Patent classifications
C08K7/26
Wall compounds and methods of use
A wall compound for use in all applications and particularly well-suited for joining adjacent wallboards. The compound includes a latex resin, a thickener, fibers, and a filler material. In some embodiments, the repair compound is configured to exhibit at least one of yield stress and pseudoplastic-type behavior. In some embodiments, the compound includes hydrophobic and hydrophilic fibers of different morphologies. In some embodiments, the wall compound includes one or more associative thickeners.
Wall compounds and methods of use
A wall compound for use in all applications and particularly well-suited for joining adjacent wallboards. The compound includes a latex resin, a thickener, fibers, and a filler material. In some embodiments, the repair compound is configured to exhibit at least one of yield stress and pseudoplastic-type behavior. In some embodiments, the compound includes hydrophobic and hydrophilic fibers of different morphologies. In some embodiments, the wall compound includes one or more associative thickeners.
Photosensitive siloxane composition and cured film formed by using the same
To provide a photosensitive composition capable of easily forming a cured film having a low refractive index. The present invention provides a photosensitive siloxane composition comprising: a polysiloxane, a photosensitive agent, hollow silica particles, and a solvent. The hollow silica particles contain voids inside, and have outer surfaces subjected to hydrophobic treatment.
Photosensitive siloxane composition and cured film formed by using the same
To provide a photosensitive composition capable of easily forming a cured film having a low refractive index. The present invention provides a photosensitive siloxane composition comprising: a polysiloxane, a photosensitive agent, hollow silica particles, and a solvent. The hollow silica particles contain voids inside, and have outer surfaces subjected to hydrophobic treatment.
Photosensitive siloxane composition and cured film formed by using the same
To provide a photosensitive composition capable of easily forming a cured film having a low refractive index. The present invention provides a photosensitive siloxane composition comprising: a polysiloxane, a photosensitive agent, hollow silica particles, and a solvent. The hollow silica particles contain voids inside, and have outer surfaces subjected to hydrophobic treatment.
FILLER, PREPARATION METHOD THEREOF, RESIN COMPOSITION COMPRISING THE FILLER AND ARTICLE MADE THEREFROM
A filler includes a first precursor and a second precursor; the first precursor is a hollow filler with a surface covered by a first silane coupling agent; the second precursor is a non-hollow filler with a surface covered by a second silane coupling agent; the first precursor and the second precursor are connected by a covalent bond formed by a chemical reaction between the first silane coupling agent and the second silane coupling agent. Also included are a preparation method of the filler and a resin composition containing the filler. A prepreg, a resin film, a laminate, or a printed circuit board made from the resin composition has excellent thermal resistance after moisture absorption, low Df variation rate under moisture and heat, low water absorption rate, high copper foil peeling strength, the prepreg having a smooth appearance and even color, and absence of branch-like pattern on laminate.
THERMAL INSULATION FELT WITH THERMAL SHOCK RESISTANCE AND PREPARATION METHOD THEREOF
The present application relates to a thermal insulation felt with thermal shock resistance and a preparation method thereof. A thermal insulation felt with thermal shock resistance has a layered structure, and includes a glass fiber layer with filler and a thermal shock-resistant coating, in which the thermal shock-resistant coating is coated on one or two sides of the glass fiber layer with filler. The filler is hollow glass bead or aerogel SiO.sub.2. The thermal shock-resistant coating is obtained by coating a thermal shock-resistant coating material on one or two sides of the glass fiber layer with filler and then drying and solidifying. The thermal shock-resistant coating material, based on a weight percentage, includes 10-50% SiO.sub.2, 5-60% ZnO, 5-40% Al.sub.2O.sub.3, 5-15% poly tetra fluoroethylene, 5-35% silane coupling agent and 15-50% phosphate.
Hydrophilic anti-fog coatings
The present invention relates to hydrophilic anti-fog coatings. In particular, the coatings use two types of nanoscale particles, colloidal silica and porous organosilicate micelles, in a polyurethane matrix. The invention is an anti-fog coating for optically clear substrates (polycarbonate, polyurethane, nylon, polyester and other clear plastics) without the need for a primer and glass or oxide substrates with an additional primer layer, comprising monosized colloidal silica nanoparticles and porous organosilicate micelles in a polyurethane matrix. The silica is preferably 1-5% by weight and the micelles are loaded at 0.1 to 10% volume percentage by volume. The polyurethane prepolymer is dissolved at 10-40% by weight in a mixture of tertiary amyl alcohol and diacetone alcohol to customize for dip, flow or spray coating processes
Hydrophilic anti-fog coatings
The present invention relates to hydrophilic anti-fog coatings. In particular, the coatings use two types of nanoscale particles, colloidal silica and porous organosilicate micelles, in a polyurethane matrix. The invention is an anti-fog coating for optically clear substrates (polycarbonate, polyurethane, nylon, polyester and other clear plastics) without the need for a primer and glass or oxide substrates with an additional primer layer, comprising monosized colloidal silica nanoparticles and porous organosilicate micelles in a polyurethane matrix. The silica is preferably 1-5% by weight and the micelles are loaded at 0.1 to 10% volume percentage by volume. The polyurethane prepolymer is dissolved at 10-40% by weight in a mixture of tertiary amyl alcohol and diacetone alcohol to customize for dip, flow or spray coating processes
Apparatus with closed loop feedback for forming a nanostructured thin film with porosity gradient on an array of sloped outdoor panel surfaces using meniscus drag
A thin-film coating applicator assembly is disclosed for coating substrates in outdoor applications. The innovative thin-film coating applicator assembly is adapted to apply performance enhancement coatings on installed photovoltaic panels and glass windows in outdoor environments. The coating applicator is adapted to move along a solar panel or glass pane while applicator mechanisms deposit a uniform layer of liquid coating solution to the substrate's surface. The applicator assembly comprises a conveyance means disposed on a frame. Further disclosed are innovative applicator heads that comprise a deformable sponge-like core surrounded by a microporous layer. The structure, when in contact with a substrate surface, deposits a uniform layer of coating solution over a large surface.