C08F220/26

Polymers based on arcrylic, methacrylic or ethacrylic amidoalkyl sulfonic acid or salts and carboxyalky acrylate, methacrylate or ethacrylate or oligomers of said carboxy compounds

Water-soluble or water-swellable polymers are described, containing a) 20.0 to 98.99 mole percent of one or more independently recurring structural units of the formula (1) and b) 1.0 to 79.99 mole percent of one or more independently recurring structural units of the formula (2), and c) 0.01 to 8.0 mole percent of one or more independently recurring cross-linking structural units, which are obtained from one or more monomers having at least two olefinic double bonds. The polymers are suitable, for example, as thickeners or yield point formers, in particular in cosmetic, dermatological or pharmaceutical compositions. ##STR00001##

Polymers based on arcrylic, methacrylic or ethacrylic amidoalkyl sulfonic acid or salts and carboxyalky acrylate, methacrylate or ethacrylate or oligomers of said carboxy compounds

Water-soluble or water-swellable polymers are described, containing a) 20.0 to 98.99 mole percent of one or more independently recurring structural units of the formula (1) and b) 1.0 to 79.99 mole percent of one or more independently recurring structural units of the formula (2), and c) 0.01 to 8.0 mole percent of one or more independently recurring cross-linking structural units, which are obtained from one or more monomers having at least two olefinic double bonds. The polymers are suitable, for example, as thickeners or yield point formers, in particular in cosmetic, dermatological or pharmaceutical compositions. ##STR00001##

POLYMER

The present application relates to a polymer, a method for preparing the same, and a use thereof. The present application provides a polymer, a method for preparing the same, and a use thereof. The present application can provide: a polymer, which has a composition for allowing a low solubility in polar and non-polar solvents and can be prepared in a simple polymerization manner, such as solution polymerization; and a use thereof.

POLYMER

The present application relates to a polymer and a use thereof. The present application may provide a functional polymer which expresses a low solubility to a polar solvent and a non-polar solvent and which is suitable for forming a film. If applied to the use of cosmetics such as mascara or to medical uses, the polymer in the present application may express a tolerance to diverse solvents such as sebum, sweat, tears and the like, and thus enables makeup to last, etc. Accordingly, the polymer may be applied to diverse uses and used in film forming agents, cosmetic compositions, or cosmetics, or the like.

Resin, resist composition and method for producing resist pattern

Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I′) and a structural unit having an acid-labile group: ##STR00001## ##STR00002##
wherein R.sup.1 and R.sup.2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom,
Ar represents an aromatic hydrocarbon group which may have a substituent,
L.sup.1 represents a group represented by formula (X.sup.1-1), etc.,
L.sup.11, L.sup.13, L.sup.15 and L.sup.17 each independently represent an alkanediyl group,
L.sup.12, L.sup.14, L.sup.16 and L.sup.18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and
* and ** are bonds, and ** represents a bond to an iodine atom.

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
20170315444 · 2017-11-02 ·

A chemically amplified positive-type photosensitive resin composition capable of forming a resist pattern having a nonresist portion with a favorable rectangular sectional shape, a method of manufacturing a resist pattern using the composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template manufactured by the method. In a chemically amplified positive-type photosensitive resin composition including an acid generator, a resin whose solubility in alkali increases under the action of acid, and an organic solvent, an acrylic resin is used that includes a constituent unit derived from an acrylic acid ester including an —SO.sub.2-containing cyclic group or a lactone-containing cyclic group, and a constituent unit derived from an acrylic acid ester containing an organic group including an aromatic group and an alcoholic hydroxyl group.

BLOCK COPOLYMER

The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use.

BLOCK COPOLYMER

The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use.

BLOCK COPOLYMER

The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.

Binder for secondary battery exhibiting excellent adhesion force

Provided is a binder for secondary battery electrodes comprising polymer particles obtained by polymerizing three or more kinds of monomers wherein the polymer particles have a mean particle diameter of 0.3 μm to 0.7 μm. The binder exhibits superior adhesion force to electrode current collectors and excellent support force to the active material and basically improves safety of electrodes, thus providing a secondary battery with superior cycle characteristics.