Boron, phosphorus, arsenic, antimony and other impurities are at least partially removed from a mixture containing at least one chlorosilane and/or organochlorosilane by a) contacting the liquid mixture with a carrier material functionalized with an amidoxime of the general structural formula (I),

##STR00001##

where CAR=carrier material and R.sup.1, R.sup.2 are independently of one another H, alkyl, alkenyl, aryl, alkylaryl; and b) optionally removing the functionalized carrier material.

A process for preparing trimethylchlorosilane (M3) and methyltrichlorosilane (M1) by disproportionation of dimethyldichlorosilane (M2) in the presence of an Al.sub.2O.sub.3 catalyst is described herein. The dimethyldichlorosilane used is in the form of a silane mixture that includes 80-100% by weight of dimethyldichlorosilane (M2). The difference in content from 100% by weight includes M1 and M3.

Described herein are thermal condensation reactors and processes of using the same. A presently described thermal condensation reactor includes a heat transfer chamber, wherein the heat transfer chamber is a fluidized bed having a fluidization gas flow in a first direction, and wherein the heat transfer chamber has a plurality of heating zones that may be maintained at different temperatures, and a plurality of reaction tubes disposed in the heat transfer chamber in a second direction perpendicular to the fluidization gas flow, each reaction tube having a reactant gas flow that passes through the plurality of heating zones.

A branched oxydisilane/siloxane oligomer and method for its preparation are disclosed. The branched oxydisilane/siloxane oligomer may be used as a heat transfer fluid.

A branched oxydisilane/siloxane oligomer and method for its preparation are disclosed. The branched oxydisilane/siloxane oligomer may be used as a heat transfer fluid.

There is provided herein a process for the synthesis of sulfonyl silanes. There is also provided herein various sulfenylated and sulfonylated silicon-containing compounds made by the process.

There is provided herein a process for the synthesis of sulfonyl silanes. There is also provided herein various sulfenylated and sulfonylated silicon-containing compounds made by the process.

Silicon compounds may be represented by the following formula:

##STR00001##

Each of R.sup.a, R.sup.b, and R.sup.c may be a hydrogen atom, a halogen atom, a C1-C7 alkyl group, an amino group, a C1-C7 alkyl amino group, or a C1-C7 alkoxy group, R.sup.d may be a C1-C7 alkyl group, a C1-C7 alkyl amino group, or a silyl group represented by a formula of *—Si(X.sup.1)(X.sup.2)(X.sup.3). Each of X.sup.1, X.sup.2, and X.sup.3 may be a hydrogen atom, a halogen atom, a C1-C7 alkyl group, an amino group, a C1-C7 alkyl amino group, or a C1-C7 alkoxy group, and * is a bonding site. In some embodiments, when R.sup.b is the C1-C7 alkyl amino group and R.sup.d is the C1-C7 alkyl group, R.sup.b may be connected to R.sup.d to form a ring. To manufacture an integrated circuit (IC) device, a silicon-containing film may be formed on a substrate using the silicon compound of the formula provided above.

A silirane-functionalized compound that consists of a substrate to which a least two silirane groups of the formula (1) are covalently bonded, a mixture containing the silirane-functionalized compounds, and a process for preparing siloxanes using the mixture are described herein.

A method for converting organosilanes by reacting at least one silane (1) of the general formula

R.sub.aSiCl.sub.4-a  (I)

with at least one further silane (2) of the general formula

R.sub.bSiCl.sub.4-b  (II)

wherein silane (2) is identical or different from silane (1), optionally with additional use of silanes (3) which contain Si-bonded hydrogen and have the formula

R.sub.dH.sub.eSiCl.sub.4-d-e  (III)

in the presence of aluminum salts, preferably aluminum halides, as catalysts and in the presence of cocatalysts, to obtain at least one silane (4) which differs from silanes (1) and (2) and has the general formula

R.sub.cSiCl.sub.4-c  (IV).