Patent classifications
C07D321/06
Process for preparing chloroacetaldehyde acetals
The invention relates to a process for preparing chloroacetaldehyde acetals of monohydric, dihydric or higher-functionality aliphatic alcohols, in which the chloroacetaldehyde acetal is obtained from an aqueous chloroacetaldehyde solution in the presence of the alcohol to be acetalized and an acid catalyst by azeotropic removal of water with the aid of a solvent, wherein the solvent is a halogenated solvent.
Process for preparing chloroacetaldehyde acetals
The invention relates to a process for preparing chloroacetaldehyde acetals of monohydric, dihydric or higher-functionality aliphatic alcohols, in which the chloroacetaldehyde acetal is obtained from an aqueous chloroacetaldehyde solution in the presence of the alcohol to be acetalized and an acid catalyst by azeotropic removal of water with the aid of a solvent, wherein the solvent is a halogenated solvent.
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTO-DEGRADABLE BASE
A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound (Q) represented by formula (1). In the formula (1), L.sup.1 represents an ester group, CONR.sup.3, a (thio)ether group, or a sulfonyl group. R.sup.4 represents a hydrogen atom, a substituted or unsubstituted C1 to C20 monovalent hydrocarbon group, a halogen atom, a hydroxy group, or a nitro group. R.sup.5 represents a C1 to C20 monovalent hydrocarbon group, a C1 to C20 monovalent halogenated hydrocarbon group, or a halogen atom, and optionally two R.sup.5s taken together represent an alicyclic structure together with the carbon atom(s) between the two R.sup.5s. L.sup.2 represents a single bond or a divalent linking group.
##STR00001##
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTO-DEGRADABLE BASE
A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound (Q) represented by formula (1). In the formula (1), L.sup.1 represents an ester group, CONR.sup.3, a (thio)ether group, or a sulfonyl group. R.sup.4 represents a hydrogen atom, a substituted or unsubstituted C1 to C20 monovalent hydrocarbon group, a halogen atom, a hydroxy group, or a nitro group. R.sup.5 represents a C1 to C20 monovalent hydrocarbon group, a C1 to C20 monovalent halogenated hydrocarbon group, or a halogen atom, and optionally two R.sup.5s taken together represent an alicyclic structure together with the carbon atom(s) between the two R.sup.5s. L.sup.2 represents a single bond or a divalent linking group.
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Prodrugs of Succinic Acid for Increasing ATP Production
The present invention provides novel cell-permeable succinates and cell permeable precursors of succinate aimed at increasing ATP-production in mitochondria. The main part of ATP produced and utilized in the eukaryotic cell originates from mitochondrial oxidative phosphorylation, a process to which high-energy electrons are provided by the Kreb's cycle. Not all Kreb's cycle intermediates are readily permeable to the cellular membrane, one of them being succinate. The provision of the novel cell permeable succinates is envisaged to allow passage over the cellular membrane and thus the cell permeable succinates can be used to enhance mitochondrial ATP-output.