Porous resin particles are disclosed that comprise a polymer of a monomer mixture. The monomer mixture includes: a mono(meth)acrylate-based monomer in an amount of 3 wt % to 40 wt % containing: an ethylenic unsaturated group only in a (meth)acrylic acid residue; and a hydroxyl group and at least either an ether group or an ester group in an alcohol residue; another monofunctional vinyl-based monomer in an amount of 10 wt % to 69 wt % containing a single ethylenic unsaturated group; and a polyfunctional vinyl-based monomer in an amount of 30 wt % to 70 wt % containing two or more ethylenic unsaturated groups.

A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.

A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.