Patent classifications
C08G2261/122
Organic semiconductors
The invention relates to novel compounds containing one or more units derived from 2,6-disubstituted-[1,5]naphthyridine or 1,6-disubstituted-1H-[1,5]naphthyridine-2-one, to methods for their preparation and educts or intermediates used therein, to mixtures and formulations containing them, to the use of the compounds, mixtures and formulations as organic semiconductors in organic electronic (OE) devices, especially in organic photovoltaic (OPV) devices and organic photodetectors (OPD), and to OE, OPV and OPD devices comprising these compounds, mixtures or formulations.
UV Excitable Polyfluorene Based Conjugates and Their Use in Methods of Analyte Detection
The invention provides for UV excitable polyfluorene based conjugates and their use in methods of analyte detection.
HIGH SELECTIVITY AND HIGH CO2 PLASTICIZATION RESISTANT POLYMERIC MEMBRANES FOR GAS SEPARATIONS
A high selectivity and high CO.sub.2 plasticization resistant polymer comprises a plurality of repeating units of formula (I) for gas separation applications. The polymer may be synthesized from a superacid catalyzed poly(hydroalkylation) reaction.
##STR00001##
Membranes made from the polymer and gas separation processes using the membranes made from the polymer are also described.
Unsymmetrical benzothiadiazole-based random copolymers
A random copolymer comprising the monomer units A, B and C. In this random copolymer A comprises ##STR00001##
B comprises ##STR00002##
and C comprises an aryl group. Additionally, R1 R2, R3 and R4 are side chains independently selected from the group consisting of: H, Cl, F, CN, alkyl, alkoxy, alkylthio, ester, ketone and aryl groups. X1 and X2 are independently selected from the group consisting of: H, Cl, F, CN, alkyl, alkoxy, ester, ketone, amide and aryl groups.
Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate
Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G′) curve and a loss modulus (G″) curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30° C. to 300° C., a heating rate of 3° C./min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40° C. and lower than or equal to 200°.
Methods and systems of organic semiconducting polymers
A polymer comprising: ##STR00001## In this embodiment, R′ and R″, can be independently selected from the group consisting of: a halogen, a substituted alkyl, an unsubstituted alkyl, a substituted aryl, and an unsubstituted aryl. Additionally, X.sub.1 and X.sub.2 can be independently selected from the group consisting of: O, S, Se, N—R, and Si—R—R. Lastly, Ar and Ar′ can be identical or different and can be independently selected from the group consisting of: a substituted aryl, and an unsubstituted aryl.
LIGHT EMITTING MARKER AND ASSAY
A method of identifying a target analyte in which a sample containing a light-emitting marker configured to bind to the target analyte is irradiated and emission from the light-emitting marker is detected. The light-emitting marker comprises a light-emitting material comprising a group of formula (I): X is one of N and B and Y is the other of N and B; Ar.sup.1 and Ar.sup.2 independently are an unsubstituted or substituted an aromatic or heteroaromatic group which is unsubstituted or substituted with one or more substituents. Ar1 and Ar2 bound to the same X group may be linked by a direct bond or a divalent group. The group of formula (I) may be a repeat unit of a light-emitting polymer. The light-emitting marker may be used in flow cytometry.
##STR00001##
Unsymmetrical benzothtadiazole-based random copolymers
A random copolymer comprising the monomer units A and B. In this random copolymer A comprises ##STR00001##
and B comprises ##STR00002##
Additionally, R1 R2, R3 and R4 are side chains independently selected from the group consisting of: H, Cl, F, CN, alkyl, alkoxy, alkylthio, ester, ketone and aryl groups. X1 and X2 are independently selected from the group consisting of: H, Cl, F, CN, alkyl, alkoxy, ester, ketone, amide and aryl groups.
VERTICAL ALIGNMENT LAYER COMPRISING CYCLIC OLEFIN COPOLYMER
The present invention relates to a vertical alignment layer including a cyclic olefin copolymer, and more specifically, the present invention relates to a vertical alignment layer capable of having alignment even in a low temperature process, and exhibiting excellent liquid crystal vertical alignment by including a cyclic olefin copolymer having a specific substituent.
POLYTHIOPHENE DERIVATIVE, METHOD FOR PRODUCING SAME, POSITIVE ELECTRODE ACTIVE MATERIAL FOR SECONDARY BATTERIES, AND SECONDARY BATTERY
A polythiophene derivative including a repeating unit represented by General Formula (1) below:
##STR00001## where R.sup.1 and R.sup.2 each independently denote a group having from 2 through 9 carbon atoms represented by —(R.sup.3—S).sub.p—R.sup.4 (where R.sup.3 denotes an alkylene group having from 1 through 4 carbon atoms, R.sup.4 denotes an alkyl group having from 1 through 6 carbon atoms or an aromatic group having from 5 through 6 carbon atoms, and p denotes an integer of 1 or 2), Ar denotes an optionally substituted divalent or monovalent aromatic ring moiety or aromatic heterocyclic moiety, m denotes a natural number of 2 or more, and n denotes a natural number of 0 or 2 or more.