Patent classifications
C07F5/066
Catalyst for poly(lactide) synthesis and uses thereof
A catalysts for poly(lactide) synthesis having the structure of Formula I: ##STR00001##
wherein R.sub.1 and R.sub.2 is, independently, C.sub.1-C.sub.6 alkoxy, and R.sub.3 arylalkyl or substituted phenyl are disclosed. Method of synthesizing the catalysts and method of using the catalysts to prepare poly(lactides) and compositions comprising the catalyst are also disclosed.
METAL ORGANIC FRAMEWORK ABSORBENT PLATFORMS FOR REMOVAL OF CO2 AND H2S FROM NATURAL GAS
Provided herein are metal organic frameworks comprising metal nodes and N-donor organic ligands which have high selectivity and stability in the present of gases and vapors including H.sub.2S, H.sub.2O, and CO.sub.2. Methods include capturing one or more of H.sub.2S, H.sub.2O, and CO.sub.2 from fluid compositions, such as natural gas.
Method and apparatus for the preparation of a polyolefin
A method (100) is proposed for the preparation of a polyolefin from olefin monomers, wherein the olefin monomers are subjected to one or more polymerisation steps (13), in which a proportion of the olefin monomers are catalytically reacted to form the polyolefin, while the olefin monomers that are not reacted in the polymerisation step or steps (13) are at least partly transferred into one or more gaseous, monomer-containing purge streams (g, h), which additionally contain(s) one or more aluminium organic compounds, which comprise one or more co-catalysts used in the polymerisation step or steps (13) and/or one or more compounds formed from the co-catalyst(s). It is provided that, downstream of one or more olefin synthesis steps (21), the gaseous, monomer-containing purge stream or streams (g, h) are brought into contact with a crude gas mixture (p, r) formed using a product mixture from the olefin synthesis step or steps (21) and are subjected to a caustic wash (26) together with the crude gas mixture (p, r). The present invention also relates to a corresponding apparatus.
Silica support, preparation method thereof and metallocene catalyst using the same
This disclosure relates to a silica support for a metallocene catalyst used for olefin polymerization, a preparation method thereof, a metallocene catalyst using the same, and olefin polymer. Specifically, according to the present invention, a silica support used for preparing a metallocene supported catalyst is treated with a specific halogenized metal compound, thereby diversifying reaction sites to a cocatalyst when preparing a metallocene catalyst, and thus, the molecular weight distribution of produced olefin polymer may be much broadened and polymer having high molecular weight may be obtained compared to the existing support, even if the same metallocene catalyst is supported.
Metal complexes having triazenido ligands and uses thereof for depositing metals from the gas phase
The invention relates to the use of a metal complex, which has at least one ligand of the formula R.sup.1N.sub.3R.sup.2, wherein R.sup.1 and R.sup.2 are hydrocarbon moieties, for depositing the metal or a compound of the metal from the gas phase. The invention further relates to methods for depositing metals from the metal complexes, and to metal complexes, substituted triazene compounds and to methods for the production thereof.
AREA SELECTIVE DEPOSITION OF ALUMINUM BASED FILMS USING ALKYL ALUMINUM AMIDINATE PRECURSORS
Area selective deposition of aluminum-based films using alkyl aluminum amidinate precursors and methods thereof are provided. Area selective deposition comprises depositing an alkyl aluminum amidinate precursor on a substrate with a first surface portion comprising a metal and a second surface portion comprising a non-metal to form an aluminum-based film on the substrate. The aluminum-based film will be located on the second surface portion of the substrate and when the aluminum-based film is located on the first surface portion, a ratio of an average thickness of the film on the first surface portion to an average thickness of the film on the second surface portion is less than 1.
Aluminum precursor compound, production method therefor, and aluminum containing layer forming method using same
The present disclosure relates to an aluminum compound, an aluminum-containing film-forming precursor composition including the aluminum compound, and a method of preparing an aluminum-containing film using the aluminum-containing film-forming precursor composition.
Separator for secondary battery, method for manufacturing the same and lithium secondary battery containing the same
Provided are a separator for a secondary battery, a method for manufacturing the same, and a lithium secondary battery including the same, and particularly, a separator for a secondary battery which has sufficient thermal resistance and mechanical properties even without using a polymer-based organic binder lacking chemical stability, by adopting a metal alkanoate having a polar group as a binder for binding among particles forming a porous active layer and also between the porous active layer and a porous substrate. A method for manufacturing the same, and a lithium secondary battery including the same are also provided.
Aluminum-based metal-organic framework having three dimensional porous structure and comprising at least two types of ligands, preparation method therefor, and use thereof
The present invention relates to a metal-organic framework (MOF) having a three-dimensional porous structure and being represented by the chemical formula of [Al.sub.8(OH).sub.a(BTC).sub.b(IPA).sub.c(L).sub.d], a preparation method therefor, and a use thereof as an adsorbent and a catalyst. The novel aluminum-based metal-organic framework with a porous three-dimensional structure can be applied to a low-temperature regenerable composition for moisture absorption due to higher moisture adsorption or desorption capacity than existing moisture adsorbents, and can also be used as an absorbent for absorbing separation of gas due to excellent adsorption capability to nitrogen.
AREA SELECTIVE DEPOSITION OF ALUMINUM BASED FILMS USING ALKYL ALUMINUM AMIDINATE PRECURSORS
Area selective deposition of aluminum-based films using alkyl aluminum amidinate precursors and methods thereof are provided. Area selective deposition comprises depositing an alkyl aluminum amidinate precursor on a substrate with a first surface portion comprising a metal and a second surface portion comprising a non-metal to form an aluminum-based film on the substrate. The aluminum-based film will be located on the second surface portion of the substrate and when the aluminum-based film is located on the first surface portion, a ratio of an average thickness of the film on the first surface portion to an average thickness of the film on the second surface portion is less than 1.