C08F20/22

RESIST COMPOSITION AND PATTERNING PROCESS

A resist composition comprising a hypervalent iodine compound, a carboxylic acid derivative, and a solvent is provided. When processed by photolithography using high-energy radiation, the resist composition exhibits a high sensitivity and improved maximum resolution. The non-chemically-amplified resist composition exhibits a high sensitivity and improved maximum resolution when processed by photolithography using high-energy radiation, typically EB and EUV lithography.

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND

A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit (I) which includes an acid-dissociable group; and a solvent. W is a cyclic structure having 3 to 40 ring members formed together with the two carbon atoms; a formula between the two carbon atoms below represents a single bond or a double bond, custom-character, A is one of groups represented by formulae (A-1) to (A-7); R.sup.1 is a monovalent organic group having 1 to 20 carbon atoms, a cyano group, a nitro group, a carboxy group, a hydroxy group, an amino group, a halogen atom, or a thiol group, when there are a plurality of R.sup.1s, the plurality of R.sup.1s are same as or different from each other; m.sub.1 is an integer of 0 to 4; and Z.sup.+ is a monovalent radiation-sensitive onium cation.

##STR00001##

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND

A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit (I) which includes an acid-dissociable group; and a solvent. W is a cyclic structure having 3 to 40 ring members formed together with the two carbon atoms; a formula between the two carbon atoms below represents a single bond or a double bond, custom-character, A is one of groups represented by formulae (A-1) to (A-7); R.sup.1 is a monovalent organic group having 1 to 20 carbon atoms, a cyano group, a nitro group, a carboxy group, a hydroxy group, an amino group, a halogen atom, or a thiol group, when there are a plurality of R.sup.1s, the plurality of R.sup.1s are same as or different from each other; m.sub.1 is an integer of 0 to 4; and Z.sup.+ is a monovalent radiation-sensitive onium cation.

##STR00001##

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND

A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit which includes an acid-dissociable group; and a solvent. A is a monovalent organic group having 1 to 40 carbon atoms; R.sup.1 and R.sup.2 are each independently a hydrogen atom, a monovalent fluorine-free organic group having 1 to 20 carbon atoms, a cyano group, a nitro group, a hydroxy group, or an amino group, when there are a plurality of R.sup.1s and R.sup.2s, the plurality of R.sup.1s and R.sup.2s are the same or different from each other; m.sub.1 is an integer of 1 to 8; and Z.sup.+ is a monovalent radiation-sensitive onium cation.

##STR00001##

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND

A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit which includes an acid-dissociable group; and a solvent. A is a monovalent organic group having 1 to 40 carbon atoms; R.sup.1 and R.sup.2 are each independently a hydrogen atom, a monovalent fluorine-free organic group having 1 to 20 carbon atoms, a cyano group, a nitro group, a hydroxy group, or an amino group, when there are a plurality of R.sup.1s and R.sup.2s, the plurality of R.sup.1s and R.sup.2s are the same or different from each other; m.sub.1 is an integer of 1 to 8; and Z.sup.+ is a monovalent radiation-sensitive onium cation.

##STR00001##

Binder composition, compound, binder layer, optical laminate, optical laminate manufacturing method, and image display device

An object of the present invention is to provide a binder composition in which air unevenness is suppressed and which has excellent upper layer coating properties after being formed as a layer, a compound, a binder layer, an optical laminate, an optical laminate manufacturing method, and an image display device. The binder composition of the present invention is a binder composition containing a binder and a compound having a group represented by Formula (B1) or (B2). ##STR00001## In Formulae (B1) and (B2), Z represents an aliphatic hydrocarbon group having a fluorine atom or an organosiloxane group.

Binder composition, compound, binder layer, optical laminate, optical laminate manufacturing method, and image display device

An object of the present invention is to provide a binder composition in which air unevenness is suppressed and which has excellent upper layer coating properties after being formed as a layer, a compound, a binder layer, an optical laminate, an optical laminate manufacturing method, and an image display device. The binder composition of the present invention is a binder composition containing a binder and a compound having a group represented by Formula (B1) or (B2). ##STR00001## In Formulae (B1) and (B2), Z represents an aliphatic hydrocarbon group having a fluorine atom or an organosiloxane group.