Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.

A photo-curable liquid composition for additive manufacturing of silicon-containing carbide ceramic includes a polymethylvinylsilane (PMVS) resin that has photo-reactivity over a first photo-wavelength absorption range and a photo-initiator additive mixed with the PMVS resin. The photo-initiator additive has photo-reactivity over a second photo-wavelength absorption range that has an overlapping wavelength range with the first photo-wavelength absorption range. The PMVS and the photo-initiator additive are reactive to polymerize upon exposure to radiation having a wavelength in the overlapping wavelength range.

A photo-curable liquid composition for additive manufacturing of silicon-containing carbide ceramic includes a polymethylvinylsilane (PMVS) resin that has photo-reactivity over a first photo-wavelength absorption range and a photo-initiator additive mixed with the PMVS resin. The photo-initiator additive has photo-reactivity over a second photo-wavelength absorption range that has an overlapping wavelength range with the first photo-wavelength absorption range. The PMVS and the photo-initiator additive are reactive to polymerize upon exposure to radiation having a wavelength in the overlapping wavelength range.

An aqueous inkjet ink of the present disclosure is an active energy ray curable aqueous inkjet ink including a water-soluble monomer having a polymerizable group and a hydrazide compound. The water-soluble monomer is a curable substance having a ketone structure.

An aqueous inkjet ink of the present disclosure is an active energy ray curable aqueous inkjet ink including a water-soluble monomer having a polymerizable group and a hydrazide compound. The water-soluble monomer is a curable substance having a ketone structure.

The invention relates to photoactive oligomeric aminoketones for compositions and inks curable with ultraviolet (UV) light. The oligomeric ketones are particularly useful for printing or coating materials wherein a low migration of photoinitiators, and reduced transfer of ink from the printed to another surface are desired, such as, for example, food packaging.

The invention relates to photoactive oligomeric aminoketones for compositions and inks curable with ultraviolet (UV) light. The oligomeric ketones are particularly useful for printing or coating materials wherein a low migration of photoinitiators, and reduced transfer of ink from the printed to another surface are desired, such as, for example, food packaging.

A radiation-curable ink jet composition includes titanium oxide, a polymerizable compound, and a photopolymerization initiator, in which the titanium oxide has an average particle diameter of equal to or more than 250 nm and equal to or less than 400 nm, and the polymerizable compound contains a vinyl group-containing (meth)acrylate represented by the following formula (I).

H.sub.2C═CR.sup.1—CO—OR.sup.2—O—CH═CH—R.sup.3  (I) (wherein R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents a divalent organic residue having 2 to 20 carbon atoms, and R.sup.3 represents a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms.)

A radiation-curable ink jet composition includes titanium oxide, a polymerizable compound, and a photopolymerization initiator, in which the titanium oxide has an average particle diameter of equal to or more than 250 nm and equal to or less than 400 nm, and the polymerizable compound contains a vinyl group-containing (meth)acrylate represented by the following formula (I).

H.sub.2C═CR.sup.1—CO—OR.sup.2—O—CH═CH—R.sup.3  (I) (wherein R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents a divalent organic residue having 2 to 20 carbon atoms, and R.sup.3 represents a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms.)

An example of an anti-coalescing agent for a three-dimensional (3D) printing process includes a vehicle and an anti-coalescing polymer dispersed in the vehicle. The vehicle includes a co-solvent, a surfactant, a humectant, and water. The anti-coalescing polymer has a mean particle size ranging from about 50 nm to about 195 nm, and the anti-coalescing polymer is to coat polymeric build material particles to prevent the polymeric build material particles from coalescing during electromagnetic radiation exposure of the 3D printing process.