Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.

The present invention is a resist composition comprises a polymer compound having one or two repeating units selected from repeating units represented by the following general formulae (p-1), (p-2) and (p-3), a repeating unit represented by the following formula (a-1) and the formula (a-2) polarities of which are changed by an action of an acid, and a repeating unit represented by the following formula (b-1); a salt represented by the following general formula (B); and a solvent, wherein a difference of a C log P of the repeating unit (a-1) before and after changing the polarity is 3.0 to 4.5, and a difference of a C log P of the repeating unit (a-2) before and after changing the polarity is 2.5 to 3.2. This provides a resist composition which has high sensitivity, wide DOF and high resolution, reduces LER, LWR and CDU, and has good pattern shape after exposure and excellent etching resistance. ##STR00001##

The present invention relates to novel ophthalmic devices comprising polymerized compounds comprising a photoactive unit, said polymerized compounds, and special monomer compounds being particularly suitable for compositions and ophthalmic devices.

The present invention relates to novel ophthalmic devices comprising polymerized compounds comprising a photoactive unit, said polymerized compounds, and special monomer compounds being particularly suitable for compositions and ophthalmic devices.

The present invention relates to novel ophthalmic devices comprising polymerized compounds comprising a photoactive unit, said polymerized compounds, and special monomer compounds being particularly suitable for compositions and ophthalmic devices.

The invention provides novel polymers, crosslinked polymer-nucleic acid complexes, lipid-polymer-nucleic acid-based complexation and nanoassemblies, and nanoassembly-based intracellular delivery of nucleic acids and controlled release thereof upon degradation of the nanoassemblies in response to specific microenvironment in the cell, and compositions and methods of preparation and use thereof.

The present invention relates to a polymer of formula I, a cosmetic composition comprising the polymer of formula I, a method of synthesizing the polymer of formula I; and use of the polymer of formula Ito provide a benefit in a photoresponsive way.

A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodine-substituted aromatic ring bonded to the nitrogen atom via a C.sub.1-C.sub.20 hydrocarbon group which may contain an ester bond and/or an ether bond and a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Zwitterionic copolymers, coating compositions (e.g., aqueous coating compositions and articles containing such copolymers, and methods of coating such coating compositions; wherein the copolymer includes: (a) first monomeric units derived from monomers of Formula (I) CH.sub.2═CR.sup.1—(CO)—X—R.sup.2—[-Q-R.sup.3—].sub.n—Y (I) or salts thereof, wherein: R.sup.1 is hydrogen or methyl; X is oxy or —NH—; R.sup.2 is an alkylene optionally including catenary oxygen; R.sup.3 is an alkylene; Q is —(CO)O—, —NR.sup.4—(CO)—NR.sup.4—, or —(CO)—NR.sup.4—; R.sup.4 is hydrogen or alkyl; n is equal to 0 or 1; and Y is phosphonic acid, phosphonate, phosphoric acid, or phosphate; and (b) second monomeric units derived from monomers of Formula (II) CH.sub.2═CR.sup.1—(CO)—X—R.sup.2—[-Q-R.sup.3—].sub.n—[NR.sup.5R.sup.6]+—R.sup.7—Z— (II) wherein: R.sup.1 is hydrogen or methyl; X is oxy or —NH—; R.sup.2 is alkylene optionally including catenary oxygen; R.sup.3 is alkylene; Q is —(CO)O—, —NR.sup.4—(CO)—NR.sup.4—, or —(CO)—NR4-; R.sup.4 is hydrogen or alkyl; n is equal to 0 or 1; R.sup.5 and R.sup.6 are each independently an alkyl, aryl, or a combination thereof, or R.sup.5 and R.sup.6 both combine with the nitrogen to which they are both attached to form a heterocyclic ring having 3 to 7 ring members; R.sup.7 is alkylene; and Z″ is carboxylate or sulfonate.
CH.sub.2═CR.sup.1—(CO)—X—R.sup.2—[-Q-R.sup.3-].sub.n—Y  (I)
CH.sub.2═CR.sup.1—(CO)—X—R.sup.2—[-Q-R.sup.3—].sub.n—[NR.sup.5R.sup.6].sup.+—R.sup.7—Z.sup.−  (II)

A resist composition that generates an acid upon exposure and has solubility in a developing solution, which is changed by action of an acid, the resist composition containing a resin component having a constitutional unit represented by General Formula (a01-1) and a constitutional unit represented by General Formula (a02-1). In General Formula (a01-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Yax.sup.01 represents a linking group; Ax represents a sulfonyl group or a sulfoxide group; Rax.sup.01 represents an alkyl group, an alkoxy group, a halogen atom, or a halogenated alkyl group; s0 and v0 represent an integer of 0 to 6; and 1≤s0+v0≤6 and u0≤s0+v0. In General Formula (a02-1), Ra.sup.00 represents an acid-dissociable group represented by General Formula (a02-r2-1) ##STR00001##