Crosslinked polymers made up of polymerized units of cyclic diaminoalkane, aldehyde and bisphenol-S or melamine. A method for removing heavy metals, such as Pb(II) from an aqueous solution or an industrial wastewater sample with these crosslinked polymers is introduced. A process of synthesizing the crosslinked polymers is also described.

Multicomposite material (R1, R2) including at least one monofilament (10) made of glass-resin composite including glass filaments (101) embedded in a thermoset polyester resin (102), this monofilament being covered with at least two superposed layers of different materials, a first layer (12) arranged on the surface of the monofilament and a second layer (14) of polyester thermoplastic material sheathing the whole, characterized in that the first layer (12) is a layer of benzoxazine and/or polybenzoxazine; finished articles or semi-finished products made of rubber, such as vehicle tyres, reinforced with such a material.

Multicomposite material (R1, R2) including at least one monofilament (10) made of glass-resin composite including glass filaments (101) embedded in a thermoset polyester resin (102), characterized in that said monofilament is coated with at least one layer (12) of benzoxazine; use of such a material as reinforcer in finished articles or semi-finished products made of rubber; finished articles or semi-finished products made of rubber, such as vehicle tyres, reinforced with such a material.

A composition for resist underlayer film formation contains: a first compound including at least one oxazine structure fused to an aromatic ring; and a solvent. The first compound preferably includes a partial structure represented by formula (1). In formula (1), R.sup.2 to R.sup.5 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; Ar.sup.1 represents a group obtained by removing (n+3) or (n+2) hydrogen atoms on the aromatic ring from an arene having 6 to 20 carbon atoms; R.sup.6 represents a hydroxy group, a halogen atom, a nitro group or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 0 to 9. ##STR00001##

Multicomposite material (R1, R2) including at least one monofilament (10) made of glass-resin composite including glass filaments (101) embedded in a thermoset polyester resin (102), characterized in that said monofilament is coated with at least one layer (12) of benzoxazine; use of such a material as reinforcer in finished articles or semi-finished products made of rubber; finished articles or semi-finished products made of rubber, such as vehicle tyres, reinforced with such a material.

Crosslinked polymers made up of polymerized units of cyclic diaminoalkane, aldehyde and bisphenol-S or melamine. A method for removing heavy metals, such as Pb(II) from an aqueous solution or an industrial wastewater sample with these crosslinked polymers is introduced. A process of synthesizing the crosslinked polymers is also described.

Crosslinked polymers made up of polymerized units of cyclic diaminoalkane, aldehyde and bisphenol-S or melamine. A method for removing heavy metals, such as Pb(II) from an aqueous solution or an industrial wastewater sample with these crosslinked polymers is introduced. A process of synthesizing the crosslinked polymers is also described.

A resist underlayer film for lithography has high solubility in a resist solvent (solvent used in lithography) for expressing good coating film forming property and a smaller selection ratio of dry etching rate as compared with a resist. A resist underlayer film-forming composition containing a novolac resin containing a structure (C) obtained by a reaction of an aromatic ring of an aromatic compound (A) with a hydroxy group-containing aromatic methylol compound (B). The aromatic compound (A) may be a component constituting the structure (C) in the novolac resin. The hydroxy group-containing aromatic methylol compound (B) may be a compound of Formula (1): ##STR00001## The hydroxy group-containing aromatic methylol compound (B) may be 2-hydroxybenzyl alcohol, 4-hydroxybenzyl alcohol, or 2,6-di-tert-butyl-4-hydroxymethyl phenol.

A resist underlayer film for lithography has high solubility in a resist solvent (solvent used in lithography) for expressing good coating film forming property and a smaller selection ratio of dry etching rate as compared with a resist. A resist underlayer film-forming composition containing a novolac resin containing a structure (C) obtained by a reaction of an aromatic ring of an aromatic compound (A) with a hydroxy group-containing aromatic methylol compound (B). The aromatic compound (A) may be a component constituting the structure (C) in the novolac resin. The hydroxy group-containing aromatic methylol compound (B) may be a compound of Formula (1): ##STR00001## The hydroxy group-containing aromatic methylol compound (B) may be 2-hydroxybenzyl alcohol, 4-hydroxybenzyl alcohol, or 2,6-di-tert-butyl-4-hydroxymethyl phenol.

A benzoxazine resin composition is provided. The benzoxazine resin composition includes a benzoxazine resin that is a reaction product of an amine, a phenol, and an aldehyde. Either the amine is a diamine or the phenol is a bisphenol, and the benzoxazine resin has at least one nitrogen-containing crosslinking functional group or pyrocitric functional group. A method of preparing a benzoxazine resin composition is also provided. The method includes reacting an amine, a phenol, and an aldehyde at a temperature of above 60° C., for 1 h to 5 days to form a benzoxazine resin. The benzoxazine resin has at least one nitrogen-containing crosslinking functional group or pyrocitric functional group, and either the amine is a diamine or the phenol is a bisphenol. Also provided is a cured resin made from the benzoxazine resin composition.