Patent classifications
C08G2261/148
LIGHT EMITTING MARKER AND ASSAY
A method of identifying a target analyte in which a sample containing a light-emitting marker configured to bind to the target analyte is irradiated and emission from the light-emitting marker is detected. The light-emitting marker comprises a light-emitting material comprising a group of formula (I): X is one of N and B and Y is the other of N and B; Ar.sup.1 and Ar.sup.2 independently are an unsubstituted or substituted an aromatic or heteroaromatic group which is unsubstituted or substituted with one or more substituents. Ar1 and Ar2 bound to the same X group may be linked by a direct bond or a divalent group. The group of formula (I) may be a repeat unit of a light-emitting polymer. The light-emitting marker may be used in flow cytometry.
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INFRARED ABSORPTION COMPOSITION, AND INFRARED ABSORPTION FILM, PHOTOELECTRIC DEVICE, SENSOR, IMAGE SENSOR, AND ELECTRONIC DEVICE INCLUDING THE SAME
An infrared absorption composition includes a p-type semiconductor compound including a first structural unit represented by Chemical Formula 1 and a second structural unit including an electron donating moiety; and an n-type semiconductor compound represented by Chemical Formula 2:
##STR00001## wherein, in Chemical Formula 1, Ar.sup.1, X, R.sup.1a, and R.sup.2a are the same as defined in the detailed description. In Chemical Formula 2, A.sup.1, A.sup.2, D.sup.1, D.sup.2, and D.sup.3 are the same as defined in the detailed description.
SMALL MOLECULE FILMS FOR SACRIFICIAL BRACING, SURFACE PROTECTION, AND QUEUE-TIME MANAGEMENT
The present disclosure relates to methods of forming a film including small molecules. Such methods can optionally include removing such small molecules, such as by way of sublimation, evaporation, or conversion to a more volatile form.
Unsymmetrical benzothtadiazole-based random copolymers
A random copolymer comprising the monomer units A and B. In this random copolymer A comprises ##STR00001##
and B comprises ##STR00002##
Additionally, R1 R2, R3 and R4 are side chains independently selected from the group consisting of: H, Cl, F, CN, alkyl, alkoxy, alkylthio, ester, ketone and aryl groups. X1 and X2 are independently selected from the group consisting of: H, Cl, F, CN, alkyl, alkoxy, ester, ketone, amide and aryl groups.
POLYPHENYLENES, METHODS, AND USES THEREOF
Described herein are anionic phenylene oligomers and polymers, and devices including these materials. The oligomers and polymers can be prepared in a convenient and well-controlled manner, and can be used in cation exchange membranes. Also described is the controlled synthesis of anionic phenylene monomers and their use in synthesizing anionic oligomers and polymers, with precise control of the position and number of anionic groups.
FORMAMIDE MONOMERS AND POLYMERS SYNTHESIZED THEREFROM
Formamide group-containing monomers and polymers made by polymerizing the monomers are provided. Also provided are methods of polymerizing the monomers and methods of synthesizing functionalized polymers by pre- and/or post-polymerization functionalization. The monomers are non-toxic and can generate highly reactive isocyanate and isonitrile precursors in a one-pot synthesis that enables the incorporation of complex functionalities into the side-chain of the polymers that are synthesized from the monomers.
COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM
An organic film forming composition, containing: a material shown by formula (I) and/or (II); and an organic solvent, where R.sub.1 and R.sub.4 each represent a hydrogen atom, an allyl or propargyl group, R.sub.2 and R.sub.5 each represent a substituent, R.sub.3 and R.sub.6 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkynyl group having 2 to 4 carbon atoms, or an alkenyl group having 2 to 4 carbon atoms. “m” and “i” represent 0 or 1, “k” and “q” represent an integer of 0 to 2, “n” represent 1 or 2, “h”, and “j” represent an integer of 0 to 2 and satisfy the relationship 1≤h+j≤4, and “1” and “r” represent 0 or 1. W represents a single bond or divalent group shown by formulae (3). Each V independently represents a hydrogen atom or linking moiety.
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ORGANIC SEMICONDUCTING COMPOSITION
The invention relates to a novel composition comprising n-type organic semiconducting (OSC) polymers and p-type OSCs, to its use as organic semiconductors in, or for the preparation of, organic electronic (OE) devices, especially organic photovoltaic (OPV) devices, perovskite-based solar cell (PSC) devices, organic photo-detectors (OPD), organic field effect transistors (OFET) and organic light emitting diodes (OLED), and to OE, OPV, PSC, OPD, OFET and OLED devices comprising the compositions.
Proton exchange membrane material and methods of making the same
Hydrocarbon proton exchange membranes are disclosed that are composed of a material including a hydrophobic main chain, and acidic side chains. The main chain includes a polyaryl structure that is substantially free of ether linkages and also includes a fluoromethyl substituted carbon. The acidic side chains include a hydrocarbon tether terminated by a strongly acidic group, such as a fluoroalkyl sulfonate group. Chemical stability of the material is increased by removing the ether linkages from the main chain. The hydrophobic main chain and substantially hydrophilic side chains create a phase-separated morphology that affords enhanced transport of protons and water across the membrane even at low relative humidity levels. These materials are advantageous as membranes for use in fuel cells, redox flow batteries, water hydrolysis systems, sensors, electrochemical hydrogen compressors, actuators, water purifiers, gas separators, etc.
Hard mask-forming composition and method for manufacturing electronic component
A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.