The invention relates to a novel sulfobetaine monomer and to a process for the preparation thereof, advantageously by reaction between a vinyl-amine compound and a vinyl-sulfonic acid compound, preferably in the presence of a solubilizing agent. The invention also relates to the (co)polymers obtained from this novel type of sulfobetaine monomer, and to the use thereof, for example as a flocculant, dispersing agent, thickening agent, absorbent agent or friction-reducing agent.

Polymer particle embolics and methods of making same are described. The particle embolics can be used as embolization agents.

Polymer particle embolics and methods of making same are described. The particle embolics can be used as embolization agents.

Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I′) and a structural unit having an acid-labile group: ##STR00001## ##STR00002##
wherein R.sup.1 and R.sup.2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom,
Ar represents an aromatic hydrocarbon group which may have a substituent,
L.sup.1 represents a group represented by formula (X.sup.1-1), etc.,
L.sup.11, L.sup.13, L.sup.15 and L.sup.17 each independently represent an alkanediyl group,
L.sup.12, L.sup.14, L.sup.16 and L.sup.18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and
* and ** are bonds, and ** represents a bond to an iodine atom.

Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I′) and a structural unit having an acid-labile group: ##STR00001## ##STR00002##
wherein R.sup.1 and R.sup.2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom,
Ar represents an aromatic hydrocarbon group which may have a substituent,
L.sup.1 represents a group represented by formula (X.sup.1-1), etc.,
L.sup.11, L.sup.13, L.sup.15 and L.sup.17 each independently represent an alkanediyl group,
L.sup.12, L.sup.14, L.sup.16 and L.sup.18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and
* and ** are bonds, and ** represents a bond to an iodine atom.

A method for making reduction sensitive nano micelles comprising: 1) dissolving taurine in distilled water, and adding sodium hydroxide solution; 2) dissolving acryloyl chloride in dichloromethane, reacting at 25° C.; dissolving lipoic acid in toluene and adding hydroxyethyl methacrylate, reacting at 85° C.; 3) dissolving N-acryloyltaurine and lipoic acid methacryloyloxyethyl ester and reacting at 60˜65° C., dropping the polymer solution into deionized water, adding dithiothreitol and reacting at 25˜30° C. to obtain reduction sensitive nano micelles after freeze-drying. The nano micelles have regular morphology and uniform distribution, and can be used as drug carriers for controlled release.

The present invention relates to a composition for a display sealing material having a photopolymerization initiator and a photocurable monomer, the photocurable monomer comprising: a monomer not having the aromatic hydrocarbon group; and a monomer having two or more substituted or unsubstituted phenyl groups of chemical formula 1, wherein about 5 wt % to about 45 wt % of the monomer having two or more substituted or unsubstituted phenyl groups is comprised on the basis of the photocurable monomer and about 55 wt % to about 95 wt % of the monomer not having the aromatic hydrocarbon group is comprised on the basis of the photocurable monomer.

The present invention relates to a composition for a display sealing material having a photopolymerization initiator and a photocurable monomer, the photocurable monomer comprising: a monomer not having the aromatic hydrocarbon group; and a monomer having two or more substituted or unsubstituted phenyl groups of chemical formula 1, wherein about 5 wt % to about 45 wt % of the monomer having two or more substituted or unsubstituted phenyl groups is comprised on the basis of the photocurable monomer and about 55 wt % to about 95 wt % of the monomer not having the aromatic hydrocarbon group is comprised on the basis of the photocurable monomer.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V.sup.11 represents an aliphatic cyclic group with or without a substituent; R.sup.1 represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y.sup.1 represents an oxygen atom (—O—), an ester bond (—C(═O)—O—) or a single bond; and W.sup.2 represents a group formed by a polymerization reaction of a polymerizable group-containing group). ##STR00001##

The present invention relates to a polymer dispersion obtainable by at least one two-stage emulsion polymerization, by 1) preparing a polymer A by a radical polymerization from a 1st composition comprising A) at least one monomer, B) at least one anionic copolymerizable emulsifier, 2) admixing the polymer A prepared at 1) with a base, 3) in the presence of the polymer A treated at 2), preparing a polymer B by radical polymerization from a 2nd composition comprising A) at least one monomer, B) at least one anionic copolymerizable emulsifier. The present invention also relates to a process for preparing the polymer dispersion of the invention, to coating materials in the form of an aqueous composition comprising the polymer dispersion of the invention, and to the use of the polymer dispersion of the invention for coating compositions or paints and varnishes.