The invention relates to a method for preparing a polymeric material doped with at least one first metal element and at least one second metal element, said at least one first metal element and said at least one second metal element being identical or different from each other, said method comprising: a) a step for copolymerization of at least one first monomer comprising at least one first metal element and of at least one second monomer comprising at least one chelating group of at least one second metal element, in return for which a polymeric material is obtained comprising recurrent units from the polymerization of said first monomer, said recurrent units comprise said at least one first metal element and comprising recurrent units from the polymerization of said second monomer, said recurrent units comprising chelating groups of at least one second metal element; and when said first metal element is different from said second metal element, said method further comprising a step b) for putting the material obtained in step a) in contact with a solution comprising said at least second metal element, in return for which said at least second metal element is complexed with the aforementioned chelating groups, this step b) being optional when said first metal element and said second metal element are identical.

A salt represented by the formula (I); ##STR00001##
wherein Q.sup.1 and Q.sup.2 each independently represent a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, L.sup.b1 represents a single bond or a divalent C.sub.1 to C.sub.24 saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C.sub.3 to C.sub.18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C.sub.6 to C.sub.20 aromatic hydrocarbon group, and Z.sup.+ represents an organic sulfonium cation or an organic iodonium cation.

A salt represented by the formula (I); ##STR00001##
wherein Q.sup.1 and Q.sup.2 each independently represent a fluorine atom or a C.sub.1 to C.sub.6 perfluoroalkyl group, L.sup.b1 represents a single bond or a divalent C.sub.1 to C.sub.24 saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C.sub.3 to C.sub.18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C.sub.6 to C.sub.20 aromatic hydrocarbon group, and Z.sup.+ represents an organic sulfonium cation or an organic iodonium cation.

Provided are a high-purity styrenesulfonic acid compound having a markedly decreased amount of bonded bromine and a polymer thereof, which are useful for modifiers for secondary batteries, dopants for conductive polymers, additives for semiconductor polishing and cleaning agents, organic EL elements, and photoresists, and particularly for members for electronic materials. A high-purity 4-(2-bromoethyl)benzenesulfonic acid having a decreased amount of nuclear-brominated forms, a high-purity styrenesulfonic acid compound having a markedly decreased amount of bonded bromine, which are derived from the high-purity 4-(2-bromoethyl)benzenesulfonic acid, and a polymer of the high-purity styrenesulfonic acid compound are used.

Vulcanizates with desirable properties can be obtained from compounds incorporating polymers that include hydroxyl group-containing -methylstyrene functionalities. The functionalities can be incorporated by using any or all of appropriate initiators, monomers and optional terminating compounds. Such polymers exhibit excellent interactivity with both conventional and non-conventional fillers.

The present invention provides a composition for treating a semiconductor device, a compound, a method for producing a modified substrate, and a method for producing a semiconductor device, each of which can form a coating film having a high coat-forming property for inhibiting the formation of an ALD coating film. The composition for treating a semiconductor device of an embodiment of the present invention includes a compound having a specific functional group bonded to or adsorbed on a substrate and a polymerizable group, and a solvent, in which the specific functional group is a basic functional group or an acidic functional group, in a case where the specific functional group is the basic functional group, an acid dissociation constant of a conjugate acid of a compound obtained by adding a proton to the basic functional group is 7.0 or more, and in a case where the specific functional group is the acidic functional group, an acid dissociation constant of the compound upon dissociation of a proton from the acidic functional group is 5.0 or less.