Crosslinkable random copolymers comprising atom transfer radical polymerization (ATRP) initiators and crosslinked copolymer films formed from the copolymers are provided. The random copolymers, which are polymerized from one or more alkyl halide functional inimers and one or more monomers having a crosslinkable functionality, are characterized by pendant ATRP initiating groups and pendant crosslinkable groups.

Crosslinkable random copolymers comprising atom transfer radical polymerization (ATRP) initiators and crosslinked copolymer films formed from the copolymers are provided. The random copolymers, which are polymerized from one or more alkyl halide functional inimers and one or more monomers having a crosslinkable functionality, are characterized by pendant ATRP initiating groups and pendant crosslinkable groups.

To provide a curable composition whereby it is possible to obtain a cured product having a high Abbe number and being excellent in transparency, crack resistance and releasability; and such a cured product. A curable composition comprises, in specific ratios, surface-modified metal oxide particles (A) having (meth)acryloyl-group-containing surface-modifying groups on the surface of the metal oxide particles, a compound (B) having a fluorine atom and at least one (meth)acryloyl group, a compound (C) having a urethane bond or OCH.sub.2CH(OH)CH.sub.2, having at least two (meth)acryloyl groups and having a mass-average molecular weight of at least 1,000, a compound (D) having no unsaturated bond-containing ring structure and having at least one (meth)acryloyl group, and a polymerization initiator (E).

To provide a curable composition whereby it is possible to obtain a cured product having a high Abbe number and being excellent in transparency, crack resistance and releasability; and such a cured product. A curable composition comprises, in specific ratios, surface-modified metal oxide particles (A) having (meth)acryloyl-group-containing surface-modifying groups on the surface of the metal oxide particles, a compound (B) having a fluorine atom and at least one (meth)acryloyl group, a compound (C) having a urethane bond or OCH.sub.2CH(OH)CH.sub.2, having at least two (meth)acryloyl groups and having a mass-average molecular weight of at least 1,000, a compound (D) having no unsaturated bond-containing ring structure and having at least one (meth)acryloyl group, and a polymerization initiator (E).

A flooring coating formulation is disclosed that contains inorganic particles, at least one crosslinking acrylate monomer, at least one polymerizable cyclic/aromatic acrylate monomer, matting agent particles, at least one reactive diluent acrylate monomer, at least one fluorinated acrylate monomer, at least one crosslinkable oligomer, and at least one photoinitiator. The inorganic particles, such as aluminum oxide, can be present in the coating in an amount sufficient to improve wear and/or stain resistance. A floor covering that includes a layer of cured coating which has a polymerized formulation of the flooring coating formulation also is disclosed.

A flooring coating formulation is disclosed that contains inorganic particles, at least one crosslinking acrylate monomer, at least one polymerizable cyclic/aromatic acrylate monomer, matting agent particles, at least one reactive diluent acrylate monomer, at least one fluorinated acrylate monomer, at least one crosslinkable oligomer, and at least one photoinitiator. The inorganic particles, such as aluminum oxide, can be present in the coating in an amount sufficient to improve wear and/or stain resistance. A floor covering that includes a layer of cured coating which has a polymerized formulation of the flooring coating formulation also is disclosed.

A first object of the present invention is to provide an active light ray sensitive or radioactive ray sensitive resin composition having excellent sensitivity and forming a pattern with excellent resolution. A second object of the present invention is to provide a resist film, a pattern-forming method, and a method for manufacturing an electronic device relating to the active light ray sensitive or radioactive ray sensitive resin composition. The active light ray sensitive or radioactive ray sensitive resin composition of the present invention includes a metal compound, a resin having a main chain that is decomposed by irradiation with an X-ray, an electron beam, or an extreme ultraviolet ray, and a solvent, wherein the metal compound includes one or more metal compounds selected from the group consisting of a metal complex, an organic metal salt, and an organic metal compound, and the resin includes a resin including a repeating unit represented by a formula (1) or a repeating unit represented by a formula (XR0).

A composition comprising at least one first divalent unit represented by formula: ##STR00001##
and at least one of a second divalent unit comprising a pendant Z group or a monovalent unit comprising a thioether linkage and a terminal Z group, wherein each Z group is independently selected from the group consisting of P(O)(OY).sub.2 and OP(O)(OY).sub.2. R and R are each independently selected from the group consisting of hydrogen and alkyl having from 1 to 4 carbon atoms. Y is selected from the group consisting of hydrogen, alkyl, trialkylsilyl, and a counter cation. Methods of treating a surface using these compositions and articles with a surface in contact with these compositions are provided. Methods of making these compositions are also provided.

A composition comprising at least one first divalent unit represented by formula: ##STR00001##
and at least one of a second divalent unit comprising a pendant Z group or a monovalent unit comprising a thioether linkage and a terminal Z group, wherein each Z group is independently selected from the group consisting of P(O)(OY).sub.2 and OP(O)(OY).sub.2. R and R are each independently selected from the group consisting of hydrogen and alkyl having from 1 to 4 carbon atoms. Y is selected from the group consisting of hydrogen, alkyl, trialkylsilyl, and a counter cation. Methods of treating a surface using these compositions and articles with a surface in contact with these compositions are provided. Methods of making these compositions are also provided.

Crosslinkable random copolymers comprising atom transfer radical polymerization (ATRP) initiators and crosslinked copolymer films formed from the copolymers are provided. The random copolymers, which are polymerized from one or more alkyl halide functional inimers and one or more monomers having a crosslinkable functionality, are characterized by pendant ATRP initiating groups and pendant crosslinkable groups.