The present invention provides processes for the synthesis of organic azides, intermediates for the production thereof, and compositions related thereto.

Novel processes are disclosed for the preparation of eribulin mesylate. Novel intermediate compounds used in the processes for making eribulin mesylate as well as processes for making the intermediates are disclosed.

The invention relates to processes for preparing benzoprostacyclin analogues and intermediates prepared from the process, and the benzoprostacyclin analogues prepared therefrom. The invention also relates to cyclopentenone intermediates in racemic or optically active form.

A method for producing a fluorine-containing compound represented by General formula (1), wherein X represents a halogen atom or an alkoxy group, R.sup.1 represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, R.sup.f1 and R.sup.f2 are each independently a fluorinated alkoxy group, and n represents an integer of 0 or more. ##STR00001##

The invention relates to intermediates useful in the preparation of halichondrin compounds, methods for preparing the same and use thereof, such as halichondrins, eribulin, or their analogs. The intermediates, the methods and use thereof are used for the synthesis of the C20-C26 fragment of halichondrin compounds. The raw materials in the synthetic route of the invention are cheap and easily obtained, the sources and the qualities of the raw materials are reliable. The choice of the methods useful in the synthesis of chiral central structures are based on the structural characteristics of the reactants, thus effectively improving the synthesis efficiency, reducing the difficulties and risks of product quality control, and avoiding the use of highly toxic and expensive organotin catalysts to significantly decrease costs and improve environmental friendliness.

Provided are: a fluorine-containing ether compound, a fluorine-containing ether composition, and a coating liquid that are capable of forming a surface layer having excellent durability; and an article that has a surface layer having excellent durability. The present invention provides a fluorine-containing ether compound represented by formula (A1) or formula (A2) below.

R.sup.fO—(R.sup.f1O).sub.m—R.sup.1-L.sup.1-R.sup.2-Q.sup.1(-T).sub.n  formula (A1)

(T-).sub.nQ.sup.1-R.sup.2-L.sup.1-R.sup.1—O—(R.sup.f1O).sub.m—R.sup.1-L.sup.1-R.sup.2-Q.sup.1(-T).sub.n  formula (A2)

In the formulae, symbols are as defined in the description.

An aqueous solution composition containing a co-hydrolysate or a co-hydrolytic condensate of an organosilicon compound of formula (1) and an organosilicon compound of formula (2), or both the co-hydrolysate and the co-hydrolytic condensate:

##STR00001##

wherein R.sup.1 and R.sup.2 are each independently an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R.sup.3 is an alkyl group having 12 to 24 carbon atoms, R.sup.4 and R.sup.5 are each independently an alkyl group having 1 to 6 carbon atoms, X is a halogen atom, m is an integer of 1 to 20, and n is an integer of 1 to 3.

Provided is a method of manufacturing an alkoxysilane compound, the method capable of more effectively removing ammonia generated as a byproduct when the alkoxysilane compound is manufactured with a silazane-based compound by adding and reacting a silazane-based compound. The method includes: adding an alcohol to a silazane-based compound and allowing the alcohol to react with the silazane-based compound to manufacture a first mixture containing an alkoxysilane compound and ammonia; adding an acid having a pKa of 2-6.5 to the first mixture to prepare a second mixture containing the alkoxysilane compound and an ammonium salt; adding an aqueous solvent to the second mixture to dissolve the ammonium salt; and separating and removing the ammonium salt.

A radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition including as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1)
R.sup.1.sub.aR.sup.2.sub.bSi(R.sup.3).sub.4-(a+b)  Formula (1)
wherein R.sup.1 is an organic group of Formula (1-2) ##STR00001##
and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R.sup.3 is a hydrolyzable group; and Formula (2)
R.sup.7.sub.cR.sup.8.sub.dSi(R.sup.9).sub.4-(c+d)  Formula (2)
wherein R.sup.7 is an organic group of Formula (2-1) ##STR00002##
and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R.sup.9 is a hydrolyzable group.

A radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition including as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1)
R.sup.1.sub.aR.sup.2.sub.bSi(R.sup.3).sub.4-(a+b)  Formula (1)
wherein R.sup.1 is an organic group of Formula (1-2) ##STR00001##
and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R.sup.3 is a hydrolyzable group; and Formula (2)
R.sup.7.sub.cR.sup.8.sub.dSi(R.sup.9).sub.4-(c+d)  Formula (2)
wherein R.sup.7 is an organic group of Formula (2-1) ##STR00002##
and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R.sup.9 is a hydrolyzable group.