Patent classifications
C09D11/101
Radiation Curable Composition for Plating Applications
A radiation curable composition comprising: a) at least one monofunctional (meth)acrylate containing a carboxylic acid group, a phosphoric acid group or a phosphonic acid group; b) an acrylamide; c) at least one polyfunctional (meth)acrylate; characterized in that the radiation curable composition further comprises at least 0.1 wt % of a liquid penetrating controlling monomer selected from the group consisting of a C6-C20 alkyl (meth)acrylate, a fluorinated (meth)acrylate and a silicone (meth)acrylate.
Radiation Curable Composition for Plating Applications
A radiation curable composition comprising: a) at least one monofunctional (meth)acrylate containing a carboxylic acid group, a phosphoric acid group or a phosphonic acid group; b) an acrylamide; c) at least one polyfunctional (meth)acrylate; characterized in that the radiation curable composition further comprises at least 0.1 wt % of a liquid penetrating controlling monomer selected from the group consisting of a C6-C20 alkyl (meth)acrylate, a fluorinated (meth)acrylate and a silicone (meth)acrylate.
Method for preparing a cross-linked fluorinated polymer film
A process for preparing a crosslinked fluoropolymer film, including the successive steps of: (1) formulating an ink containing: (a) the product of the reaction of triethylamine with at least one fluorinated copolymer obtained by radical copolymerization of monomers including: (i) vinylidene fluoride (VDF), (ii) trifluoroethylene (TrFE), (iii) at least one chlorinated monomer of formula —CXCl═CX.sub.1X.sub.2 where X, X.sub.1 and X.sub.2 independently denote H, F or CF.sub.3, wherein at most one of X, X.sub.1 and X.sub.2 denotes CF.sub.3; (b) at least one crosslinking agent; (c) at least one photoinitiator; and (d) at least one organic solvent; (2) applying said ink in film form to a substrate; and (3) UV-irradiating said film. Also, the film capable of being obtained according to this process, and also to the uses thereof, in particular in the manufacture of (opto)electronic devices and more particularly in the manufacture of a gate dielectric layer in a field-effect transistor.
Method for preparing a cross-linked fluorinated polymer film
A process for preparing a crosslinked fluoropolymer film, including the successive steps of: (1) formulating an ink containing: (a) the product of the reaction of triethylamine with at least one fluorinated copolymer obtained by radical copolymerization of monomers including: (i) vinylidene fluoride (VDF), (ii) trifluoroethylene (TrFE), (iii) at least one chlorinated monomer of formula —CXCl═CX.sub.1X.sub.2 where X, X.sub.1 and X.sub.2 independently denote H, F or CF.sub.3, wherein at most one of X, X.sub.1 and X.sub.2 denotes CF.sub.3; (b) at least one crosslinking agent; (c) at least one photoinitiator; and (d) at least one organic solvent; (2) applying said ink in film form to a substrate; and (3) UV-irradiating said film. Also, the film capable of being obtained according to this process, and also to the uses thereof, in particular in the manufacture of (opto)electronic devices and more particularly in the manufacture of a gate dielectric layer in a field-effect transistor.
Solder mask inkjet inks for manufacturing printed circuit boards
A method of manufacturing an electronic device includes preparing a solder mask with a radiation curable solder mask inkjet ink containing at least one cationic polymerizable compound and a photoinitiating system, wherein the photoinitiating system includes a specified sulphonium compound and a thioxanthone.
PRECISION SYSTEM FOR ADDITIVE FABRICATION
An approach to precision additive fabrication uses jetting of cationic compositions in conjunction with a non-contact (e.g., optical) feedback approach. By not requiring contact to control the surface geometry of the object being manufactured, the approach is tolerant of the relative slow curing of the cationic composition, while maintaining the benefit of control of the deposition processes according to feedback during the fabrication processes. This approach provides a way to manufacture precision objects and benefit from material properties of the fabricated objects, for example, with isotropic properties, which may be at least partially a result of the slow curing, and flexible structures, which may not be attainable using conventional jetted acrylates.
PRECISION SYSTEM FOR ADDITIVE FABRICATION
An approach to precision additive fabrication uses jetting of cationic compositions in conjunction with a non-contact (e.g., optical) feedback approach. By not requiring contact to control the surface geometry of the object being manufactured, the approach is tolerant of the relative slow curing of the cationic composition, while maintaining the benefit of control of the deposition processes according to feedback during the fabrication processes. This approach provides a way to manufacture precision objects and benefit from material properties of the fabricated objects, for example, with isotropic properties, which may be at least partially a result of the slow curing, and flexible structures, which may not be attainable using conventional jetted acrylates.
LIGHT DIFFUSING INK FOR PRINTING ON TRANSPARENT SUBSTRATES
A light diffusing ink for printing on transparent substrates suitable for being integrated with devices for lighting said substrate from the edge, in order to print drawings, graphics, letters on said substrate and also to realize a full-field background whose thickness varies as a function of users' requirements on the surface of said substrate. The coating printed on said substrate is consequently only visible whenever said substrate is lit laterally, whereas it is not visible in the absence of a lateral light.
INKS FOR 3D PRINTING HAVING LOW POLYMERIZATION SHRINKAGE
In one aspect, inks for use with a three-dimensional (3D) printing system are described herein. In some embodiments, an ink described herein comprises 20-60 wt. % oligomeric curable material; 10-50 wt. % cyclocarbonate (meth)acrylate monomer; and 0.1-5 wt. % photoinitiator, based on the total weight of the ink. Additionally, in some cases, the ink further comprises one or more additional curable materials differing from the oligomeric curable material and the cyclocarbonate (meth)acrylate monomer. An ink described herein, in some embodiments, also comprises one or more additional component that are non-curable.
INKS FOR 3D PRINTING HAVING LOW POLYMERIZATION SHRINKAGE
In one aspect, inks for use with a three-dimensional (3D) printing system are described herein. In some embodiments, an ink described herein comprises 20-60 wt. % oligomeric curable material; 10-50 wt. % cyclocarbonate (meth)acrylate monomer; and 0.1-5 wt. % photoinitiator, based on the total weight of the ink. Additionally, in some cases, the ink further comprises one or more additional curable materials differing from the oligomeric curable material and the cyclocarbonate (meth)acrylate monomer. An ink described herein, in some embodiments, also comprises one or more additional component that are non-curable.