A positive resist composition comprising a base polymer comprising recurring units (a) of an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and improved dimensional uniformity.

A positive resist composition comprising a base polymer comprising recurring units (a) of an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and improved dimensional uniformity.

A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.

A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.

The present invention provides an aqueous paint composition comprising by dry weight based on total dry weight of the pigment composition, from 11% to 35% of a polymeric duller of (co)polymeric particles having an average diameter of from 1 to 20 μm, and from 25% to 70% of titanium dioxide particles; wherein from 50% to 100% of the titanium dioxide particles are encapsulated by polymer shell of (co)polymeric particles.

The present invention provides an aqueous paint composition comprising by dry weight based on total dry weight of the pigment composition, from 11% to 35% of a polymeric duller of (co)polymeric particles having an average diameter of from 1 to 20 μm, and from 25% to 70% of titanium dioxide particles; wherein from 50% to 100% of the titanium dioxide particles are encapsulated by polymer shell of (co)polymeric particles.

The present invention provides an aqueous paint composition comprising by dry weight based on total dry weight of the pigment composition, from 11% to 35% of a polymeric duller of (co)polymeric particles having an average diameter of from 1 to 20 μm, and from 25% to 70% of titanium dioxide particles; wherein from 50% to 100% of the titanium dioxide particles are encapsulated by polymer shell of (co)polymeric particles.

Disclosed is a self-invertible inverse latex including, as an inverting agent, surfactant species of the polyglycerol ester family; the use thereof as a thickening and/or emulsifying and/or stabilising agent for a cosmetic, dermopharmaceutical or pharmaceutical topical composition, and cosmetic, dermopharmaceutical or pharmaceutical topical compositions containing same. Also disclosed is a new surfactant composition containing polyglycerol esters.

Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: ##STR00001## wherein R.sup.1 represents a hydrogen atom or a methyl group; L.sup.1 and L.sup.2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; R.sup.a50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; R.sup.a51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; A.sup.a50 represents a single bond or *—X.sup.a51-(A.sup.a52-X.sup.a52).sub.nb—; A.sup.a52 represents an alkanediyl group; X.sup.a51 and X.sup.a52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.

Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: ##STR00001## wherein R.sup.1 represents a hydrogen atom or a methyl group; L.sup.1 and L.sup.2 each represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; R.sup.a50 represents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; R.sup.a51 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; A.sup.a50 represents a single bond or *—X.sup.a51-(A.sup.a52-X.sup.a52).sub.nb—; A.sup.a52 represents an alkanediyl group; X.sup.a51 and X.sup.a52 each represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.