The present invention relates to novel compounds containing fluorinated end groups, to the use thereof as surface-active substances, and to compositions comprising these compounds.

A surface coating material includes a plurality of fluorine-containing silicon compounds and an additive. The fluorine-containing silicon compounds include a fluorine-containing (poly)ether moiety, a hydrolytic silane moiety, and a linking group between the fluorine-containing (poly)ether moiety and the hydrolytic silane moiety. The linking group is configured to form a non-covalence interaction between adjacent molecules.

A surface coating material includes a plurality of fluorine-containing silicon compounds and an additive. The fluorine-containing silicon compounds include a fluorine-containing (poly)ether moiety, a hydrolytic silane moiety, and a linking group between the fluorine-containing (poly)ether moiety and the hydrolytic silane moiety. The linking group is configured to form a non-covalence interaction between adjacent molecules.

A non-injurious incapacitating device is provided that includes an exterior layer defining a contained volume. A primary effect is contained within the device that deploys to size at least 10 times that of the contained volume. A power supply and a sensor are provided. The sensor communicates a contact or proximity signal when the exterior layer contacts or is within an effective range of a target. A control circuit interconnects provides a triggering signal to the primary effect based on the contact or proximity signal. The device is provided in some embodiments as a system inclusive of a launcher. A method of non-injuriously incapacitating of a target individual is also provided in which a user directs a device into proximity of the target individual. The device deploys an expansive primary effect to non-injuriously incapacitate the target individual.

Described herein is an aqueous basecoat composition including a silane-based additive as hardener/self-crosslinking material to improve adhesion of the basecoat to the under—and overlying coating layers, as well as the cohesion property of the basecoat itself. Also described herein is a mixer system for preparing an aqueous refinish basecoat composition including at least one base color component, at least one pigment-free component, at least one hardening component including the silane-based additive and optionally at least one rheology module as well as a method to prepare an aqueous basecoat composition from said mixer system. Further, described herein is a method of coating a substrate with the basecoat composition and a clearcoat composition and jointly curing the basecoat and clearcoat composition as well as to a coated substrate obtained from the method. Finally, described herein is a method of using the silane-based compound as hardening additive in aqueous basecoat compositions.

Described herein is an aqueous basecoat composition including a silane-based additive as hardener/self-crosslinking material to improve adhesion of the basecoat to the under—and overlying coating layers, as well as the cohesion property of the basecoat itself. Also described herein is a mixer system for preparing an aqueous refinish basecoat composition including at least one base color component, at least one pigment-free component, at least one hardening component including the silane-based additive and optionally at least one rheology module as well as a method to prepare an aqueous basecoat composition from said mixer system. Further, described herein is a method of coating a substrate with the basecoat composition and a clearcoat composition and jointly curing the basecoat and clearcoat composition as well as to a coated substrate obtained from the method. Finally, described herein is a method of using the silane-based compound as hardening additive in aqueous basecoat compositions.

A protective film forming composition which has a good mask (protection) function against a wet etching liquid and a high dry etching rate during processing of a semiconductor substrate and also has good coverage even for a stepped substrate, and from which a flat film can be formed due to a small difference in film thickness after being embedded; a protective film produced using the composition; a substrate with a resist pattern; and a method for producing a semiconductor device. This composition contains: (A) a compound having three or more carboxyl groups; (B) a resin or a monomer; and a solvent. The compound (A) having three or more carboxyl groups preferably has a ring structure. This ring structure is preferably selected from among an aromatic ring having 6-40 carbon atoms, an aliphatic ring having 3-10 carbon atoms, and a heterocyclic ring.

A protective film forming composition which has a good mask (protection) function against a wet etching liquid and a high dry etching rate during processing of a semiconductor substrate and also has good coverage even for a stepped substrate, and from which a flat film can be formed due to a small difference in film thickness after being embedded; a protective film produced using the composition; a substrate with a resist pattern; and a method for producing a semiconductor device. This composition contains: (A) a compound having three or more carboxyl groups; (B) a resin or a monomer; and a solvent. The compound (A) having three or more carboxyl groups preferably has a ring structure. This ring structure is preferably selected from among an aromatic ring having 6-40 carbon atoms, an aliphatic ring having 3-10 carbon atoms, and a heterocyclic ring.

Provided are: dispersion in which titanium dioxide microparticles are highly dispersed in an organic solvent; and a method for producing the dispersion.

The dispersion comprises at least titanium dioxide microparticles, an organic solvent, a silane coupling agent, and a dispersant having a basic adsorptive group, wherein the ratio of the mass of the dispersant to that of the silane coupling agent is 15 to 75% by mass. It is preferred that the ratio of the total mass of the silane coupling agent and the dispersant to the mass of the titanium dioxide microparticles is 10 to 40% by mass. The dispersion is produced by dispersing the titanium dioxide microparticles together with the above-specified amounts of the silane coupling agent and the dispersant having a basic adsorptive group in the organic solvent.

Provided are: dispersion in which titanium dioxide microparticles are highly dispersed in an organic solvent; and a method for producing the dispersion.

The dispersion comprises at least titanium dioxide microparticles, an organic solvent, a silane coupling agent, and a dispersant having a basic adsorptive group, wherein the ratio of the mass of the dispersant to that of the silane coupling agent is 15 to 75% by mass. It is preferred that the ratio of the total mass of the silane coupling agent and the dispersant to the mass of the titanium dioxide microparticles is 10 to 40% by mass. The dispersion is produced by dispersing the titanium dioxide microparticles together with the above-specified amounts of the silane coupling agent and the dispersant having a basic adsorptive group in the organic solvent.