The present invention relates to an intermediate for preparing porous silicon oxycarbide, a method of preparing the same, and a lithium secondary battery including porous silicon oxycarbide prepared from the same as a negative electrode active material. According to the present invention, since an intermediate prepared by adding a polyhedral oligomeric silsesquioxane (POSS) to a reaction mixture for preparing silicon oxycarbide, which is composed of a polysiloxane polymer and an aromatic compound, is pyrolyzed to prepare porous silicon oxycarbide (SiOC), although the content of a free carbon region is lower compared to conventional silicon oxycarbide, the cage structure of the POSS is maintained in the pyrolysis to form many pores uniformly distributed in the SiOC matrix, and thus rapid diffusion of electrolyte ions is possible, and because the contents of SiO.sub.3C and SiO.sub.2C.sub.2 in the SiOC matrix are increased, a reversible capacity in the Si—O—C phase can be enhanced.

The present invention relates to a siloxane-based liquid crystalline elastomer, preferably an exchangeable siloxane-based liquid crystalline elastomer, derived from monomers (A1), (B1) and (C1), wherein (C1) is an acyclic or cyclic vinyl siloxane, and (A1) and (B1) have the following formulae:

##STR00001##

wherein is a mesogen, and
R.sup.x and R.sup.y are independently selected from hydrogen or substituted or unsubstituted C.sub.1-12 alkyl;

##STR00002##

wherein is an organic group.

The present invention relates to a siloxane-based liquid crystalline elastomer, preferably an exchangeable siloxane-based liquid crystalline elastomer, derived from monomers (A1), (B1) and (C1), wherein (C1) is an acyclic or cyclic vinyl siloxane, and (A1) and (B1) have the following formulae:

##STR00001##

wherein is a mesogen, and
R.sup.x and R.sup.y are independently selected from hydrogen or substituted or unsubstituted C.sub.1-12 alkyl;

##STR00002##

wherein is an organic group.

A photosensitive resin composition comprising (A) a silicone resin containing an epoxy and/or phenolic hydroxyl group, (B) a photoacid generator, and (C) a cure promoter selected from diazabicycloundecene, diazabicyclononene, an organic salt of diazabicycloundecene derivative, and an organic salt of diazabicyclononene derivative is shelf stable. A photosensitive resin coating obtained therefrom may be processed to form a fine size pattern. The resin coating has improved film properties including chemical resistance, adhesion to substrates, mechanical properties, electric insulation, and copper migration resistance, and is thus fully reliable as an insulating protective film.

The present invention provides a method for covering a substrate, and includes the following operations: (a) admixing at least four different silane monomers and at least one bi-silane to a first solvent(s) to form a mixture, with the proviso that at least one of the silane monomers or the bi-silane comprises an active group capable of achieving cross-linking to adjacent siloxane polymer chains of the siloxane polymer composition; (b) subjecting the mixture to an acid treatment so that the silane monomers are at least partially hydrolysed, and the hydrolysed silane monomers, the silane monomers and the bi-silane are at least partially polymerized and cross-linked; (c) optionally changing the first solvent to a second solvent; and (d) subjecting the mixture to further cross-linking of the siloxane polymer to achieve a predetermined degree of cross-linking, depositing the siloxane polymer composition on the substrate, and optionally curing the deposited siloxane polymer composition.

A resin composition including the following (A) to (D): (A) a resin containing epoxy groups in the range of 140 to 5000 g/eq as an epoxy equivalent; (B) a phenolic curing agent; (C) a curing accelerator; and (D) at least one compound selected among what is expressed by the following formulae (0-1) to (0-5). This provides a resin composition having small warpage and excellent adhesive force, a high adhesion resin composition film made into a film form from the composition, a semiconductor laminate having a cured product of the film and its production method, a semiconductor device obtained by dicing the semiconductor laminate into individual chips and its production method. ##STR00001##

The problem of the present invention is to provide: a thermoplastic resin having excellent heat resistance and excellent flame retardancy and having a siloxane constituent unit, particularly a thermoplastic resin suitable for optical applications; a composition containing the thermoplastic resin; and others. The problem is solved by a thermoplastic resin containing a structural unit (A) represented by general formula (I). (In general formula (I), Ra to Rct independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms in total and optionally having a substituent, or an aryl group having 6 to 30 carbon atoms in total and optionally having a substituent; Xa and Xb independently represent an alkyl group having 1 to 20 carbon atoms in total and optionally having a substituent, or an aryl group having 6 to 30 carbon atoms in total and optionally having a substituent; the substituent is any one of a halogen atom, a cyano group, an alkenyl group, an alkynyl group and an alkoxy group; and m represents an integer of 1 to 3.)

##STR00001##

The problem of the present invention is to provide: a thermoplastic resin having excellent heat resistance and excellent flame retardancy and having a siloxane constituent unit, particularly a thermoplastic resin suitable for optical applications; a composition containing the thermoplastic resin; and others. The problem is solved by a thermoplastic resin containing a structural unit (A) represented by general formula (I). (In general formula (I), Ra to Rct independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms in total and optionally having a substituent, or an aryl group having 6 to 30 carbon atoms in total and optionally having a substituent; Xa and Xb independently represent an alkyl group having 1 to 20 carbon atoms in total and optionally having a substituent, or an aryl group having 6 to 30 carbon atoms in total and optionally having a substituent; the substituent is any one of a halogen atom, a cyano group, an alkenyl group, an alkynyl group and an alkoxy group; and m represents an integer of 1 to 3.)

##STR00001##

The present invention relates to silicone hydrogels exhibiting desired combinations of physical and mechanical properties, formed from a reactive monomer mixture comprising at least one N-alkyl methacrylamide, and at least one silicone-containing component. These silicone hydrogels may also contain hydrophilic components, crosslinking agents and toughening monomers. These silicone hydrogels are useful in preparing biomedical devices, ophthalmic lenses, and contact lenses.

The present invention relates to silicone hydrogels exhibiting desired combinations of physical and mechanical properties, formed from a reactive monomer mixture comprising at least one N-alkyl methacrylamide, and at least one silicone-containing component. These silicone hydrogels may also contain hydrophilic components, crosslinking agents and toughening monomers. These silicone hydrogels are useful in preparing biomedical devices, ophthalmic lenses, and contact lenses.