A special class of drug-depot forming triblock copolymers which are very suitable for the loading, containment and releasing of sensitive drugs such as proteins from biodegradable, injectable drug depots. How to visualize these depots for various imaging related purposes is described. A composition comprising a tri-block copolymer according to formula 1 B-A-B (1), wherein A stands for a linear poly-(ethylene glycol) block and wherein B stands for wherein B stands for a poly(lactide-co--caprolactone) block, wherein the hydroxyl end-groups of the tri-block copolymer are at least partially acylated with an optionally substituted acyl having 2 to 12 C-atoms, C-atoms of the substituents included; an active ingredient, preferably a pharmaceutically active ingredient and a solvent, wherein the block ratio of the tri-block copolymer, which ratio is defined as the ratio between the sum of the average molecular weight of the B-blocks and the sum of the average molecular weight of the A-block ranges from 1.4 to 3.5. This composition is suitable for controlled release of a pharmaceutically active ingredient.

Provided herein is a polymer having formula I: where m, n, and R.sup.1 are as defined herein, and the polymer has a number average molecular weight of the polymer of from 500 to 80,000 Daltons. Also provided herein are block copolymers of the polymer of formula I, as well as processes to make the polymer and block copolymers thereof.

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Block copolymers (BCPs) for self-assembly applications comprise a linear fluorinated linking group L joining a pair of adjacent blocks. A film layer comprising a BCP, which is disposed on an underlayer and in contact with an atmosphere, is capable of forming a perpendicularly oriented domain pattern when the underlayer is preferentially wetted by one domain of an otherwise identical self-assembled BCP in which all fluorines of L are replaced by hydrogen. The BCP can be a low-chi or high-chi BCP. In a preferred embodiment, the BCP comprises a styrene-based first block, and a second block comprises a carbonate and/or ester repeat unit formed by ring opening polymerization of a cyclic carbonate and/or cyclic ester monomer. The linking group L has a lower surface energy than each of the polymer blocks.

Block copolymers (BCPs) for self-assembly applications comprise a linear fluorinated linking group L joining a pair of adjacent blocks. A film layer comprising a BCP, which is disposed on an underlayer and in contact with an atmosphere, is capable of forming a perpendicularly oriented domain pattern when the underlayer is preferentially wetted by one domain of an otherwise identical self-assembled BCP in which all fluorines of L are replaced by hydrogen. The BCP can be a low-chi or high-chi BCP. In a preferred embodiment, the BCP comprises a styrene-based first block, and a second block comprises a carbonate and/or ester repeat unit formed by ring opening polymerization of a cyclic carbonate and/or cyclic ester monomer. The linking group L has a lower surface energy than each of the polymer blocks.

Provided is a liquid crystalline polyester that is excellent in dimensional stability while having a low dielectric loss tangent. The liquid crystalline polyester includes 90% by mol or more of a constitutional unit derived from an aromatic hydoxycarboxylic acid with respect to the amount of all constitutional units. In the liquid crystalline polyester, a dielectric loss tangent at a measurement frequency of 10 GHz is 1.010.sup.3 or less, a difference (anisotropy) between mold shrinkage rates in the machine direction (MD) of the injection-molded piece of the liquid crystalline polyester and a transverse direction (TD) with respect to the machine direction is 1.00 or less, and a melt viscosity measured under conditions of a shear rate of 1000/s and the melting point of the liquid crystalline polyester to the melting point+20 C. is 25 Pa.Math.s or more.

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent ##STR00001##