Provided is a polar compound that has high chemical stability and high capability of aligning liquid crystal molecules, and has a large voltage holding ratio when used in a liquid crystal display device.

The compound represented by formula (1) is applied.

##STR00001##

For example, R.sup.1 is alkyl having 1 to 15 carbons; rings A.sup.1 to A.sup.5 are 1,4-cyclohexylene or 1,4-phenylene; Z.sup.1 and Z.sup.5 are a single bond or alkylene having 1 to 10 carbons; a and b are 0 to 4, and a sum of a and b is 4 or less; d is 1 to 4; c and e are 0 to 4; P.sup.1 to P.sup.3 are a polymerizable group represented by formulas (P-1) to (P-5):

##STR00002##

in which M.sup.1 to M.sup.3 are hydrogen or alkyl having 1 to 5 carbons; and R.sup.2 is a group represented by formulas (1a) to (1c):

##STR00003##

in which Sp.sup.1 to Sp.sup.5 are a single bond or alkylene having 1 to 10 carbons; S.sup.1 is >CH; S.sup.2 is >C<; and X.sup.1 is OH.

Provided is a polar compound that has high chemical stability and high capability of aligning liquid crystal molecules, and has a large voltage holding ratio when used in a liquid crystal display device.

The compound represented by formula (1) is applied.

##STR00001##

For example, R.sup.1 is alkyl having 1 to 15 carbons; rings A.sup.1 to A.sup.5 are 1,4-cyclohexylene or 1,4-phenylene; Z.sup.1 and Z.sup.5 are a single bond or alkylene having 1 to 10 carbons; a and b are 0 to 4, and a sum of a and b is 4 or less; d is 1 to 4; c and e are 0 to 4; P.sup.1 to P.sup.3 are a polymerizable group represented by formulas (P-1) to (P-5):

##STR00002##

in which M.sup.1 to M.sup.3 are hydrogen or alkyl having 1 to 5 carbons; and R.sup.2 is a group represented by formulas (1a) to (1c):

##STR00003##

in which Sp.sup.1 to Sp.sup.5 are a single bond or alkylene having 1 to 10 carbons; S.sup.1 is >CH; S.sup.2 is >C<; and X.sup.1 is OH.

An ink composition includes an acrylic resin including a polymerization product of a first monomer having a hydroxyl group, a second monomer having an epoxy group, a third monomer having an acrylate group, and a fourth monomer having a substituted or unsubstituted phenyl group, a first curing agent having an isocyanate group, and a second curing agent having an amine group. Durability and abrasion resistance of a window may be improved.

An ink composition includes an acrylic resin including a polymerization product of a first monomer having a hydroxyl group, a second monomer having an epoxy group, a third monomer having an acrylate group, and a fourth monomer having a substituted or unsubstituted phenyl group, a first curing agent having an isocyanate group, and a second curing agent having an amine group. Durability and abrasion resistance of a window may be improved.

A method for producing a copolymer for semiconductor lithography containing less metal impurities, and a method for purifying a polymerization initiator for production of the copolymer, are provided. The method for purifying a polymerization initiator to be used for production of a polymer includes a filtering step wherein a solution of a polymerization initiator dissolved in an organic solvent is allowed to pass through a filter having a nominal pore size of not more than 1.0 m, to reduce the sodium content of the polymerization initiator solution to not more than 300 ppb with respect to the weight of the polymerization initiator. Further, the method for producing a copolymer for semiconductor lithography includes a polymerization step wherein the polymer for semiconductor lithography is synthesized by a radical polymerization reaction in the presence of a polymerization initiator purified by the above purification method.

A method for producing a composition including a step A of performing ultrafiltration, microfiltration, dialysis membrane treatment, or a combination thereof on a composition containing water and a fluoropolymer. The fluoropolymer is a polymer having a structural unit M3 derived from a monomer represented by general formula (1):
CX.sub.2CY(CZ.sub.2ORf-A)(1)
where X is the same or different and is H or F; Y is H, F, an alkyl group, or a fluorine-containing alkyl group; Z is the same or different and is H, F, an alkyl group, or a fluoroalkyl group; Rf is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having 2 to 100 carbon atoms and having an ether bond; and A is COOM, SO.sub.3M, OSO.sub.3M, or C(CF.sub.3).sub.2OM, wherein M is as defined herein; provided that at least one of X, Y, and Z includes a fluorine atom.

A method for producing a composition including a step A of performing ultrafiltration, microfiltration, dialysis membrane treatment, or a combination thereof on a composition containing water and a fluoropolymer. The fluoropolymer is a polymer having a structural unit M3 derived from a monomer represented by general formula (1):
CX.sub.2CY(CZ.sub.2ORf-A)(1)
where X is the same or different and is H or F; Y is H, F, an alkyl group, or a fluorine-containing alkyl group; Z is the same or different and is H, F, an alkyl group, or a fluoroalkyl group; Rf is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having 2 to 100 carbon atoms and having an ether bond; and A is COOM, SO.sub.3M, OSO.sub.3M, or C(CF.sub.3).sub.2OM, wherein M is as defined herein; provided that at least one of X, Y, and Z includes a fluorine atom.