from the group consisting of unsaturated ketones, unsaturated ketals, unsaturated aldehydes, unsaturated acetals, unsaturated carboxylic acids, esters of an unsaturated carboxylic acid and amides of an unsaturated carboxylic acid using polythiol as cis/trans isomerization catalyst. It has been observed that the isomerization is very efficient and fast.