An active-energy-ray-curable composition is provided that includes an active-energy-ray-polymerizable compound, an amine compound, and water. The active-energy-ray-polymerizable compound comprises resin particles having a 50% cumulative particle diameter (D50) of 5 nm or greater but 50 nm or less. The amine compound has a molecular weight of 118.0 or less and a boiling point of 120 degrees C. or higher. The proportion of the water in the active-energy-ray-curable composition is 50.0 percent by mass or greater.

An active-energy-ray-curable composition is provided that includes an active-energy-ray-polymerizable compound, an amine compound, and water. The active-energy-ray-polymerizable compound comprises resin particles having a 50% cumulative particle diameter (D50) of 5 nm or greater but 50 nm or less. The amine compound has a molecular weight of 118.0 or less and a boiling point of 120 degrees C. or higher. The proportion of the water in the active-energy-ray-curable composition is 50.0 percent by mass or greater.

A precoat liquid used in an intermediate-transfer image forming method in which an actinic radiation-curable ink and an intermediate transfer member are used, the precoat liquid being applied onto a surface of the intermediate transfer member before the actinic radiation-curable ink is applied onto the surface of the intermediate transfer member, includes a water-soluble organic solvent having two or more hydroxyl groups per molecule. The water-soluble organic solvent has a C value of more than 0.03, the C value being calculated using Expression (1).

A precoat liquid used in an intermediate-transfer image forming method in which an actinic radiation-curable ink and an intermediate transfer member are used, the precoat liquid being applied onto a surface of the intermediate transfer member before the actinic radiation-curable ink is applied onto the surface of the intermediate transfer member, includes a water-soluble organic solvent having two or more hydroxyl groups per molecule. The water-soluble organic solvent has a C value of more than 0.03, the C value being calculated using Expression (1).

A formulation, system, and method for additive manufacturing of a polishing pad. The formulation includes monomer, dispersant, and nanoparticles. A method of preparing the formulation includes adding a dispersant that is a polyester derivative to monomer, adding metal-oxide nanoparticles to the monomer, and subjecting the monomer having the nanoparticles and dispersant to sonication to disperse the nanoparticles in the monomer.

A system, formulation, and method for additive manufacturing of a polishing layer of a polishing pad. The formulation includes a urethane acrylate oligomer based on a difunctional polyol or difunctional polythiol. The techniques includes selecting the difunctional polyol or the difunctional polythiol to affect a property of the polishing layer. The formulation also includes a monomer and a photoinitiator. The viscosity of the formulation is applicable for 3D printing of the polishing layer.

A UV curable inkjet ink including a free radical polymerizable compound and an acyl phosphine oxide initiator wherein the acyl phosphine oxide initiator includes an acyl group selected from the group consisting of a benzoyl group substituted by an urea group or an oxalylamide group; a 2,6-dimethyl benzoyl group substituted in position 3 by an urea group or an oxalylamide group; a 2,6-dimethoxy benzoyl group substituted in position 3 by an urea group or an oxalylamide group; a 2,4,6-trimethyl benzoyl group substituted in position 3 by an urea group or an oxalylamide group; and a 2,4,6-trimethoxybenzoyl group substituted in position 3 by an urea group or an oxalylamide group wherein the urea group and the oxalylamide group include a tertiary amine group positioning a phosporus atom of the acylphosphine oxide initiator in a 1 to Z position, where position 1 is defined as that of the phosphorus atom and position Z is defined as the nitrogen atom of the tertiary amine group with Z representing an integer of at least 11; and that the acyl phosphine oxide initiator contains no more than two photoinitiating moieties having a phosphine oxide group.

A UV curable inkjet ink including a free radical polymerizable compound and an acyl phosphine oxide initiator wherein the acyl phosphine oxide initiator includes an acyl group selected from the group consisting of a benzoyl group substituted by an urea group or an oxalylamide group; a 2,6-dimethyl benzoyl group substituted in position 3 by an urea group or an oxalylamide group; a 2,6-dimethoxy benzoyl group substituted in position 3 by an urea group or an oxalylamide group; a 2,4,6-trimethyl benzoyl group substituted in position 3 by an urea group or an oxalylamide group; and a 2,4,6-trimethoxybenzoyl group substituted in position 3 by an urea group or an oxalylamide group wherein the urea group and the oxalylamide group include a tertiary amine group positioning a phosporus atom of the acylphosphine oxide initiator in a 1 to Z position, where position 1 is defined as that of the phosphorus atom and position Z is defined as the nitrogen atom of the tertiary amine group with Z representing an integer of at least 11; and that the acyl phosphine oxide initiator contains no more than two photoinitiating moieties having a phosphine oxide group.

Polishing articles and methods of manufacturing polishing articles used in polishing processes and cleaning processes are provided. More particularly, implementations disclosed herein relate to composite polishing articles having tunable properties such as hydrophilicity and zeta potential. 3D printed chemical-mechanical planarization (CMP) pads composed of UV curable acrylic chemistry are generally hydrophobic in nature. Such hydrophobic behavior affects the wetting properties with abrasive-based polishing slurries such as ceria-base slurries. However, in order to increase the planarization and removal rate while decreasing defects, hydrophilic pads are preferred. In addition, it is desirable that the zeta potential (Zp) of the pads be tunable over a wide range of conditions at different pH values. Implementations of the present disclosure include methods for increasing the hydrophilicity and tuning the Zp of the pads with anionic additives and pads produced using these methods.

Polishing articles and methods of manufacturing polishing articles used in polishing processes and cleaning processes are provided. More particularly, implementations disclosed herein relate to composite polishing articles having tunable properties such as hydrophilicity and zeta potential. 3D printed chemical-mechanical planarization (CMP) pads composed of UV curable acrylic chemistry are generally hydrophobic in nature. Such hydrophobic behavior affects the wetting properties with abrasive-based polishing slurries such as ceria-base slurries. However, in order to increase the planarization and removal rate while decreasing defects, hydrophilic pads are preferred. In addition, it is desirable that the zeta potential (Zp) of the pads be tunable over a wide range of conditions at different pH values. Implementations of the present disclosure include methods for increasing the hydrophilicity and tuning the Zp of the pads with anionic additives and pads produced using these methods.