There is provided a novel polymer, a composition containing the polymer, and a novel adhesive composition containing the polymer from which a cured film having desired properties is obtained. A polymer comprising a structural unit of Formula (1): ##STR00001##
wherein Q is a bivalent group, R.sub.1 is a C.sub.1-10 alkylene group, a C.sub.2-10 alkenylene group or C.sub.2-10 alkynylene group, a C.sub.6-14 arylene group, a C.sub.4-10 cyclic alkylene group, etc., or a polymer comprising a structural unit of Formula (6): ##STR00002##
wherein Q.sub.4 is an allyl group, a vinyl group, an epoxy group, or a glycidyl group, and R.sub.5 is a bivalent organic group having a main chain containing only carbon atom or at least one of oxygen atom, nitrogen atom and sulfur atom in addition to carbon atom, a composition comprising the polymer, and an adhesive composition comprising the polymer and a solvent.

The invention concerns novel polyamines having formula (I) obtained from the reaction between a polyol diglycidylether and piperazine:

##STR00001##

in which n is a whole number between 0 and 30, R.sub.1 has different forms, R.sub.2 has formula (g.sub.5), and R.sub.2 has formula (g.sub.6) when n=0

##STR00002## R.sub.6: H, C1-C6 alkyl or hydroxyalkyl radical, R.sub.7: C1-C6 alkyl or hydroxyalkyl radical, R.sub.6 and R.sub.7 may be connected together to form a heterocycle having 5, 6, 7 or 8 atoms when R.sub.6 is other than H, R.sub.8: H, C1-C4 alkyl or hydroxyalkyl radical.

The invention also concerns their preparation method and their use in an absorbing solution based on amines in order to selectively eliminate H.sub.2S from a gaseous effluent containing H.sub.2S and CO.sub.2.

The present invention exploits reactive organophosphorus compounds containing unsaturated vinyl groups, which can be used in a flexible and highly controlled manner to prepare various macromolecular derivatives either via radical reactions or via Michael addition with suitable nucleophiles. Based on the fact that secondary amine groups on the one hand and vinyl groups on the other hand can work as mutual linking sites, an arsenal of novel and useful addition products can be built up. By selecting the number of secondary amine sites and vinyl sites of the participating reaction partners, very different addition products can be formed. In particular, one can form either linear chain type macromolecules (i.e. linear oligomers or polymers) or highly crosslinked network polymers.

The present disclosure relates to a polyimide precursor composition comprising an amic acid ester oligomer of formula (I):

##STR00001##

wherein r, R.sub.x, G, P and R are as defined in the specification. Also, a use of the polyimide precursor composition and a polyimide made from the polyimide precursor composition.

The subject is to show liquid crystal display device that has characteristics such as a short response time, a large voltage holding ratio, a low threshold voltage, a large contrast ratio, a long service life and a small flicker rate. The disclosure relates to a liquid crystal display device including an electrode group formed on one or both of a pair of substrates that are opposed to each other, and a plurality of active devices connected to the electrode group, and a liquid crystal alignment film formed on the opposing surfaces of the pair of substrates, and a liquid crystal composition sandwiched in between the pair of substrates.

Polymers are disclosed that incorporate large portions of elastomeric polyamide oligomers connected with polyisocyanates. These polymers have enhanced properties over similar polyurethanes due to better hydrolysis resistance of polyamides over polyesters and better UV resistance of polyamides over polyethers. Polyurea linkages can also improve properties over polyurethane linkages. Composites and hybrids of these polymers and other polyamides with vinyl polymers are also disclosed and claimed.

The present invention discloses a tertiary amine initiator and polymeric polyol compositions made therefrom useful for making polyurethane polymers, especially polyurethane foams. Said polyurethane polymer foams demonstrate a good balance of mechanical properties, physical properties, and low emissions. The tertiary amine initiator is one or more partially alkylated amine compound have the Structure II: RR.sup.1N(RNH).sub.y(RNR.sup.4).sub.x-yRNR.sup.2R.sup.3 wherein R is a C.sub.1 to C.sub.6 linear or branched alkyl group, R, R.sup.1, R.sup.2, and R.sup.3 are independently a hydrogen or a C.sub.1 to C.sub.6 linear or branched alkyl group with the proviso that at least one of R, R.sup.1, R.sup.2, and R.sup.3 is not hydrogen, R.sup.4 is a hydrogen or a C.sub.1 to C.sub.6 linear or branched alkyl group, x is from 1 to 33, y is from 0 to 32, and z is from 0 to 15, with the proviso that x-y is equal to or greater than 1 and the number of NH bonds in (II) is greater than 0 and less than 8.

An oligomer and a lithium battery are provided. The oligomer is obtained by reacting a maleimide, a barbituric acid, and a promoter in a solvent. The promoter has the structure represented by formula 1:

X(R).sub.3formula 1, wherein X is N or P; R is a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group. The lithium battery includes an anode, a cathode, a separator, an electrolyte solution, and a package structure, wherein the cathode includes the oligomer.

Disclosed herein are inkjet ink compositions comprising a polymer comprising the repeat units (A), (B), and (C), wherein: (A) is selected from N.sup.+(R.sub.1)(R.sub.2) and N(R.sub.1); (B) is selected from C.sub.1-C.sub.10 alkylene; C.sub.3-C.sub.20 cycloalkylene; C.sub.3-C.sub.20 heterocycloalkylene; arylene; heteroarylene; C.sub.2-C.sub.20 ether; C.sub.2-C.sub.20 thioether; C.sub.2-C.sub.20 ester; C.sub.2-C.sub.20 acetal; C.sub.2-C.sub.20 amide; bisphenols; and oligomer and polymer moieties selected from polyether, polyester, polyamines, polycarbonate, polyacetal, polythioether, polyester amide, polyurethane, polyacrylate, polyolefin, and polyalkylsiloxane, and (C) comprises at least one group selected from: (i) C(R.sub.3) (R.sub.4)C(R.sub.5)(OH)(C(R.sub.6)(R.sub.7))m-, (ii) C(R.sub.3)(R.sub.4)C(R.sub.5)(H)C(O), and (iii) C(R.sub.3)(R.sub.4) C(R.sub.5)(H) S(O)(O); and (A) is bonded to the C(R.sub.3)(R.sub.4) group of (C), and (B) is bonded to (C).

A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent. ##STR00001##
(wherein R.sub.1 is a C.sub.1-6 alkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, R.sub.2 is a hydrogen atom, a C.sub.1-6 alkyl group, hydroxy group, halogeno group, or ester group of C(O)OX wherein X is a C.sub.1-6 alkyl group optionally having a substituent, R.sub.3 is a hydrogen atom, a C.sub.1-6 alkyl group, hydroxy group, or halogeno group, R.sub.4 is a direct bond or divalent C.sub.1-8 organic group, R.sub.5 is a divalent C.sub.1-8 organic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.)