Patent classifications
C08G8/10
Alkylphenol copolymer
An alkylphenol copolymer, such as for use in a petroleum composition, is provided. The alkylphenol copolymer has at least the following repeating unit (I): ##STR00001## wherein: A is a direct bond or an alkylene; X is —C(O)O—, —OC(O)—, —C(O)N(R.sub.6)—, —N(R.sub.6)C(O)—, —C(O)—, —N(R.sub.6)—, —O—, or —S—; R.sub.6 is H or an alkyl; R.sub.1 includes a C.sub.1-C.sub.80 alkyl, a C.sub.2-C.sub.20 alkenyl, a C.sub.2-C.sub.20 alkynyl, a C.sub.3-C.sub.12 aryl, or a polyether; and n is an integer from 1 to 200. The present invention also provides a method for forming the alkylphenol copolymer containing the aforementioned repeating unit (I) as well as a method for forming a monomer for forming repeating unit (I).
Alkylphenol copolymer
An alkylphenol copolymer, such as for use in a petroleum composition, is provided. The alkylphenol copolymer has at least the following repeating unit (I): ##STR00001## wherein: A is a direct bond or an alkylene; X is —C(O)O—, —OC(O)—, —C(O)N(R.sub.6)—, —N(R.sub.6)C(O)—, —C(O)—, —N(R.sub.6)—, —O—, or —S—; R.sub.6 is H or an alkyl; R.sub.1 includes a C.sub.1-C.sub.80 alkyl, a C.sub.2-C.sub.20 alkenyl, a C.sub.2-C.sub.20 alkynyl, a C.sub.3-C.sub.12 aryl, or a polyether; and n is an integer from 1 to 200. The present invention also provides a method for forming the alkylphenol copolymer containing the aforementioned repeating unit (I) as well as a method for forming a monomer for forming repeating unit (I).
Addition condensation product, production method and use of same, polymerization vessel, and production method of polymer
Provided is an addition condensation product of an aromatic compound and a carbonyl compound. The addition condensation product includes an aromatic compound dimer in which two composition units derived from the aromatic compounds are bonded via one composition unit derived from the carbonyl compound and an aromatic compound multimer in which each of three or more composition units derived from the aromatic compounds is bonded via one composition unit derived from the carbonyl compound. A ratio of the aromatic compound dimer to the aromatic compound multimer is in the range of 1:75 to 1:1,000.
POLYOXYMETHYLENE COMPOSITIONS
Described herein are polyoxymethylene (POM) compositions comprising polyoxymethylene and styrene maleic anhydride (SMA) copolymers or modified SMA copolymers, said POM compositions exhibiting improved physical properties such as heat deflection temperatures compared to POM compositions which do not comprise SMA copolymers.
Compound and tablet
A compound comprises a resin composition containing an epoxy resin, a phenol resin, a wax, and an imidazole compound, and a metal element-containing powder, wherein the epoxy resin comprises a crystalline epoxy resin, the wax comprises a montanic acid ester, and the content of the metal element-containing powder is 90 mass % or more based on the total mass of the compound.
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND METHOD FOR PURIFYING RESIN
The present invention has an object to provide a new compound that is useful as a film forming material for lithography or an optical component forming material, a resin containing a constituent unit derived from said compound, a composition, a resist pattern formation method, a circuit pattern formation method, and a purification method.
A compound represented by formula (1), a resin containing a constituent unit derived from said compound, a composition containing one or more selected from the group consisting of said compound and said resin, a resist pattern formation method using said composition, a circuit pattern formation method, and a purification method thereof.
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND METHOD FOR PURIFYING RESIN
The present invention has an object to provide a new compound that is useful as a film forming material for lithography or an optical component forming material, a resin containing a constituent unit derived from said compound, a composition, a resist pattern formation method, a circuit pattern formation method, and a purification method.
A compound represented by formula (1), a resin containing a constituent unit derived from said compound, a composition containing one or more selected from the group consisting of said compound and said resin, a resist pattern formation method using said composition, a circuit pattern formation method, and a purification method thereof.
MODIFIED ARYLHYDROXY COMPOUNDS FOR THE PRODUCTION OF POLYURETHANE OR POLYISOCYANURATE
Esterified arylhydroxy compounds for the production of polyurethane or polyisocyanurate. In order to provide aromatic polyols for the production of polyurethanes or polyisocyanurates which are process-technically suitable in terms of their viscosity and at the same time give the end product good physical properties and a good reaction to fire, esterified arylhydroxy compounds are proposed as polyols.
ALKOXYLATED (HYDROXYALKYL)AMINOPHENOL POLYMERS AND METHODS OF USE
Disclosed herein are polymers formed by the condensation of bis(hydroxycarbyl)-aminophenolic compounds with aldehydes. The condensation polymers include one or more repeat units having bis(hydroxycarbyl)amino functionality. The hydroxyl groups of the bis(hydroxycarbyl)amino functionalities are available for further condensation with an epoxide, such as ethylene oxide, to yield a polyalkoxylated polymer. The polymers are useful as antipolymerants, polymerization retardants, surfactants, or a combination of these in one or more industrial systems.
Hardening of bonding systems
The present invention provides bonding systems comprising a formaldehyde-based (urea-/melamine-/phenol-/resorcinol-formaldehyde or other combination) and/or a polymeric isocyanate resin system composition for bonding ligno-cellulosic materials to form panels and/or shaped products, which contain a resin hardener, also referred to as resin catalyst, characterised in that the hardener is activated by heat.