An actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of compounds (I) to (III), and a content of the compounds selected from the group consisting of the compounds (I) to (III) is more than 20.0% by mass with respect to a total solid content in the composition.

An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.

##STR00001##

An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.

##STR00001##

This invention discloses a novel cationic photoinitiator and a preparation method and use thereof. The cationic photoinitiator has a structure as represented by general formula (I) below. It can match a longer absorption wavelength in the process of application and has an outstanding photosensitive property, and has characteristics of no proneness to migration and good yellowing resistance. ##STR00001##

This invention discloses a novel cationic photoinitiator and a preparation method and use thereof. The cationic photoinitiator has a structure as represented by general formula (I) below. It can match a longer absorption wavelength in the process of application and has an outstanding photosensitive property, and has characteristics of no proneness to migration and good yellowing resistance. ##STR00001##

Provided are compounds and compositions that inhibit glucose-induced growth signaling and methods of using same. The compounds may be suitable to treat glycolytic cancers, such as, for example, esophageal squamous cell carcinoma (ESCC). The compounds may be used to inhibit or partially inhibit glucose-promoted tumor cell proliferation, NME-1 catalyzed histidine phosphorylation of FAK, and FAK interaction with RBI. The compounds may have the following structure:

##STR00001##

Provided are compounds and compositions that inhibit glucose-induced growth signaling and methods of using same. The compounds may be suitable to treat glycolytic cancers, such as, for example, esophageal squamous cell carcinoma (ESCC). The compounds may be used to inhibit or partially inhibit glucose-promoted tumor cell proliferation, NME-1 catalyzed histidine phosphorylation of FAK, and FAK interaction with RBI. The compounds may have the following structure:

##STR00001##

The present invention is a sulfonium salt represented by the following formula (1),

##STR00001##

wherein p represents an integer of 1 to 3; R.sup.11 represents a hydrocarbyl group having 1 to 20 carbon atoms; R.sup.f represents a fluorine atom or a fluorine-atom-containing C1 to C6 group selected from alkyl, alkoxy, and sulfide; q represents an integer of 1 to 4; R.sup.ALU represents an acid-labile group; r represents an integer of 1 to 4; R.sup.12 represents a hydrocarbyl group having 1 to 20 carbon atoms; s represents an integer of 0 to 4; t represents an integer of 0 to 2; R.sup.f and OR.sup.ALU are bonded to adjacent carbon atoms; and X.sup. represents a non-nucleophilic counterion having no polymerizable group. This provides a sulfonium salt used for a resist composition having excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as exposure latitude and LWR; a resist composition containing the sulfonium salt as a photoacid generator; and a patterning process using the resist composition.

The present invention is a sulfonium salt represented by the following formula (1),

##STR00001##

wherein p represents an integer of 1 to 3; R.sup.11 represents a hydrocarbyl group having 1 to 20 carbon atoms; R.sup.f represents a fluorine atom or a fluorine-atom-containing C1 to C6 group selected from alkyl, alkoxy, and sulfide; q represents an integer of 1 to 4; R.sup.ALU represents an acid-labile group; r represents an integer of 1 to 4; R.sup.12 represents a hydrocarbyl group having 1 to 20 carbon atoms; s represents an integer of 0 to 4; t represents an integer of 0 to 2; R.sup.f and OR.sup.ALU are bonded to adjacent carbon atoms; and X.sup. represents a non-nucleophilic counterion having no polymerizable group. This provides a sulfonium salt used for a resist composition having excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as exposure latitude and LWR; a resist composition containing the sulfonium salt as a photoacid generator; and a patterning process using the resist composition.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having an excellent pattern collapse suppressing property and excellent LWR performance can be obtained. In addition, the present invention also provides a resist film, a pattern forming method, and a method for manufacturing an electronic device, each regarding the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin whose solubility in a developer is changed by the action of an acid, a photoacid generator represented by General Formula (b1), and a solvent, in which the photoacid generator represented by General Formula (b1) is a compound that generates an acid having a pka of 1.0 or less upon irradiation with actinic rays or radiation

##STR00001##