Patent classifications
C07D307/56
Methods for hydraulic enhancement of crops
Disclosed herein are compounds, salts, solvates of Formula (1), and any formulation thereof. Also disclosed are methods of eliciting hydraulic enhancement and/or increasing yield of a plant by contacting a plant with compounds, salts, solvates of Formula (1), or any formulation thereof.
METHODS FOR TREATING PROTOZOAN INFECTIONS
The invention provides compounds of Formula (I), and their use in methods for treating or preventing a protozoan infection in a subject using a compound of Formula (I). The invention also provides the use of a compound of Formula (I) in the manufacture of a medicament for the treatment of a protozoan infection in a subject. The invention further provides a medical device when used in a method of treating or preventing a protozoan infection in a subject and to a medical device comprising the composition of the invention.
METHODS FOR TREATING PROTOZOAN INFECTIONS
The invention provides compounds of Formula (I), and their use in methods for treating or preventing a protozoan infection in a subject using a compound of Formula (I). The invention also provides the use of a compound of Formula (I) in the manufacture of a medicament for the treatment of a protozoan infection in a subject. The invention further provides a medical device when used in a method of treating or preventing a protozoan infection in a subject and to a medical device comprising the composition of the invention.
COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD
The present invention employs a compound represented by the following formula (1) and/or a resin comprising the compound as a constituent:
##STR00001## wherein R.sup.1 is a 2n-valent group of 1 to 60 carbon atoms or a single bond; R.sup.2 to R.sup.5 are each independently a linear, branched, or cyclic alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 10 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, an alkoxy group of 1 to 30 carbon atoms, a halogen atom, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, provided that at least one selected from R.sup.2 to R.sup.5 is a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group; m.sup.2 and m.sup.3 are each independently an integer of 0 to 8; m.sup.4 and m.sup.3 are each independently an integer of 0 to 9, provided that m.sup.2, m.sup.3, m.sup.4, and m.sup.3 are not 0 at the same time; n is an integer of 1 to 4; and p.sup.2 to p.sup.5 are each independently an integer of 0 to 2.
COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD
The present invention employs a compound represented by the following formula (1) and/or a resin comprising the compound as a constituent:
##STR00001## wherein R.sup.1 is a 2n-valent group of 1 to 60 carbon atoms or a single bond; R.sup.2 to R.sup.5 are each independently a linear, branched, or cyclic alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 10 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, an alkoxy group of 1 to 30 carbon atoms, a halogen atom, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, provided that at least one selected from R.sup.2 to R.sup.5 is a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group; m.sup.2 and m.sup.3 are each independently an integer of 0 to 8; m.sup.4 and m.sup.3 are each independently an integer of 0 to 9, provided that m.sup.2, m.sup.3, m.sup.4, and m.sup.3 are not 0 at the same time; n is an integer of 1 to 4; and p.sup.2 to p.sup.5 are each independently an integer of 0 to 2.
MODULATORS OF THE INTEGRATED STRESS PATHWAY
Provided herein are compounds, compositions, and methods useful for modulating the integrated stress response (ISR) and for treating related diseases; disorders and conditions.
Oxime ester photoinitiators
Compounds of the formulae (I) or (II) ##STR00001##
wherein X is ##STR00002## A is O, S, NR.sub.5 or CR.sub.16R.sub.17; R.sub.1 is for example hydrogen or C.sub.1-C.sub.20alkyl R.sub.2 is for example hydrogen, C.sub.1-C.sub.20alkyl or C.sub.6-C.sub.20aryl R.sub.5 for example is C.sub.1-C.sub.20alkyl; R.sub.7, R.sub.8, R.sub.9, R.sub.10 and R.sub.11 for example independently of each other are hydrogen. C.sub.1-C.sub.20alkyl, halogen, CN or NO.sub.2; Ar.sub.1 is for example unsubstituted or substituted C.sub.6-C.sub.20aryl, C.sub.3-C.sub.20heteroaryl, C.sub.6-C.sub.20aroyl, C.sub.3-C.sub.20heteroarylcarbonyl or ##STR00003## or Ar.sub.1 is ##STR00004## Ar.sub.2 is for example phenylene, ##STR00005##
all of which are unsubstituted or substituted M is for example unsubstituted or substituted C.sub.1-C.sub.20alkylene Y is a direct bond, O, S, NR.sub.5 or CO; Z.sub.1 is for example O or S; Z.sub.2 is a direct bond, O, S or NR.sub.5; and Q is CO or a direct bond.
Oxime ester photoinitiators
Compounds of the formulae (I) or (II) ##STR00001##
wherein X is ##STR00002## A is O, S, NR.sub.5 or CR.sub.16R.sub.17; R.sub.1 is for example hydrogen or C.sub.1-C.sub.20alkyl R.sub.2 is for example hydrogen, C.sub.1-C.sub.20alkyl or C.sub.6-C.sub.20aryl R.sub.5 for example is C.sub.1-C.sub.20alkyl; R.sub.7, R.sub.8, R.sub.9, R.sub.10 and R.sub.11 for example independently of each other are hydrogen. C.sub.1-C.sub.20alkyl, halogen, CN or NO.sub.2; Ar.sub.1 is for example unsubstituted or substituted C.sub.6-C.sub.20aryl, C.sub.3-C.sub.20heteroaryl, C.sub.6-C.sub.20aroyl, C.sub.3-C.sub.20heteroarylcarbonyl or ##STR00003## or Ar.sub.1 is ##STR00004## Ar.sub.2 is for example phenylene, ##STR00005##
all of which are unsubstituted or substituted M is for example unsubstituted or substituted C.sub.1-C.sub.20alkylene Y is a direct bond, O, S, NR.sub.5 or CO; Z.sub.1 is for example O or S; Z.sub.2 is a direct bond, O, S or NR.sub.5; and Q is CO or a direct bond.
METHODS FOR TREATING PROTOZOAN INFECTIONS
The invention provides compounds of Formula (I), and their use in methods for treating or preventing a protozoan infection in a subject using a compound of Formula (I). The invention also provides the use of a compound of Formula (I) in the manufacture of a medicament for the treatment of a protozoan infection in a subject. The invention further provides a medical device when used in a method of treating or preventing a protozoan infection in a subject and to a medical device comprising the composition of the invention.
METHODS FOR TREATING PROTOZOAN INFECTIONS
The invention provides compounds of Formula (I), and their use in methods for treating or preventing a protozoan infection in a subject using a compound of Formula (I). The invention also provides the use of a compound of Formula (I) in the manufacture of a medicament for the treatment of a protozoan infection in a subject. The invention further provides a medical device when used in a method of treating or preventing a protozoan infection in a subject and to a medical device comprising the composition of the invention.