A conjugated polymer comprising a repeat unit of formula (I) wherein R.sup.1 in each occurrence is a substituent; R.sup.2 in each occurrence is independently H or a substituent; X is selected from O, S and NR.sup.3; and R.sup.3 in each occurrence is independently H or a substituent. The polymer may be used as a light-emitting marker in a method of sequencing nucleic acids. The polymer may be used as a method of identifying a target analyte in a sample.

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The present invention relates to a polymer, composition, the forming of a sacrificial layer and a method for producing a semiconductor device comprising a step during which a pattern is made using a photoresist by the photolithography method.

The present invention relates to polymers comprising structural units having partially fluorinated substituents, to mixtures and formulations comprising the polymers according to the invention, to a process for the preparation of the polymers according to the invention, and to the use of the polymers according to the invention as functional materials in electronic devices.

Borylated compounds are disclosed, as well as their methods of preparation and their applications. The disclosed borylated compounds are highly stable, and have reduced band gap properties, thereby making them attractive candidates for incorporation into semiconducting materials for use in a variety of electronic, optical or electro-optical devices or components.

A hardmask composition, a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns using the hardmask layer including a cured product of the hardmask composition, the hardmask composition including a compound represented by Chemical Formula 1, below; and a solvent,

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The present disclosure relates to synthesis of porous polymer networks and applications of such materials.

Squaric acid-based polymers and their use in electrode materials and/or electrolyte compositions, as well as their production processes are described herein. Also described are electrode materials, electrodes, electrolyte compositions, electrochemical cells, electrochemical accumulators, and optoelectronic devices comprising the polymers and their uses.

Borylated compounds are disclosed, as well as their methods of preparation and their applications. The disclosed borylated compounds are highly stable, and have reduced band gap properties, thereby making them attractive candidates for incorporation into semiconducting materials for use in a variety of electronic, optical or electro-optical devices or components.

Squaric acid-based polymers and their use in electrode materials and/or electrolyte compositions, as well as their production processes are described herein. Also described are electrode materials, electrodes, electrolyte compositions, electrochemical cells, electrochemical accumulators, and optoelectronic devices comprising the polymers and their uses.

A process for manufacturing a polyether ketone ketone, involving: placing an aromatic ether or a mixture of aromatic ethers, including at least 50 mol % of 1,3-bis(4-phenoxybenzoyl)benzene, 1,4-bis(4-phenoxybenzoyl)benzene or a mixture thereof, relative to the total number of moles of aromatic ether(s), in contact with an acyl chloride or a mixture of acyl chlorides, and a Lewis acid, in all or part of a reaction solvent, so as to form a reaction mixture, the 1,3-bis(4-phenoxybenzoyl)benzene and/or 1,4-bis(4-phenoxybenzoyl)benzene essentially not being dissolved in the reaction solvent at the end of the step of placing in contact; and, polymerizing the reaction mixture, the polymerization being performed, at least in part, at a temperature Tp greater than or equal to 50 C.; the process including a step of gradual heating of the reaction mixture until acceleration of the polymerization reaction is achieved.