C07C321/30

Polyarylene sulfide resin and manufacturing method therefor, poly(arylene sulfonium salt) and manufacturing method therefor, and sulfoxide

The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: reacting a sulfoxide represented by the following formula (1) with a particular aromatic compound to obtain a poly(arylenesulfonium salt) having a particular constitutional unit; and dealkylating or dearylating the poly(arylenesulfonium salt) to obtain a polyarylene sulfide resin having a particular constitutional unit, ##STR00001## wherein R.sup.1 represents an alkyl group having 1 to 10 carbon atoms, etc.; Ar.sup.1 and Ar.sup.2 each independently represent an arylene group optionally having a substituent; and Z represents a direct bond, etc.

Polyarylene sulfide resin and manufacturing method therefor, poly(arylene sulfonium salt) and manufacturing method therefor, and sulfoxide

The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: reacting a sulfoxide represented by the following formula (1) with a particular aromatic compound to obtain a poly(arylenesulfonium salt) having a particular constitutional unit; and dealkylating or dearylating the poly(arylenesulfonium salt) to obtain a polyarylene sulfide resin having a particular constitutional unit, ##STR00001## wherein R.sup.1 represents an alkyl group having 1 to 10 carbon atoms, etc.; Ar.sup.1 and Ar.sup.2 each independently represent an arylene group optionally having a substituent; and Z represents a direct bond, etc.

PREPARATION METHOD FOR 4-PHENYLTHIO-BENZENETHIOL

The present disclosure discloses a preparation method for 4-phenylthio-benzenethiol. The preparation method comprises the following steps: subjecting phenyl sulfide as a raw material to a halogenation reaction to obtain 4-halophenyl sulfide; subjecting the 4-halophenyl sulfide to a sulfhydrylation reaction to obtain a 4-phenylthio-phenylthiolate; and subjecting the 4-phenylthio-phenylthiolate to acidification. The preparation method of the present disclosure avoids the use of materials such as thiophenol which pollutes the environment, and realizes efficient recycling of the reaction materials, solvents, water and the like. The preparation method of the present disclosure is a green process for the synthesis of 4-phenylthio-phenylthiol without organic waste, waste acid and waste water discharge.

PREPARATION METHOD FOR 4-PHENYLTHIO-BENZENETHIOL

The present disclosure discloses a preparation method for 4-phenylthio-benzenethiol. The preparation method comprises the following steps: subjecting phenyl sulfide as a raw material to a halogenation reaction to obtain 4-halophenyl sulfide; subjecting the 4-halophenyl sulfide to a sulfhydrylation reaction to obtain a 4-phenylthio-phenylthiolate; and subjecting the 4-phenylthio-phenylthiolate to acidification. The preparation method of the present disclosure avoids the use of materials such as thiophenol which pollutes the environment, and realizes efficient recycling of the reaction materials, solvents, water and the like. The preparation method of the present disclosure is a green process for the synthesis of 4-phenylthio-phenylthiol without organic waste, waste acid and waste water discharge.

Dental materials based on low-viscosity radically polymerizable monomers with a high refractive index

Radically polymerizable, difunctional phenylene sulfide according to Formula I ##STR00001##
in which X, Y independently of each other in each case are absent or are O or NR.sup.6, R.sup.1, R.sup.2 independently of each other in each case are H, a linear or branched C.sub.1 to C.sub.10 alkyl radical, OR.sup.7, SR.sup.8, Cl or Br, R.sup.3 is absent or is a C.sub.1-C.sub.10 alkylene radical which can be interrupted by O or S, R.sup.4 is absent or is a C.sub.1-C.sub.10 alkylene radical which can be interrupted by O or S, wherein R.sup.3 and R.sup.4 cannot be absent at the same time, R.sup.5 is H or a C.sub.1-C.sub.5 alkyl radical, R.sup.6, R.sup.7, R.sup.8 independently of each other in each case are H or a linear or branched C.sub.1 to C.sub.10 alkyl radical, a, b, c, d independently of each other in each case are 0 or 1 and e is 1 or 2.

