Patent classifications
C08G77/30
POLYSILOXANE-BASED COMPOUND, SILICON NITRIDE LAYER ETCHING COMPOSITION INCLUDING THE SAME
Provided are a polysiloxane-based compound, a selective etching composition with respect to a silicon nitride layer including the polysiloxane-based compound, and a method of manufacturing a semiconductor device including the etching composition. The silicon nitride layer etching composition including the polysiloxane-based compound may selectively etch the silicon nitride layer relative to a silicon oxide layer, and have a significantly excellent etch selectivity ratio, and a small change in etch rate and a small change in etch selectivity ratio with respect to the silicon nitride layer even when time for using the composition increases or the composition is repeatedly used.
POLYSILOXANE-BASED COMPOUND, SILICON NITRIDE LAYER ETCHING COMPOSITION INCLUDING THE SAME
Provided are a polysiloxane-based compound, a selective etching composition with respect to a silicon nitride layer including the polysiloxane-based compound, and a method of manufacturing a semiconductor device including the etching composition. The silicon nitride layer etching composition including the polysiloxane-based compound may selectively etch the silicon nitride layer relative to a silicon oxide layer, and have a significantly excellent etch selectivity ratio, and a small change in etch rate and a small change in etch selectivity ratio with respect to the silicon nitride layer even when time for using the composition increases or the composition is repeatedly used.
PHOTOSENSITIVE COMPOSITION COMPRISING ORGANIC METAL COMPOUND AND POLYSILOXANE COPOLYMER, AND PREPARATION METHOD THEREFOR
The present invention provides a photosensitive composition comprising a copolymer of an organometallic compound and polysiloxane that may be used in a photosensitive material for a display or semiconductor, and a method for preparing the same.
PHOTOSENSITIVE COMPOSITION COMPRISING ORGANIC METAL COMPOUND AND POLYSILOXANE COPOLYMER, AND PREPARATION METHOD THEREFOR
The present invention provides a photosensitive composition comprising a copolymer of an organometallic compound and polysiloxane that may be used in a photosensitive material for a display or semiconductor, and a method for preparing the same.
Use of Aqueous Dispersion of Siloxane for Reducing Grain Puffing of Wood Substrate and Article Comprising Anti-Grain Puffing Coating
The present disclosure relates to use of an aqueous dispersion of siloxane for reducing grain puffing of a wood substrate and an article comprising an anti grain puffing coating. The article comprises (a) a wood substrate having at least one major surface; (b) an anti grain puffing coating directly applied on the major surface of the wood substrate, formed from an aqueous dispersion of siloxane; and (c) one or more coatings applied on the anti grain puffing coating, formed from an aqueous coating composition, wherein the siloxane contains one or more hydrophobic group and one or more hydrophilic group chemically bonded to its molecule skeleton; and wherein the siloxane has a particle size in the range of 5 to 100 nm.
Use of Aqueous Dispersion of Siloxane for Reducing Grain Puffing of Wood Substrate and Article Comprising Anti-Grain Puffing Coating
The present disclosure relates to use of an aqueous dispersion of siloxane for reducing grain puffing of a wood substrate and an article comprising an anti grain puffing coating. The article comprises (a) a wood substrate having at least one major surface; (b) an anti grain puffing coating directly applied on the major surface of the wood substrate, formed from an aqueous dispersion of siloxane; and (c) one or more coatings applied on the anti grain puffing coating, formed from an aqueous coating composition, wherein the siloxane contains one or more hydrophobic group and one or more hydrophilic group chemically bonded to its molecule skeleton; and wherein the siloxane has a particle size in the range of 5 to 100 nm.
INVISIBLE FINGERPRINT COATINGS AND PROCESS FOR FORMING SAME
A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate an alkyl silane, a POSS, or a mixture thereof.
WATER-REPELLENT COATING COMPOSITION AND WATER-REPELLENT COATING SUBSTRATE COATED THEREWITH
A water-repellent coating composition, and particularly, a water-repellent coating composition having improved adhesion and durability by including a phosphoric acid or a phosphoric acid-based compound, is provided.
Method for preparing a siloxane based polymeric liquid material and materials made therefrom
A polymeric liquid material formed of molecular building blocks of core-shell type architecture, wherein each building block consists of a hyperbranched polysiloxane core and a functional siloxane shell peripherally attached thereto, the material comprising bridging oxygen moieties (SiOSi), hydrolysable alkoxy moieties (SiOR) and organofunctional moieties (RSi) and (R.sub.1S1-R.sub.2) and less than 0.5 mass percent hydroxy moieties (SiOH). The core has a degree of polymerization DP.sub.core in the range of 1.3 to 2.7, the shell is formed of R-substituted siloxane moieties and has a degree of polymerization DP.sub.shell in the range of 0.3 to 2.5. At least 75 atomic percent of all Si atoms in the core are bonded exclusively to alkoxy or bridging oxygens, the remainder each being bonded to 3 oxygens and 1 carbon. The total Si to free hydrolysable alkoxy molar ratio in the material is 1:1.25 to 1:2.75, and the material has a viscosity in the range of 10-100,000 cP. A method for preparing the polymeric liquid material relies on first forming the hyper-branched polysiloxane core followed by a build-up of the functional siloxane shell. To do so, a reaction scheme based on adding stoichiometric amounts of acetic anhydride in a water-free environment is exploited.
PREPARATION METHOD OF FLUORINE-SILICON-CONTAINING POLYPHOSPHATE ESTER AND APPLICATION THEREOF
Disclosed are a fluorine-silicon-containing polyphosphate ester and method for preparation thereof, having a chemical structural formula of:
##STR00001##
wherein R .sub.1 is
##STR00002##
R .sub.2 is
##STR00003##
n=10100. The fluorine-silicon-containing polyphosphate ester of the present invention uses silicon phosphorus and fluorine for improving flame retardancy. Phosphorus catalyzes the system to form a phosphorus-rich carbon layer, performing a protective-layer function and thereby preventing further breakdown of the epoxy resin. The silicon-containing epoxy resin forms a silica-containing carbon layer during the process of combustion, strengthening the carbon-layer structure and further improving the protective function of the carbon-layer. The introduction of elemental fluorine improves the thermal stability of the epoxy resin, thereby improving the flame retardancy performance of the system.