A film forming method includes forming a film on a substrate, in which the film includes first regions, second regions, and third regions, the first regions, the second regions, and the third regions being defined by a refractive index and a region size and being present in a mixed manner in a cross section parallel to a thickness direction, the first regions and the second regions have a refractive index at least 0.4 higher than the third regions, the second regions are formed of high-refractive-index particles having an average particle size of 10 nm or more and 100 nm or less, the first regions are formed of the high-refractive-index particles that have been aggregated, the first regions having an equivalent circular diameter of 250 nm or more, and the third regions have an equivalent circular diameter of more than 100 nm.

A film forming method includes forming a film on a substrate, in which the film includes first regions, second regions, and third regions, the first regions, the second regions, and the third regions being defined by a refractive index and a region size and being present in a mixed manner in a cross section parallel to a thickness direction, the first regions and the second regions have a refractive index at least 0.4 higher than the third regions, the second regions are formed of high-refractive-index particles having an average particle size of 10 nm or more and 100 nm or less, the first regions are formed of the high-refractive-index particles that have been aggregated, the first regions having an equivalent circular diameter of 250 nm or more, and the third regions have an equivalent circular diameter of more than 100 nm.

An object of the present invention is to provide an organic semiconductor composition, which makes it possible to obtain an organic semiconductor film having high mobility and being excellent in film uniformity and heat resistance, and a method for manufacturing an organic semiconductor element.

The organic semiconductor composition of the present invention contains an organic semiconductor as Component A and an organic solvent, which is represented by Formula B-1 and has a melting point of equal to or lower than 25° C. and a boiling point of equal to or higher than 150° C. and equal to or lower than 280° C., as Component B, in which an ionization potential of Component A is equal to or higher than 5.1 eV. In the formula, X represents O, S, S═O, O═S═O, or NR, Y.sub.1 to Y.sub.4 each independently represent NR.sub.1 or CR.sub.10R.sub.11, R, R.sub.1, R.sub.10, and R.sub.11 each independently represent a hydrogen atom or a substituent, and n represents 1 or 2.

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An object of the present invention is to provide an organic semiconductor composition, which makes it possible to obtain an organic semiconductor film having high mobility and being excellent in film uniformity and heat resistance, and a method for manufacturing an organic semiconductor element.

The organic semiconductor composition of the present invention contains an organic semiconductor as Component A and an organic solvent, which is represented by Formula B-1 and has a melting point of equal to or lower than 25° C. and a boiling point of equal to or higher than 150° C. and equal to or lower than 280° C., as Component B, in which an ionization potential of Component A is equal to or higher than 5.1 eV. In the formula, X represents O, S, S═O, O═S═O, or NR, Y.sub.1 to Y.sub.4 each independently represent NR.sub.1 or CR.sub.10R.sub.11, R, R.sub.1, R.sub.10, and R.sub.11 each independently represent a hydrogen atom or a substituent, and n represents 1 or 2.

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A white ink includes a hollow resin particle, an organic solvent, an acrylic silicone resin, and water, wherein the acrylic silicone resin has a resin solubility parameter smaller than that of the hollow resin particle.

A white ink includes a hollow resin particle, an organic solvent, an acrylic silicone resin, and water, wherein the acrylic silicone resin has a resin solubility parameter smaller than that of the hollow resin particle.

The present application provides a sublimation ink which is capable of being transferred to natural fiber fabrics, such as cotton and linen, in addition to synthetic fabrics, such as polyester, nylon, etc., and shows significantly improved color fastness. The sublimation ink may include a resin containing at least one active hydrogen, a crosslinking agent having at least two isocyanate (—NCO) groups, and one or more colorants. The sublimation ink may also include one or more carriers, binders, thickeners, and/or solvents. An image can be printed on a transfer medium (e.g. paper) at room temperature with the sublimation ink using conventional offset printer so that the sublimation ink remains inactive. The image can be subsequently transferred onto any desired fabrics under heat and pressure, in which the sublimation ink is activated and bonds the colorant to the fabrics with excellent color effect.

The present application provides a sublimation ink which is capable of being transferred to natural fiber fabrics, such as cotton and linen, in addition to synthetic fabrics, such as polyester, nylon, etc., and shows significantly improved color fastness. The sublimation ink may include a resin containing at least one active hydrogen, a crosslinking agent having at least two isocyanate (—NCO) groups, and one or more colorants. The sublimation ink may also include one or more carriers, binders, thickeners, and/or solvents. An image can be printed on a transfer medium (e.g. paper) at room temperature with the sublimation ink using conventional offset printer so that the sublimation ink remains inactive. The image can be subsequently transferred onto any desired fabrics under heat and pressure, in which the sublimation ink is activated and bonds the colorant to the fabrics with excellent color effect.

An aqueous inkjet ink set for textile printing is disclosed, the aqueous inkjet ink set including two or more aqueous inkjet inks that include a black ink, wherein among the charge density Cd values measured by the streaming potential method for the two or more aqueous inkjet inks, the Cd value (CdK) for the black ink is the highest, and the absolute value of the difference between the Cd value (CdK) for the black ink and the Cd value (Cd2) for the aqueous inkjet ink having the second highest Cd value is 80 μeq/g or greater. A method for producing a printed item is also disclosed.

To provide a photopolymerizable inkjet ink, which contains photopolymerizable monomers containing at least one selected from the following compound group (A) compounds of which are negative for skin sensitization, and at least one selected from the following compound group (B) compounds of which are negative for skin sensitization, wherein the compound group (A) is a compound group consisting of caprolactone-modified dipentaerythritol hexaacrylate, polyethoxylated tetramethylol methane tetraacrylate, ethylene oxide-modified bisphenol A diacrylate, caprolactone-modified hydroxy pivalic acid neopentyl glycol diacrylate, polypropylene glycol diacrylate [CH.sub.2═CH—CO—(OC.sub.3H.sub.6)n-OCOCH═CH.sub.2 (n≈12)], hydroxyethyl acryl amide, trimethylol propane trimethacrylate, and tricyclodecane dimethanol dimethacrylate, and the compound group (B) is a compound group consisting of ethylene oxide-modified phenolacrylate, isostearyl acrylate, ethylene oxide-modified trimethylol propane trimethacrylate, stearyl methacrylate, and glycerin dimethacrylate.