The present invention relates to a coated article comprising a partial or complete durable non-fluorinated coating on the surface of an article, wherein the coating comprises 5 to 95% by weight of a hydrophobic compound, and 5 to 95% by weight of a surface effect agent, both based on the total solids weight of the coating, where the hydrophobic compound is selected from a hydrophobic cyclic or acyclic alcohol.

The present invention relates to a coated article comprising a partial or complete durable non-fluorinated coating on the surface of an article, wherein the coating comprises 5 to 95% by weight of a hydrophobic compound, and 5 to 95% by weight of a surface effect agent, both based on the total solids weight of the coating, where the hydrophobic compound is selected from a hydrophobic cyclic or acyclic alcohol.

A composition for forming an upper layer film is applied onto a resist film formed using an actinic ray-sensitive or radiation-sensitive resin composition, and includes a resin X and a compound A having a radical trapping group. A pattern forming method includes applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, applying the composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, exposing the resist film having the upper layer film formed thereon, and developing the exposed resist film using a developer including an organic solvent to form a pattern.

A composition for forming an upper layer film is applied onto a resist film formed using an actinic ray-sensitive or radiation-sensitive resin composition, and includes a resin X and a compound A having a radical trapping group. A pattern forming method includes applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, applying the composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, exposing the resist film having the upper layer film formed thereon, and developing the exposed resist film using a developer including an organic solvent to form a pattern.

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).

The present invention relates to a piezoelectric material, comprising: a vinylidene fluoride/trifluoroethylene copolymer; and a (meth)acrylic polymer which contains a structural unit derived from a (meth)acrylic monomer represented by Formula (I):

##STR00001## [wherein, R.sub.1 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, wherein at least one hydrogen atom of R.sub.1 is optionally substituted with a halogen atom; and R.sub.2 represents a linear or branched alkyl group having 1 to 10 carbon atoms, an alicyclic hydrocarbon group having 3 to 12 carbon atoms which contains an alicyclic structure having 3 to 6 carbon atoms, a phenyl group, or a phenylalkylene group which contains an alkylene group having 1 to 4 carbon atoms, wherein, at least one carbon atom of the alkyl group, the alicyclic hydrocarbon group, the phenyl group, and the phenylalkylene group is optionally substituted with —O—, —N—, or —S—, at least one hydrogen atom of the alkyl group, the alicyclic hydrocarbon group, and the alkylene group is optionally substituted with a hydroxy group, an alkyl group having 1 to 6 carbon atoms, and/or an alkoxy group having 1 to 6 carbon atoms, at least one hydrogen atom on the phenyl rings of the phenyl group and the phenylalkylene group is optionally substituted with a hydroxy group, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and/or a cyano group, and at least one hydrogen atom of R.sub.2 is optionally substituted with a halogen atom, with a proviso that at least one hydrogen atom of R.sub.1 and/or R.sub.2 is substituted with a halogen atom.

The present invention relates to a piezoelectric material, comprising: a vinylidene fluoride/trifluoroethylene copolymer; and a (meth)acrylic polymer which contains a structural unit derived from a (meth)acrylic monomer represented by Formula (I):

##STR00001## [wherein, R.sub.1 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, wherein at least one hydrogen atom of R.sub.1 is optionally substituted with a halogen atom; and R.sub.2 represents a linear or branched alkyl group having 1 to 10 carbon atoms, an alicyclic hydrocarbon group having 3 to 12 carbon atoms which contains an alicyclic structure having 3 to 6 carbon atoms, a phenyl group, or a phenylalkylene group which contains an alkylene group having 1 to 4 carbon atoms, wherein, at least one carbon atom of the alkyl group, the alicyclic hydrocarbon group, the phenyl group, and the phenylalkylene group is optionally substituted with —O—, —N—, or —S—, at least one hydrogen atom of the alkyl group, the alicyclic hydrocarbon group, and the alkylene group is optionally substituted with a hydroxy group, an alkyl group having 1 to 6 carbon atoms, and/or an alkoxy group having 1 to 6 carbon atoms, at least one hydrogen atom on the phenyl rings of the phenyl group and the phenylalkylene group is optionally substituted with a hydroxy group, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and/or a cyano group, and at least one hydrogen atom of R.sub.2 is optionally substituted with a halogen atom, with a proviso that at least one hydrogen atom of R.sub.1 and/or R.sub.2 is substituted with a halogen atom.

The present invention relates to a piezoelectric material, comprising: a vinylidene fluoride/trifluoroethylene copolymer; and a (meth)acrylic polymer which contains a structural unit derived from a (meth)acrylic monomer represented by Formula (I):

##STR00001## [wherein, R.sub.1 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, wherein at least one hydrogen atom of R.sub.1 is optionally substituted with a halogen atom; and R.sub.2 represents a linear or branched alkyl group having 1 to 10 carbon atoms, an alicyclic hydrocarbon group having 3 to 12 carbon atoms which contains an alicyclic structure having 3 to 6 carbon atoms, a phenyl group, or a phenylalkylene group which contains an alkylene group having 1 to 4 carbon atoms, wherein, at least one carbon atom of the alkyl group, the alicyclic hydrocarbon group, the phenyl group, and the phenylalkylene group is optionally substituted with —O—, —N—, or —S—, at least one hydrogen atom of the alkyl group, the alicyclic hydrocarbon group, and the alkylene group is optionally substituted with a hydroxy group, an alkyl group having 1 to 6 carbon atoms, and/or an alkoxy group having 1 to 6 carbon atoms, at least one hydrogen atom on the phenyl rings of the phenyl group and the phenylalkylene group is optionally substituted with a hydroxy group, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and/or a cyano group, and at least one hydrogen atom of R.sub.2 is optionally substituted with a halogen atom, with a proviso that at least one hydrogen atom of R.sub.1 and/or R.sub.2 is substituted with a halogen atom.

An iodized aromatic carboxylic acid type pendant-containing polymer is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging, pattern collapse or residue formation, independent of whether it is of positive or negative tone.