Patent classifications
C08F212/06
Polymer, positive resist composition, and method of forming resist pattern
Provided is a polymer that when used as a main chain scission-type positive resist, can sufficiently inhibit resist pattern collapse, can favorably form a clear resist pattern, and can also improve sensitivity. The polymer includes a monomer unit (A) represented by general formula (I), shown below, and a monomer unit (B) represented by general formula (II), shown below. [In formula (I), R.sup.1 is an organic group including not fewer than 5 and not more than 7 fluorine atoms. In formula (II), R.sup.2 is a hydrogen atom, a fluorine atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, R.sup.3 is a hydrogen atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, p and q are each an integer of not less than 0 and not more than 5, and p+q=5.] ##STR00001##
Polymer, positive resist composition, and method of forming resist pattern
Provided is a polymer that when used as a main chain scission-type positive resist, can sufficiently inhibit resist pattern collapse, can favorably form a clear resist pattern, and can also improve sensitivity. The polymer includes a monomer unit (A) represented by general formula (I), shown below, and a monomer unit (B) represented by general formula (II), shown below. [In formula (I), R.sup.1 is an organic group including not fewer than 5 and not more than 7 fluorine atoms. In formula (II), R.sup.2 is a hydrogen atom, a fluorine atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, R.sup.3 is a hydrogen atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, p and q are each an integer of not less than 0 and not more than 5, and p+q=5.] ##STR00001##
Copolymer, material for organic electronic element, material for organic electroluminescent element, and organic electroluminescent element
Provided are a copolymer having plural repeating units each having a specific structure, and having a weight-average molecular weight of from 100,000 to 3,000,000; a material for organic electronic devices and a material for organic electroluminescent devices containing the copolymer; a solution containing the copolymer and a solvent; and an organic electroluminescent device using the material for organic electroluminescent devices. The copolymer has not only charge transporting properties but also solubility and is suitable for forming a film according to a coating method. The present invention provides the copolymer, and a material for organic electronic devices and a material for organic electroluminescent devices containing the copolymer, an organic electroluminescent device, and a solution containing the copolymer.
Copolymer, material for organic electronic element, material for organic electroluminescent element, and organic electroluminescent element
Provided are a copolymer having plural repeating units each having a specific structure, and having a weight-average molecular weight of from 100,000 to 3,000,000; a material for organic electronic devices and a material for organic electroluminescent devices containing the copolymer; a solution containing the copolymer and a solvent; and an organic electroluminescent device using the material for organic electroluminescent devices. The copolymer has not only charge transporting properties but also solubility and is suitable for forming a film according to a coating method. The present invention provides the copolymer, and a material for organic electronic devices and a material for organic electroluminescent devices containing the copolymer, an organic electroluminescent device, and a solution containing the copolymer.
METHOD FOR PRODUCING CONJUGATED DIENE POLYMER
[Problem to be Solved] Provided is a method for producing a non-petrochemical-derived conjugated diene polymer using an alcohol derived from a non-petrochemical raw material.
[Means to Solve the Problem] In the present invention, the method is characterized in that a non-petrochemical-derived conjugated diene polymer is produced using an alcohol derived from a non-petrochemical raw material having an iron content of 0.0001 mg/L to 2 mg/L.
ETHANOL
The present disclosure provides a novel and practical alcohol and derivatives thereof which have more industrial value than existing petrochemical raw materials. The present disclosure further provides ethanol, characterized in that a peak in gas chromatography measured by gas chromatograph mass spectrometry (GC/MS) has at least one peak with a retention time selected from (A) a peak of 5 minutes 25 seconds to 5 minutes 35 seconds and two peaks of 2 minutes 55 seconds to 3 minutes 5 seconds; (B) a peak of 12 minutes 30 seconds to 12 minutes 40 seconds; (C) a peak of 6 minutes 36 seconds to 6 minutes 45 seconds; and (D) a peak of 15 minutes 00 seconds to 15 minutes 15 seconds.
SUGAR-BASED, ENVIRONMENTALLY-FRIENDLY SURFACTANTS FOR EMULSION POLYMERIZATION
A composition for an aqueous emulsion polymerization which comprises at least one derivatized alkyl polyglucoside surfactant in a range of 0.01-10%; water, in a range from 20-80% by weight; at least one monomer for emulsion polymerization making up 20-80% of the emulsion polymerization, and at least one initiator in the range of 0.01-5%; with the derivatized alkylpolyglucosides being polyoxyethylene, ethylene oxide and 1,4-dioxane free.
SUGAR-BASED, ENVIRONMENTALLY-FRIENDLY SURFACTANTS FOR EMULSION POLYMERIZATION
A composition for an aqueous emulsion polymerization which comprises at least one derivatized alkyl polyglucoside surfactant in a range of 0.01-10%; water, in a range from 20-80% by weight; at least one monomer for emulsion polymerization making up 20-80% of the emulsion polymerization, and at least one initiator in the range of 0.01-5%; with the derivatized alkylpolyglucosides being polyoxyethylene, ethylene oxide and 1,4-dioxane free.
POLYMER AND POSITIVE RESIST COMPOSITION
Provided is a polymer capable of forming a resist pattern in which pattern top loss is inhibited when used as a main chain scission-type positive resist. The polymer includes a monomer unit (A) represented by general formula (I), shown below, and a monomer unit (B) represented by general formula (II), shown below, and the proportion of components having a molecular weight of 100,000 or more in the polymer is 10% or more. In general formula (I), X is a fluorine, chlorine, bromine, iodine, or astatine atom, and R.sup.1 is an organic group including 3 to 7 fluorine atoms. In general formula (II), R.sup.2 is a hydrogen atom, fluorine atom, unsubstituted alkyl group, or fluorine atom-substituted alkyl group, R.sup.3 is a hydrogen atom, unsubstituted alkyl group, or fluorine atom-substituted alkyl group, p and q are integers of 0 to 5, and p+q=5.
##STR00001##
METHOD OF EPOXIDATION
The present invention concerns block and/or tapered block copolymers comprising pendant hydrocarbyl, trisubstituted epoxide-containing moieties, and methods of preparing these and their precursors. The invention also concerns curable compositions comprising such copolymers as modified solution styrene butadiene rubbers and silica and/or carbon black and articles formed from curing these formulations. Such articles may be tyres.