Patent classifications
C08G2261/228
COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM
An organic film forming composition, containing: a material shown by formula (I) and/or (II); and an organic solvent, where R.sub.1 and R.sub.4 each represent a hydrogen atom, an allyl or propargyl group, R.sub.2 and R.sub.5 each represent a substituent, R.sub.3 and R.sub.6 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkynyl group having 2 to 4 carbon atoms, or an alkenyl group having 2 to 4 carbon atoms. “m” and “i” represent 0 or 1, “k” and “q” represent an integer of 0 to 2, “n” represent 1 or 2, “h”, and “j” represent an integer of 0 to 2 and satisfy the relationship 1≤h+j≤4, and “1” and “r” represent 0 or 1. W represents a single bond or divalent group shown by formulae (3). Each V independently represents a hydrogen atom or linking moiety.
##STR00001##
FUSED DITHIENO BENZOTHIADIAZOLE POLYMERS FOR ORGANIC PHOTOVOLATICS
A method of reacting
##STR00001##
with
##STR00002##
to produce
##STR00003##
In this method Y.sub.1 and Y.sub.2 are independently selected from the group consisting of: H, Cl, Br, I, and combinations thereof. Additionally in this method M is selected from the group consisting of H, trialkylstannane, boronate, or ZnX, wherein X is Cl, Br, or I. Furthermore in this method Z is a divalent linking group selected from the group consisting of:
##STR00004##
Lastly, in this method R.sub.1 is selected from: H, unsubstituted or substituted branched alkyls with 1 to 60 carbon atoms or unsubstituted or substituted linear alkyls with 1 to 60 carbon atoms.
Hard mask-forming composition and method for manufacturing electronic component
A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.
COMPOUND FOR USES IN OPTICAL AND ELECTROOPTICAL DEVICES
A compound having the following formula:
##STR00001##
which can also be embedded into a conjugated oligomeric of polymeric backbone, is proposed for optical and electro optical applications.
Organic solar cell
The present specification relates to an organic solar cell including a first electrode; a second electrode; and one or more organic material layers including a photoactive layer, wherein the photoactive layer includes an electron donor and an electron acceptor, the electron donor includes a polymer including a first unit represented by Chemical Formula 1; a second unit represented by Chemical Formula 2; and a third unit represented by Chemical Formula 3, and the electron acceptor includes a non-fullerene-based compound.
Oligomer resin compositions
A resin has a structure defined by Formula (I) ##STR00001## wherein: (a) each R.sub.5 is independently a methylene group (CH.sub.2), or a methylene group substituted with one or more —H, —CH.sub.3, or halogen functionalities; (b) each R.sub.6 is independently a bond or a straight-chain or branched, linear or cyclic, saturated or unsaturated, substituted or unsubstituted, aliphatic or aromatic group having between 1 and 2 carbon atoms; (c) each X is independently a functionality possessing at least one non-aromatic alkene or alkyne moiety; (d) each Z is independently either H or X; (e) each Z is independently either H or X, and each p is independently an integer from 1-4; (f) each w is independently 0, or an integer greater than or equal to 1, and (i) when w is 0, the bracket region represents a bond and n is 0, or an integer greater than or equal to 1; and (ii) when n is 0, the bracket region represents a bond. The resin is especially well suited for use in a base station, circuit board, server, router, radome or satellite structure, as well as such processes as digital light printing (DLP), continuous liquid interface printing (CLIP), and Stereolithography (SL).
POLYMER DYE MODIFICATION AND APPLICATIONS
Water-soluble photoactive polymers, included polymer tandem dyes, as described as well as methods for their preparation and use. The photoactive polymers can be prepared by direct modification of core polymers (e.g., violet excitable polymers) with dyes or other functional groups. Methods of detecting analytes using the polymers are also described.
Polymer, method of preparing the same, and organic optoelectric device including the same
Provided are a novel polymer, a method of preparing the same, and an organic semiconductor device including the same. According to the present invention, the fluorine content-controlled polymer is employed in an organic active layer, thereby providing an organic optoelectric device representing improved power conversion efficiency (PCE).
MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE
A material for forming an underlayer film according to the present invention is a material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the material including a cyclic olefin polymer which has a repeating structural unit [A] represented by Formula (1) and a repeating structural unit [B] represented by Formula (2), in which a molar ratio [A]/[B] of the structural unit [A] to the structural unit [B] in the cyclic olefin polymer is greater than or equal to 5/95 and less than or equal to 95/5.
##STR00001##
Composition for forming organic film, patterning process, and polymer
A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1A) or (1B), and an organic solvent, where Ar.sub.1 and Ar2 represent a benzene ring or naphthalene ring which optionally have a substituent; X represents a single bond or methylene group; a broken line represents a bonding arm; R represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and W.sub.1 represents a hydroxyl group, an alkyloxy group having 1 to 10 carbon atoms, or an organic group having at least one aromatic ring optionally having a substituent. A composition for forming an organic film, the composition containing a polymer with high carbon content and thermosetting property as to enable high etching resistance and excellent twisting resistance; a patterning process using the composition; and a polymer suitable for the composition for forming an organic film. ##STR00001##