A positive resist composition is provided comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by a nitrobenzene ring-containing tertiary hydrocarbyl group. The resist composition has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and size variation after exposure.

A positive resist composition is provided comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by a nitrobenzene ring-containing tertiary hydrocarbyl group. The resist composition has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and size variation after exposure.

A positive resist composition is provided comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by a nitrobenzene ring-containing tertiary hydrocarbyl group. The resist composition has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and size variation after exposure.

To provide microwell films for bioassay suitable for a “unimolecular enzyme assay” method and methods of manufacturing the films, a microwell film for bioassay is comprised of at least a substrate (11), and a resin layer (12) having microwells on its surface provided on one main surface of the substrate (11), where in the substrate (11) and the resin forming the resin layer (12), an absorption coefficient at each of wavelengths of 350 nm to 800 nm is 0.01 μm.sup.−1 or less.

To provide microwell films for bioassay suitable for a “unimolecular enzyme assay” method and methods of manufacturing the films, a microwell film for bioassay is comprised of at least a substrate (11), and a resin layer (12) having microwells on its surface provided on one main surface of the substrate (11), where in the substrate (11) and the resin forming the resin layer (12), an absorption coefficient at each of wavelengths of 350 nm to 800 nm is 0.01 μm.sup.−1 or less.

In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): ##STR00001##
Photoresists that comprises such polymers also are provided.

In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): ##STR00001##
Photoresists that comprises such polymers also are provided.

Methods for the synthesis of methyl 2-fluoroacrylate (MFA) are provided. The methods include use of various hydrofluorination agents using a variety of starting materials and reaction schemes. The methyl 2-fluoroacrylate prepared by the methods described herein can further be used to prepare patiromer calcium sorbitex.

Methods for the synthesis of methyl 2-fluoroacrylate (MFA) are provided. The methods include use of various hydrofluorination agents using a variety of starting materials and reaction schemes. The methyl 2-fluoroacrylate prepared by the methods described herein can further be used to prepare patiromer calcium sorbitex.

Methods for the synthesis of methyl 2-fluoroacrylate (MFA) are provided. The methods include use of various hydrofluorination agents using a variety of starting materials and reaction schemes. The methyl 2-fluoroacrylate prepared by the methods described herein can further be used to prepare patiromer calcium sorbitex.