Hydrogel three-dimensional printing kits, methods of three-dimensional printing and three-dimensional printed hydro-gels are described. In one example, a three-dimensional printing kit can comprise a particulate build material, a crosslinking agent and a structural modifier. The particulate build material may comprise a polyhydroxylated polymer having hydroxyl groups. The crosslinking gent is for crosslinking the polyhydroxylated polymer by a reaction with the hydroxyl groups. The structural modifier can have a plurality of functional groups for forming a network within the hydrogel, and where the structural modifier may have a reactivity that is chemically orthogonal to the reaction with the hydroxyl groups for crosslinking the polyhydroxylated polymer.

Hydrogel three-dimensional printing kits, methods of three-dimensional printing and three-dimensional printed hydro-gels are described. In one example, a three-dimensional printing kit can comprise a particulate build material, a crosslinking agent and a structural modifier. The particulate build material may comprise a polyhydroxylated polymer having hydroxyl groups. The crosslinking gent is for crosslinking the polyhydroxylated polymer by a reaction with the hydroxyl groups. The structural modifier can have a plurality of functional groups for forming a network within the hydrogel, and where the structural modifier may have a reactivity that is chemically orthogonal to the reaction with the hydroxyl groups for crosslinking the polyhydroxylated polymer.

Provided is a VMP aluminum slurry that can satisfy metallic texture achieving high designability and demand characteristics of adhesion level with a base material. It has been found that when a coating material formed using a VMP aluminum slurry containing a specific dicarboxylic acid is made into a coating film, the adhesion with a base material is particularly excellent, and the VMP aluminum slurry of the present invention has been completed. The VMP aluminum slurry contains a dicarboxylic acid having an octanol/water partition coefficient (log Pow) of −1 to 1 and a carbon chain of 2 to 5 carbon atoms between two carboxy groups, a VMP (vacuum metallized pigment) aluminum pigment, and a solvent.

Provided is a VMP aluminum slurry that can satisfy metallic texture achieving high designability and demand characteristics of adhesion level with a base material. It has been found that when a coating material formed using a VMP aluminum slurry containing a specific dicarboxylic acid is made into a coating film, the adhesion with a base material is particularly excellent, and the VMP aluminum slurry of the present invention has been completed. The VMP aluminum slurry contains a dicarboxylic acid having an octanol/water partition coefficient (log Pow) of −1 to 1 and a carbon chain of 2 to 5 carbon atoms between two carboxy groups, a VMP (vacuum metallized pigment) aluminum pigment, and a solvent.

Provided is a conductive laminate including a base material and a conductive ink film provided on the base material, in which a region that extends from a position being away from a first main surface toward a second main surface by a distance equivalent to 50% of a thickness of the conductive ink film to the second main surface has a first void ratio of 15% to 50%, and a second void ratio in a region that extends from the first main surface toward the second main surface to a position being away from the first main surface by a distance equivalent to 10% of the thickness of the conductive ink film has a second void ratio which is smaller than the first void ratio.

Provided is a conductive laminate including a base material and a conductive ink film provided on the base material, in which a region that extends from a position being away from a first main surface toward a second main surface by a distance equivalent to 50% of a thickness of the conductive ink film to the second main surface has a first void ratio of 15% to 50%, and a second void ratio in a region that extends from the first main surface toward the second main surface to a position being away from the first main surface by a distance equivalent to 10% of the thickness of the conductive ink film has a second void ratio which is smaller than the first void ratio.

A method for preparing three-dimensional perovskite nanopixels of a digital display is provided. The method includes steps of preparing precursor ink by mixing methylammonium halide and lead halide and adding them into another mixture, adding the precursor ink into a nanopipette, placing the nanopipette with the precursor ink above a silicon substrate and apart from the silicon substrate by a certain distance, configuring the nanopipette to come into contact with the Si substrate such that a portion of the precursor ink having an interface surface of a shape of a meniscus is formed between the nanopipette and the silicon substrate, performing rapid evaporation of the portion of the precursor ink to facilitate crystallization of perovskite, moving the nanopipette upwardly at a constant speed such that the crystallization of perovskite proceeds upwardly, and terminating the crystallization of perovskite to generate a freestanding nanopixel for emitting light.

A method for preparing three-dimensional perovskite nanopixels of a digital display is provided. The method includes steps of preparing precursor ink by mixing methylammonium halide and lead halide and adding them into another mixture, adding the precursor ink into a nanopipette, placing the nanopipette with the precursor ink above a silicon substrate and apart from the silicon substrate by a certain distance, configuring the nanopipette to come into contact with the Si substrate such that a portion of the precursor ink having an interface surface of a shape of a meniscus is formed between the nanopipette and the silicon substrate, performing rapid evaporation of the portion of the precursor ink to facilitate crystallization of perovskite, moving the nanopipette upwardly at a constant speed such that the crystallization of perovskite proceeds upwardly, and terminating the crystallization of perovskite to generate a freestanding nanopixel for emitting light.

A sol-gel material for overcoating a surface-relief structure includes a titanium(IV) precursor, and a titanium oxide stabilizer including R.sup.3OC(O)OR.sup.4, R.sup.5C(O)OR.sup.6, or a combination. R.sup.3 and R.sup.4 include alkyl or alkene groups optionally containing carboxylate, alcohol, or ester functionalities, such as propylene carbonate (PC). R.sup.5 and R.sup.6 include alkyl or alkene groups optionally containing carboxylate, alcohol, or ester functionalities, for example, a lactone such as gamma butyrolactone (GBL). In some embodiments, the sol-gel material includes a source of sulfate or phosphate anions, an acid, a base, a peroxide, a surfactant, a cross-linker, a flexibilizer, a toughener additive, a solvent, or a combination thereof. In some embodiments, the sol-gel material is annealed at a temperature between 50-150° C., and then annealed at a temperature between 200-300° C. In some embodiments, the sol-gel material is cured using ultraviolet light before annealing at a temperature between 200-300° C.

A sol-gel material for overcoating a surface-relief structure includes a titanium(IV) precursor, and a titanium oxide stabilizer including R.sup.3OC(O)OR.sup.4, R.sup.5C(O)OR.sup.6, or a combination. R.sup.3 and R.sup.4 include alkyl or alkene groups optionally containing carboxylate, alcohol, or ester functionalities, such as propylene carbonate (PC). R.sup.5 and R.sup.6 include alkyl or alkene groups optionally containing carboxylate, alcohol, or ester functionalities, for example, a lactone such as gamma butyrolactone (GBL). In some embodiments, the sol-gel material includes a source of sulfate or phosphate anions, an acid, a base, a peroxide, a surfactant, a cross-linker, a flexibilizer, a toughener additive, a solvent, or a combination thereof. In some embodiments, the sol-gel material is annealed at a temperature between 50-150° C., and then annealed at a temperature between 200-300° C. In some embodiments, the sol-gel material is cured using ultraviolet light before annealing at a temperature between 200-300° C.