A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):

##STR00001##

wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B.sup.1 and B.sup.2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B.sup.1 and B.sup.2 optionally form a ring with a carbon atom bonded to B.sup.1 and B.sup.2.

A compound or a resin represented by the following formula (1).

##STR00001##

(in formula (1), each X independently represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each R.sup.1 is independently selected from the group consisting of a halogen group, a cyano group, a nitro group, an amino group, a hydroxyl group, a thiol group, a heterocyclic group, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, and combinations thereof, in which the alkyl group, the alkenyl group and the aryl group optionally include an ether bond, a ketone bond or an ester bond, each R.sup.2 independently represents an alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a thiol group or a hydroxyl group, in which at least one R.sup.2 represents a group including a hydroxyl group or a thiol group, each m is independently an integer of 0 to 7 (in which at least one m is an integer of 1 to 7.), each p is independently 0 or 1, q is an integer of 0 to 2, and n is 1 or 2.)

The present invention relates to a method for preparing a metallized open-cell foam or fibrous substrate, wherein the method comprises: (A) providing an open-cell foam or fibrous substrate, wherein the open-cell foam or fibrous substrate contains a polymer comprising heteroatom-containing moieties within the bulk of the open-cell foam or fibrous substrate or as a coating on the open-cell foam or fibrous substrate, wherein the polymer comprising heteroatom-containing moieties is selected from polyvinylpyridine, polyvinylpyrrolidone, polyvinyl alcohol, polyallylamine, polyethylene oxide, polyethylene imine, polyethylene sulfide and copolymers or blends thereof; (B) contacting the open-cell foam or fibrous substrate with nanoparticles of a first metal to provide a nanoparticle coated open-cell foam or fibrous substrate; and (C) contacting the nanoparticle coated open-cell foam or fibrous substrate with a solution comprising a salt of a second metal and a reducing agent to provide the metallized open-cell foam or fibrous substrate having a layer of the second metal on the nanoparticle coated open-cell foam or fibrous substrate.

An anti-reflective hardmask composition is provided. In an exemplary embodiment, the anti-reflective hardmask composition includes (a) a carbazole derivative polymer represented by the following Formula 1 or a polymer blend comprising the carbazole derivative polymer, and (b) an organic solvent:

##STR00001##

The present invention relates to a novel method for synthesizing olefin covalent organic framework foams, and polyimide, imine, hydrazone or Ketoenamine covalent organic frameworks (COFs). The method is a green synthetic strategy, including: under non-solvent condition, performing condensation reaction of a methyl-containing monomer and an aldehyde monomer with participation of acid anhydride or carboxylic acid compound to prepare olefin COFs; performing condensation reaction of a multihead acid anhydride or a multihead carboxylic acid monomer and an amino monomer with participation of acid anhydride or carboxylic acid compound to prepare amide COFs; and performing condensation reaction of the aldehyde monomer and the amino monomer with participation of acid anhydride, imidazole or carboxylic acid compound to prepare imine COFs. The COFs obtained by using the method have large specific surface area, regular and adjustable porous structure, and high crystallinity. The method effectively avoids use of organic solvent and risk of high pressure in the reaction process, and is suitable for large-scale preparation of COF materials.

A polymer including a structural unit represented by Chemical Formula 1, and an organic layer composition including the polymer, and method of forming patterns are provided.

##STR00001##

The Chemical Formula 1 is the same as defined in the detailed description.

A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): ##STR00001##
wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B.sup.1 and B.sup.2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B.sup.1 and B.sup.2 optionally form a ring with a carbon atom bonded to B.sup.1 and B.sup.2.

A hardmask composition, a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns that uses the hardmask layer including a cured product of the hardmask composition, the hardmask composition includes a polymer including a structural unit represented by Chemical Formula 1; and a solvent,

##STR00001##

An electrocatalyst includes a substrate and a microporous polymer on the substrate. The microporous polymer includes, in polymerized form, a triptycene of Formula (I) ##STR00001## and a phenothiazine of Formula (II) ##STR00002## where in Formula (I), R.sub.1-14 each individually represent hydrogen, an optionally substituted alkyl, an optionally substituted aryl, with at least two representing hydrogen and in Formula (II), R.sub.15-23 each individually represent hydrogen, an optionally substituted alkyl. The triptycene of Formula (I) and the phenothiazine of Formula (II) are linked by methylene units.