An infrared absorption composition includes a p-type semiconductor compound including a first structural unit represented by Chemical Formula 1 and a second structural unit including an electron donating moiety; and an n-type semiconductor compound represented by Chemical Formula 2:

##STR00001## wherein, in Chemical Formula 1, Ar.sup.1, X, R.sup.1a, and R.sup.2a are the same as defined in the detailed description. In Chemical Formula 2, A.sup.1, A.sup.2, D.sup.1, D.sup.2, and D.sup.3 are the same as defined in the detailed description.

Phthalonitrile adhesive formulations are provided. Such an adhesive formulation may comprise an etherimide-phthalonitrile oligomer having formula

##STR00001## wherein R.sub.1 is an unsubstituted or substituted aryl group or an unsubstituted or substituted cycloalkyl group; R.sub.2 is an unsubstituted or substituted aryl group and n has a value of from 1 to 30. Also provided are methods of making and using the adhesive formulations.

Provided are printable gel or hydrogel compositions, methods of making printable gel or hydrogel compositions, uses of the printable gel or hydrogel compositions, objects formed from the printable gel or hydrogel compositions, and methods of using those objects. The printable gel or hydrogel compositions may be formed from a graphene component, a polymer component, and a carrier. The printable gel or hydrogel compositions may be used as inks in additive manufacturing techniques to 3D print a 3D object. The 3D object may be freeze-dried to form an aerogel. The aerogel may be used to remove contaminants from aqueous samples.

The present Specification provides a di-polycyclic compound, and a polymer chain consisting of alternating electron donor compounds and electron acceptor compounds, which include the di-polycyclic compound.

A polymer is disclosed, represented by Chemical Formula 1 or Chemical Formula 2: ##STR00001## wherein, in Chemical Formula 1 and Chemical Formula 2, Ar.sup.1, Ar.sup.2, R.sup.3, s, x, and y are defined in the detailed description.

Metallopolymers of formula (I) where R.sup.1 and R.sup.1′; and R.sup.2 and R.sup.2′ are independently of each other, a C.sub.2-C.sub.10 alkyl group; X is CR3R3′ or NR4; R.sup.3 and R.sup.3′ are, independently of each other, as is R.sup.4, a C.sub.2-C.sub.10 alkyl group; L is a C.sub.4-C.sub.10 alkylene group; Ln.sup.1 and Ln.sup.2 are, independently of each other, chosen from the lanthanide cations; L.sup.1 and L.sup.2 are, independently of each other, chosen from the α-diketonate ligands; T is a neutral bidentate Lewis base including two coordinating nitrogen atoms; .fwdarw. represents a coordination of group T via the two nitrogen atoms of T to Ln.sup.1 and Ln.sup.2 respectively; Ln.sup.1 and Ln.sup.2 are, independently of each other, chosen from the lanthanide cations; L.sup.1 and L.sup.2 are, independently of each other, chosen from the β-diketonate, picolinate or dipicolinate monoanionic ligands; 0.01<x<0.50; 0<y<0.49, with x+y=0.50.

The present invention relates to a polymer which comprises at least one structural unit which contains at least one aldehyde group, and to a process for the preparation of a crosslinkable or crosslinked polymer including a polymer which contains aldehyde groups. The present invention thus also relates to a crosslinkable polymer and a crosslinked polymer which is prepared by the process according to the invention, and to the use of this crosslinked polymer in electronic devices, in particular in organic electroluminescent devices, so-called OLEDs (OLED=organic light emitting device).

The present invention relates to a metal phthalocyanine polymer that includes a repeating structural unit obtained by amide bonding of a structural unit represented by the following general formula (1a) to a structural unit represented by the following general formula (2a): ##STR00001## With general formula (1a), L is a divalent or trivalent metal ion belonging to Period 3 to Period 5 on the long-form periodic table. With general formula (2a), M is a divalent or trivalent metal ion belonging to Period 3 to Period 5 on the long-form periodic table.

A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.

A polymer, an organic layer composition, an organic layer, and a method of forming patterns, the polymer including a moiety represented by the following Chemical Formula 1: ##STR00001##