Patent classifications
C07D333/48
Polymer, Resist Composition, Method for Manufacturing Substrate Having Pattern Formed Therein, and (Meth)Acrylic Ester and Production Method Therefor
Provided is a polymer including a constituent unit (1) based on a monomer represented by Formula (1), in which a content of a constituent unit based on a monomer having a polycyclic structure is 35 mol % or less. In Formula (1), R.sup.1 represents a hydrogen atom or a methyl group, A.sup.1 represents a linking group including an ester bond, or a single bond, where A.sup.1 has no tertiary carbon atom, and Z.sup.1 represents an atomic group forming a sulfur-containing cyclic hydrocarbon group having 3 to 6 carbon atoms, which includes a carbon atom bonded to A.sup.1, and —SO.sub.2—.
##STR00001##
Polymer, Resist Composition, Method for Manufacturing Substrate Having Pattern Formed Therein, and (Meth)Acrylic Ester and Production Method Therefor
Provided is a polymer including a constituent unit (1) based on a monomer represented by Formula (1), in which a content of a constituent unit based on a monomer having a polycyclic structure is 35 mol % or less. In Formula (1), R.sup.1 represents a hydrogen atom or a methyl group, A.sup.1 represents a linking group including an ester bond, or a single bond, where A.sup.1 has no tertiary carbon atom, and Z.sup.1 represents an atomic group forming a sulfur-containing cyclic hydrocarbon group having 3 to 6 carbon atoms, which includes a carbon atom bonded to A.sup.1, and —SO.sub.2—.
##STR00001##
MODULATORS OF PIN1 ACTIVITY AND USES THEREOF
Disclosed herein are compounds comprising an electrophilic moiety and rigid moiety for use in modulating an activity of Pin1. The rigid moiety comprises at least one functional group that is capable of forming hydrogen bonds with hydrogen atoms, wherein the electrophilic moiety and the rigid moiety are arranged such that the electrophilic moiety is capable of covalently binding to the Cys113 residue of Pin1, and the rigid moiety is capable of forming hydrogen bonds with the Gln131 and His 157 residues of Pin1. Further disclosed are novel compounds having Formula Id:
##STR00001##
wherein the dashed line, W, X, Y, Z, Ra-Rc, R.sub.1, R.sub.2, L.sub.1, L.sub.2 and n are as defined herein, and libraries comprising such compounds. Further disclosed are methods of identifying a compound capable of modulating an activity of Pin1, by screening a library of compounds.
Kappa opioid agonists and uses thereof
Provided are compounds of Formula I; and pharmaceutically acceptable salts and solvates thereof: ##STR00001## The compounds of Formula I described herein relate to and/or have application(s) in (among others) the fields of drug discovery, pharmacotherapy, physiology, organic chemistry and polymer chemistry.
Additive for nonaqueous electrolyte solutions, nonaqueous electrolyte solution, and electricity storage device
Disclosed is an additive for non-aqueous electrolyte solutions, which include a compound represented by Formula (1). ##STR00001## In Formula (1), X represents a sulfonyl group or a carbonyl group, R.sup.1 represents an alkyl group having 1 to 4 carbon atoms which may be substituted with a halogen atom, or the like, and R.sup.2 represents a divalent hydrocarbon group having 1 to 3 carbon atoms which may be substituted with a halogen atom, or represents a divalent group formed of a divalent hydrocarbon group having 1 to 3 carbon atoms which may be substituted with a halogen atom, and an oxygen atom that constitutes a cyclic structure together with the hydrocarbon group.
Additive for nonaqueous electrolyte solutions, nonaqueous electrolyte solution, and electricity storage device
Disclosed is an additive for non-aqueous electrolyte solutions, which include a compound represented by Formula (1). ##STR00001## In Formula (1), X represents a sulfonyl group or a carbonyl group, R.sup.1 represents an alkyl group having 1 to 4 carbon atoms which may be substituted with a halogen atom, or the like, and R.sup.2 represents a divalent hydrocarbon group having 1 to 3 carbon atoms which may be substituted with a halogen atom, or represents a divalent group formed of a divalent hydrocarbon group having 1 to 3 carbon atoms which may be substituted with a halogen atom, and an oxygen atom that constitutes a cyclic structure together with the hydrocarbon group.
ADDITIVE FOR NONAQUEOUS ELECTROLYTE SOLUTIONS, NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTRICITY STORAGE DEVICE
Disclosed is an additive for a nonaqueous electrolyte solution, including a compound represented by the following formula (1):
##STR00001## in formula (1), X represents a sulfonyl group or a carbonyl group, R.sup.1 represents an alkyl group having 1 to 4 carbon atoms, which may be substituted with a halogen atom, a hydroxyl group, or the like, and R.sup.2 represents a hydrocarbon group having 1 to 3 carbon atoms, which may be substituted with a halogen atom.
ADDITIVE FOR NONAQUEOUS ELECTROLYTE SOLUTIONS, NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTRICITY STORAGE DEVICE
Disclosed is an additive for a nonaqueous electrolyte solution, including a compound represented by the following formula (1):
##STR00001## in formula (1), X represents a sulfonyl group or a carbonyl group, R.sup.1 represents an alkyl group having 1 to 4 carbon atoms, which may be substituted with a halogen atom, a hydroxyl group, or the like, and R.sup.2 represents a hydrocarbon group having 1 to 3 carbon atoms, which may be substituted with a halogen atom.
Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth) acrylic ester and production method therefor
Provided is a polymer including a constituent unit (1) based on a monomer represented by Formula (1), in which a content of a constituent unit based on a monomer having a polycyclic structure is 35 mol % or less. In Formula (1), R.sup.1 represents a hydrogen atom or a methyl group, A.sup.1 represents a linking group including an ester bond, or a single bond, where A.sup.1 has no tertiary carbon atom, and Z.sup.1 represents an atomic group forming a sulfur-containing cyclic hydrocarbon group having 3 to 6 carbon atoms, which includes a carbon atom bonded to A.sup.1, and —SO.sub.2—. ##STR00001##
Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth) acrylic ester and production method therefor
Provided is a polymer including a constituent unit (1) based on a monomer represented by Formula (1), in which a content of a constituent unit based on a monomer having a polycyclic structure is 35 mol % or less. In Formula (1), R.sup.1 represents a hydrogen atom or a methyl group, A.sup.1 represents a linking group including an ester bond, or a single bond, where A.sup.1 has no tertiary carbon atom, and Z.sup.1 represents an atomic group forming a sulfur-containing cyclic hydrocarbon group having 3 to 6 carbon atoms, which includes a carbon atom bonded to A.sup.1, and —SO.sub.2—. ##STR00001##