Dental materials based on low-viscosity radically polymerizable monomers with a high refractive index

Radically polymerizable, difunctional phenylene sulfide according to Formula I ##STR00001##
in which X, Y independently of each other in each case are absent or are O or NR.sup.6, R.sup.1, R.sup.2 independently of each other in each case are H, a linear or branched C.sub.1 to C.sub.10 alkyl radical, OR.sup.7, SR.sup.8, Cl or Br, R.sup.3 is absent or is a C.sub.1-C.sub.10 alkylene radical which can be interrupted by O or S, R.sup.4 is absent or is a C.sub.1-C.sub.10 alkylene radical which can be interrupted by O or S, wherein R.sup.3 and R.sup.4 cannot be absent at the same time, R.sup.5 is H or a C.sub.1-C.sub.5 alkyl radical, R.sup.6, R.sup.7, R.sup.8 independently of each other in each case are H or a linear or branched C.sub.1 to C.sub.10 alkyl radical, a, b, c, d independently of each other in each case are 0 or 1 and e is 1 or 2.

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN
20200361843 · 2020-11-19 ·

A compound represented by the following formula (1).

##STR00001##

(In the formula (1), A is a group containing a heteroatom; R.sup.1 is a 2n-valent group having 1 to 30 carbon atoms and optionally having a substituent; R.sup.2 to R.sup.5 are each independently a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a crosslinkable group, a dissociation group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group and the alkoxy group each optionally contain an ether bond, a ketone bond or an ester bond and at least one R.sup.4 and/or at least one R.sup.5 is a hydroxy group and/or a thiol group; m.sup.2 and m.sup.3 are each independently an integer of 0 to 8; m.sup.4 and m.sup.5 are each independently an integer of 0 to 9; n is an integer of 1 to 4; and p.sup.2 to p.sup.5 are each independently an integer of 0 to 2.)

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN
20200361843 · 2020-11-19 ·

A compound represented by the following formula (1).

##STR00001##

(In the formula (1), A is a group containing a heteroatom; R.sup.1 is a 2n-valent group having 1 to 30 carbon atoms and optionally having a substituent; R.sup.2 to R.sup.5 are each independently a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a crosslinkable group, a dissociation group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group and the alkoxy group each optionally contain an ether bond, a ketone bond or an ester bond and at least one R.sup.4 and/or at least one R.sup.5 is a hydroxy group and/or a thiol group; m.sup.2 and m.sup.3 are each independently an integer of 0 to 8; m.sup.4 and m.sup.5 are each independently an integer of 0 to 9; n is an integer of 1 to 4; and p.sup.2 to p.sup.5 are each independently an integer of 0 to 2.)

Method for preparing compound and method for preparing polymer employing the same

A method for preparing a compound and a method for preparing a polymer employing the same are provided. The method for preparing a compound includes reacting a compound having a structure represented by Formula (I) with a compound having a structure represented by Formula (III) in the presence of a compound having a structure represented by Formula (II) to obtain a compound having a structure represented by Formula (IV) ##STR00001##
wherein Ar.sup.1 is substituted or unsubstituted aryl group; X is O, S, or NH; R.sup.1 is independently hydrogen or C.sub.1-6 alkyl group; R.sup.2 is hydroxyl group, C.sub.1-6 alkyl group, phenyl group, or tolyl group; and R.sup.3 is independently C.sub.1-6 alkyl group, C.sub.5-8 cycloalkyl group, or C.sub.2-6 alkoxyalkyl group.

Method for preparing compound and method for preparing polymer employing the same

A method for preparing a compound and a method for preparing a polymer employing the same are provided. The method for preparing a compound includes reacting a compound having a structure represented by Formula (I) with a compound having a structure represented by Formula (III) in the presence of a compound having a structure represented by Formula (II) to obtain a compound having a structure represented by Formula (IV) ##STR00001##
wherein Ar.sup.1 is substituted or unsubstituted aryl group; X is O, S, or NH; R.sup.1 is independently hydrogen or C.sub.1-6 alkyl group; R.sup.2 is hydroxyl group, C.sub.1-6 alkyl group, phenyl group, or tolyl group; and R.sup.3 is independently C.sub.1-6 alkyl group, C.sub.5-8 cycloalkyl group, or C.sub.2-6 alkoxyalkyl group.