The invention relates to a pulverulent composition which can be produced by bringing a powder which comprises at least one inorganic binder into contact with from 0.01 to 10% by weight, based on the total mass of the composition, of a liquid component comprising at least one copolymer which can be obtained by polymerization of a mixture of monomers comprising (I) at least one ethylenically unsaturated monomer which comprises at least one radical selected from the group consisting of carboxylic acid, carboxylic acid salt, carboxylic esters, carboxamide, carboxylic anhydride and carboximide and (II) at least one ethylenically unsaturated monomer having a polyalkylene oxide radical, where the liquid component contains at least 1% by weight of the at least one copolymer and at least 30% by weight of an organic solvent. Furthermore, a process for producing the liquid component, the use thereof and also specific copolymers are disclosed.

The present invention provides compositions and methods involving the use of a carboxylate graft polymer having high molecular weight and low ratio of acid-to-polyoxyalkylene groups. Such clay-mitigation is particularly useful for treating clay and clay-bearing aggregates, particularly those aggregates used for construction purposes. The present invention minimizes the need to wash the aggregates, thus preserving fine aggregates (fines) content in construction materials, and thereby beneficiating the performance and/or properties of construction materials containing the clay-bearing aggregates.

Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

A method for inerting a swellable clay and/or for reducing or inhibiting adverse effects of swellable clays on the effectiveness of dispersants in mineral binder compositions, includes adding a comb polymer to a mineral binder composition. The comb polymer includes: at least one poly(alkylene oxide) side chain-bearing monomer unit without ionic groups, optionally at least one cationic monomer unit, optionally at least one anionic monomer unit, and optionally, at least one non-ionic monomer unit.

The present invention is an optical material composition containing (A) 100 parts by mass of a polymerizable monomer, and (B) 0.001 to 0.3 parts by mass of a UV absorbent having a maximum absorption wavelength of 360 nm or more and less than 380 nm and having a specific structure, and an optical material formed of the composition. According to the present invention, there can be provided an optical material composition containing a UV absorbent and having good long-term storage stability, and an optical material formed of the composition, in particular, an optical material composition capable of forming a plastic lens having a high blue light cut rate.

The present invention relates to a curable composition for an optical material, containing (A) 100 parts by mass of a radical polymerizable monomer, (B) 0.1 to 5 parts by mass of an ultraviolet absorber composed of a benzotriazole compound having a specific structure, which has a maximum absorption wavelength of 360 nm or more and less than 380 nm and an absolute value of the difference in solubility parameter (SP value) from the radical polymerizable monomer (A) of 5.5 (cal/cm.sup.3).sup.1/2 or less, (C) 1 to 5 parts by mass of an ultraviolet absorber which is at least one selected from a benzotriazole compound, a benzophenone compound and a triazine compound and has a maximum absorption wavelength of less than 360 nm, and (D) 0.05 to 0.5 parts by mass of a radical polymerization initiator. According to the present invention, it is possible to provide a curable composition for an optical material which has an ability to cut ultraviolet rays and blue light and can be suitably used as a coating material having good storage stability and weather resistance.

The invention provides a class of amphiphilic branched polydiorganosiloxane macromers and the uses thereof. Such a macromer comprises a polydiorganosiloxane polymer chain and two terminal groups free of any ethylenically unsaturated group, wherein the polydiorganosiloxane polymer chain comprises (1) at least 5 dimethylsiloxane units in a consecutive sequence, (2) at least two first siloxane units each having methyl as one of the two substituents of each first siloxane unit and one first first organic radical having one sole (meth)acryloyl group as the other substituent, (3) at least one second siloxane unit having methyl as one of the two substituents of the second siloxane unit and one second organic radical, which is free of any ethylenically unsaturated group and comprises one or more hydrophilic groups or polymer chains, as the other substituent.

The invention provides a class of amphiphilic branched polydiorganosiloxane macromers and the uses thereof. Such a macromer comprises a polydiorganosiloxane polymer chain and two terminal groups free of any ethylenically unsaturated group, wherein the polydiorganosiloxane polymer chain comprises (1) at least 5 dimethylsiloxane units in a consecutive sequence, (2) at least two first siloxane units each having methyl as one of the two substituents of each first siloxane unit and one first first organic radical having one sole (meth)acryloyl group as the other substituent, (3) at least one second siloxane unit having methyl as one of the two substituents of the second siloxane unit and one second organic radical, which is free of any ethylenically unsaturated group and comprises one or more hydrophilic groups or polymer chains, as the other substituent.

Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.

Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.