Provided is a manufacturing method of a graphene-based liquid crystal fiber including: polymerizing a first aromatic monomer on a graphene-based compound to prepare a graphene composite in which a first aromatic polymer is surface-polymerized on the graphene-based compound; wet-spinning the graphene composite to manufacture a hydrogel fiber; and polymerizing a second aromatic monomer on the hydrogel fiber to fill pores of the hydrogel fiber with a second aromatic polymer.

A method for detecting or comparing mechanical strength of macro-molecular polymer materials. The detecting method has the steps of measuring the mechanical strength and the maximum value of the fluorescence absorption spectrum of each of the plurality of samples to form a curve relationship or function relationship between the maximum value of the fluorescence absorption spectrum and the mechanical strength; measuring the maximum value of the fluorescence absorption spectrum of the target material, and using the curve relationship or the function relationship to obtain the mechanical strength of the target material. The plurality of samples and the target material are both prepared from a macro-molecular polymer, and the macro-molecular polymer may be composed of disulfonate-difluorobenzophenone, hydroxyindole and difluorobenzophenone as monomers, and the sulfonate groups of the disulfonate-difluorobenzophenone have metal cations. An object of the method is to identify mechanical properties of polymer materials by fluorescence nondestructive detection.

The polymerizable composition of the present application may exhibit a wide process window to have excellent workability, and may form a phthalonitrile resin having excellent heat resistance or a prepolymer thereof.

A hard-mask forming composition including a resin (P1) having a repeating structure (u1) represented by General Formula (u1-0), wherein Ar.sup.01 and Ar.sup.02 are aromatic hydrocarbon groups which may have a substituent, Ar.sup.02 has at least one nitrogen atom or oxygen atom, L.sup.01 and L.sup.02 are each independently a single-bonded or divalent linking group, and X is NH.sub.4 and the like

##STR00001##

A hard-mask forming composition that forms a hard mask that is used in lithography, the hard-mask forming composition including at least one of a compound represented by General Formula (sc-1) and a resin having a partial structure represented by General Formula (sc-p1). In the general formula, R.sup.11 and R.sup.12 are organic groups having 1 to 40 carbon atoms or hydrogen atoms; R.sup.13 and R.sup.14 are aromatic hydrocarbon groups having 6 to 30 carbon atoms which may have a substituent; R.sup.13 and R.sup.14 may be bonded to each other to form a structure having an aromatic heterocyclic ring, and the hydrogen atom of the phenylene group in the formula may be substituted with a substituent

##STR00001##

The present application relates to a polymerizable composition, a prepolymer, a phthalonitrile resin, a composite, a method for producing the same, and a use thereof. The present application can provide a polymerizable composition, a prepolymer and a phthalonitrile resin capable of forming a composite showing proper curing property, melting temperature and process window and having excellent physical properties such as heat resistance and rigidity.

Provided is a phthalonitrile-based resin, comprising repeat units formed by the reaction of a phthalonitrile compound and a curing agent,

wherein the phthalonitrile compound comprises 4,4-bis(3,4-dicyanophenoxy)diphenyloxide of the following Chemical Formula 1 and 4,4-bis(3,4-dicyanophenoxy)biphenyl of the following Chemical Formula 2 at a weight ratio of 30:70 to 90:10:

##STR00001##

A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1) as a repeating unit, and an organic solvent. Each of AR1 and AR2 represents a benzene ring or naphthalene ring which optionally have a substituent; W.sub.1 represents a particular partial structure having a triple bond, and the polymer optionally contains two or more kinds of W.sub.1; and W.sub.2 represents a divalent organic group having 6 to 80 carbon atoms and at least one aromatic ring. This invention provides: a polymer curable even under film formation conditions in an inert gas and capable of forming an organic film which has not only excellent heat resistance and properties of filling and planarizing a pattern formed in a substrate, but also favorable film formability onto a substrate with less sublimation product; and a composition for forming an organic film, containing the polymer.

##STR00001##

Black photoactive materials that comprise synthetic eumelanin polymers are provided, as are methods of making and using the polymers. The synthetic eumelanin polymers are made from the plant oil vanillin, and exhibit defined structural and chemical characteristics (e.g. homogeneity, solubility, etc.) that make them suitable for use in devices that require photoactive materials, such as solar cells.

The present application relates to a phthalonitrile resin and the like. The present application can provide a phthalonitrile resin, and a polymerizable composition and prepolymer using the same, which can exhibit excellent curability, a suitable processing temperature and a wide process window, and form a composite having excellent physical properties. Also, according to the present invention, there may be provided a phthalonitrile resin, and a polymerizable composition and prepolymer using the same, which can exhibit appropriate viscosity characteristics and thus provide a final product without deterioration of mechanical physical properties or the like due to bubbles generated during processing.