Provided is an ink jet recording method including: discharging first ultraviolet curable ink of a radical polymerization reaction type which contains a radical photopolymerization initiator and a radical polymerization compound and in which transmittance at a wavelength of 395 nm is equal to or less than 1%, onto a recording medium; and curing the first ultraviolet curable ink which is landed on the recording medium by irradiating the ink with ultraviolet light, in which a light source which initially emits the ultraviolet light in the curing of the ink is an ultraviolet light emitting diode in which peak intensity of the irradiated ultraviolet light is equal to or more than 800 mW/cm.sup.2.

Provided is an ink jet recording method including: discharging first ultraviolet curable ink of a radical polymerization reaction type which contains a radical photopolymerization initiator and a radical polymerization compound and in which transmittance at a wavelength of 395 nm is equal to or less than 1%, onto a recording medium; and curing the first ultraviolet curable ink which is landed on the recording medium by irradiating the ink with ultraviolet light, in which a light source which initially emits the ultraviolet light in the curing of the ink is an ultraviolet light emitting diode in which peak intensity of the irradiated ultraviolet light is equal to or more than 800 mW/cm.sup.2.

A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface-activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch-resist mask.

A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface-activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch-resist mask.

Provided is a manufacturing method of a stainless steel sheet having etching patterns. The method includes: coating a coating composition on a stainless steel sheet to form a coating layer; and forming a matte coated film layer, having an etching effect, on the coating layer. The coating composition comprises: 10 to 30 wt% of a silane-based compound, 0.5 to 6 wt% of an organic acid, 0.1 to 3 wt% of a vanadium compound, 0.1 to 3 wt% of a magnesium compound, and a remainder of a solvent.

Provided is a manufacturing method of a stainless steel sheet having etching patterns. The method includes: coating a coating composition on a stainless steel sheet to form a coating layer; and forming a matte coated film layer, having an etching effect, on the coating layer. The coating composition comprises: 10 to 30 wt% of a silane-based compound, 0.5 to 6 wt% of an organic acid, 0.1 to 3 wt% of a vanadium compound, 0.1 to 3 wt% of a magnesium compound, and a remainder of a solvent.

The invention provides a supramolecular polymer composition capable of co-assembly to maintain a three dimensional (3-D) macrostructural form after 3-D printing, made of a solvent, a template molecule; and a reactive component. The reactive component can be at least one monomer that is capable of hydrogen bonding with the template molecule to form a 1D supramolecular structure. The template may be an amphiphilic polymer. The monomer has at least two pendant groups capable of covalent crosslinking. The invention also includes a 3-D structure formed by crosslinking a 3-D printed supramolecular polymer composition, which optionally has a mesoporous structure. Also included is a method of manufacturing a 3-D structure by delivering a supramolecular polymer composition onto a surface of a substrate to form the 3-D structure.

There is provided an anti-counterfeit ink composition, an anti-counterfeit ink, and an anti-counterfeit printed matter that transmits a visible light region, having absorption in an infrared region, and capable of judging authenticity of a printed matter, and containing composite tungsten oxide fine particles, the composite tungsten oxide fine particles having a hexagonal crystal structure, having a lattice constant such that a-axis is 7.3850 Å or more and 7.4186 Å or less, and c-axis is 7.5600 Å or more and 7.6240 Å or less, and having a particle size of the near-infrared absorbing material fine particles is 100 nm or less, and a method for producing the anti-counterfeit ink composition, the anti-counterfeit ink, the anti-counterfeit printed matter, and the anti-counterfeit ink composition.

There is provided an anti-counterfeit ink composition, an anti-counterfeit ink, and an anti-counterfeit printed matter that transmits a visible light region, having absorption in an infrared region, and capable of judging authenticity of a printed matter, and containing composite tungsten oxide fine particles, the composite tungsten oxide fine particles having a hexagonal crystal structure, having a lattice constant such that a-axis is 7.3850 Å or more and 7.4186 Å or less, and c-axis is 7.5600 Å or more and 7.6240 Å or less, and having a particle size of the near-infrared absorbing material fine particles is 100 nm or less, and a method for producing the anti-counterfeit ink composition, the anti-counterfeit ink, the anti-counterfeit printed matter, and the anti-counterfeit ink composition.

Systems and methods for optimizing the formulation of materials are provided. The systems and methods employ a data-driven, iterative approach to derivate optimal material formulations. One portion of the system includes a sample automation system that outputs the material samples to be tested, and a second portion of the system includes an optimization engine that analyzes data extracted from the material samples and generates additional formulations for materials to be printed and tested. This process continues so that optimal material formulations can be determined based on desired mechanical properties of the material to be optimized. The optimization engine can further be capable of predicting results of formulation that have not yet been tested and using those predictions to further drive the next suggested materials to be tested.