The present invention discloses a cobalt compound of formula (I), a process for the preparation and use thereof. The present invention further relates to a pharmaceutical composition and a method inhibition of Tau Aggregation in a subject in need thereof using compound of formula (I).

##STR00001##

The present invention discloses a cobalt compound of formula (I), a process for the preparation and use thereof. The present invention further relates to a pharmaceutical composition and a method inhibition of Tau Aggregation in a subject in need thereof using compound of formula (I).

##STR00001##

It is related to compounds used as autophagy modulators and a method for preparing and using the same, specifically providing a compound of general formula (I), or pharmaceutically acceptable salts thereof, which is a type of autophagy modulators, particularly mammalian ATG8 homologues modulators.

##STR00001##

The present application can provide a phthalonitrile compound and a use thereof. The present application can provide a phthalonitrile compound capable of forming a phthalonitrile resin by self-curing or of serving as a curing agent after being mixed with another phthalonitrile compound, and a use of the phthalonitrile compound. The phthalonitrile compound can form a phthalonitrile resin by rapid self-curing even at a low temperature and does not create any defects resulting from the use of a conventional curing agent. Also, the phthalonitrile compound can be applied as a curing agent after being mixed with another compound, in which case, even if the content of the compound applied as a curing agent increases, the total content of the phthalonitrile resin obtained does not decrease, and thus a resin exhibiting an excellent degree of cure can be provided.

The present application can provide a phthalonitrile compound and a use thereof. The present application can provide a phthalonitrile compound capable of forming a phthalonitrile resin by self-curing or of serving as a curing agent after being mixed with another phthalonitrile compound, and a use of the phthalonitrile compound. The phthalonitrile compound can form a phthalonitrile resin by rapid self-curing even at a low temperature and does not create any defects resulting from the use of a conventional curing agent. Also, the phthalonitrile compound can be applied as a curing agent after being mixed with another compound, in which case, even if the content of the compound applied as a curing agent increases, the total content of the phthalonitrile resin obtained does not decrease, and thus a resin exhibiting an excellent degree of cure can be provided.

A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, M.sup.m+ represents an m-valent organic cation, R.sup.d0 represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of n+p(q2)+5 is satisfied.

##STR00001##

A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, M.sup.m+ represents an m-valent organic cation, R.sup.d0 represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of n+p(q2)+5 is satisfied.

##STR00001##

A resist composition containing a base material component (A) of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, R.sup.bd1 to R.sup.bd3 each independently represent an aryl group which may have a substituent, provided that at least two of R.sup.bd1 to R.sup.bd3 are aryl groups having one or more fluorine atoms as substituents, and at least one of the fluorine atoms of the aryl group is bonded to a carbon atom adjacent to a carbon atom that is bonded to the sulfur atom in the formula, and the total number of the fluorine atoms is 4 or more; X.sup. represents a counter anion.

##STR00001##

A resist composition containing a base material component (A) of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, R.sup.bd1 to R.sup.bd3 each independently represent an aryl group which may have a substituent, provided that at least two of R.sup.bd1 to R.sup.bd3 are aryl groups having one or more fluorine atoms as substituents, and at least one of the fluorine atoms of the aryl group is bonded to a carbon atom adjacent to a carbon atom that is bonded to the sulfur atom in the formula, and the total number of the fluorine atoms is 4 or more; X.sup. represents a counter anion.

##STR00001##

The present invention relates to novel sulfur derivatives, processes for preparing them, pharmaceutical compositions containing them and their use as pharmaceuticals as modulators of chemokine receptors.