Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.

The present invention relates to a complex of PPSA or PSPA polymer and a virus, and a pharmaceutical composition including the same. According to the present invention, when a polymer-virus complex formed using PPSA or PSPA polymer is used, transduction efficiency thereof to cells may be enhanced, an excellent therapeutic effect may thus be obtained when used as a pharmaceutical composition, and, therefore, the pharmaceutical agent may be useful as a therapeutic agent.

Polyethylene glycol (PEG)-b-poly(-amino ester) (PBAE) co-polymers (PEG-PBAE) and blends of PEG-PBAEs and PBAEs and their use for delivering drugs, genes, and other pharmaceutical or therapeutic agents safely and effectively to different sites in the body and to different cells, such as cancer cells, are disclosed.

A functionalized nanomaterial, such as a nanoparticle, can include a polythioaminal functionalized surface. The polythioaminal linked to the surface of the nanomaterial can be bonded to a compound such as therapeutic and/or diagnostic materials. The thiol-based linkages can be used to bond the polythioaminal to both the nanomaterial and the therapeutic and/or diagnostic materials. Polythioaminals can be prepared via reactions of triazine and dithiols. Polythioaminals thus prepared can be further modified to provide linkages to the nanomaterial and other compounds such as medicinal compound, peptides, and dyes. Nanomaterials including such compounds linked thereto via the polythioaminal can be supplied for therapeutic and/or diagnostic purposes to biological target regions.

Disclosed herein are inkjet ink compositions comprising a polymer comprising the repeat units (A), (B), and (C), wherein: (A) is selected from N.sup.+(R.sub.1)(R.sub.2) and N(R.sub.1); (B) is selected from C.sub.1-C.sub.10 alkylene; C.sub.3-C.sub.20 cycloalkylene; C.sub.3-C.sub.20 heterocycloalkylene; arylene; heteroarylene; C.sub.2-C.sub.20 ether; C.sub.2-C.sub.20 thioether; C.sub.2-C.sub.20 ester; C.sub.2-C.sub.20 acetal; C.sub.2-C.sub.20 amide; bisphenols; and oligomer and polymer moieties selected from polyether, polyester, polyamines, polycarbonate, polyacetal, polythioether, polyester amide, polyurethane, polyacrylate, polyolefin, and polyalkylsiloxane, and (C) comprises at least one group selected from: (i) C(R.sub.3) (R.sub.4)C(R.sub.5)(OH)(C(R.sub.6)(R.sub.7))m-, (ii) C(R.sub.3)(R.sub.4)C(R.sub.5)(H)C(O), and (iii) C(R.sub.3)(R.sub.4) C(R.sub.5)(H) S(O)(O); and (A) is bonded to the C(R.sub.3)(R.sub.4) group of (C), and (B) is bonded to (C).

Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.

A polymer is described herein that includes a plurality of N-J-N or NCS repeating units, wherein each J is independently a carbon atom, an alkyl group, or an aryl group; a plurality of hydrophilic groups bonded with the repeating units; and a plurality of hydrophobic groups bonded with the hydrophilic groups and the repeating units. Such polymers may be made into hydrogels by exposure to water, and the hydrogels may be used as delivery vehicles for various payloads.

Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.

A polymer is described herein that includes a plurality of N-J-N or NCS repeating units, wherein each J is independently a carbon atom, an alkyl group, or an aryl group; a plurality of hydrophilic groups bonded with the repeating units; and a plurality of hydrophobic groups bonded with the hydrophilic groups and the repeating units. Such polymers may be made into hydrogels by exposure to water, and the hydrogels may be used as delivery vehicles for various payloads.

Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.