Materials and methods for modifying semiconducting substrate surfaces in order to dramatically change surface energy are provided. Preferred materials include perfluorocarbon molecules or polymers with various functional groups. The functional groups (carboxylic acids, hydroxyls, epoxies, aldehydes, and/or thiols) attach materials to the substrate surface by physical adsorption or chemical bonding, while the perfluorocarbon components contribute to low surface energy. Utilization of the disclosed materials and methods allows rapid transformation of surface properties from hydrophilic to hydrophobic (water contact angle 120° and PGMEA contact angle) 70°. Selective liquiphobic modifications of copper over Si/SiOx, TiOx over Si/SiOx, and SiN over SiOx are also demonstrated.

A fluoroacrylate polymer is used to create a covering or treatment of the edges of decorative panels. A method for manufacturing decorative panels involves using fluoroacrylate polymer as a covering or treatment.

A fluoroacrylate polymer is used to create a covering or treatment of the edges of decorative panels. A method for manufacturing decorative panels involves using fluoroacrylate polymer as a covering or treatment.

A method for forming photoresist patterns and a semiconductor device on which a photoresist pattern manufactured according to the method is formed are disclosed. The method includes forming a preliminary photoresist pattern on a substrate; coating an organic topcoat composition including an acrylic polymer, the acrylic polymer including a structural unit containing a hydroxy group and a fluorine, and an acid compound on the preliminary photoresist pattern; drying and heating the substrate on which the organic topcoat composition is coated to coat it with a topcoat; and spraying a rinse solution including an acetate-based compound on the substrate coated with the topcoat to remove the topcoat.

A method for forming photoresist patterns and a semiconductor device on which a photoresist pattern manufactured according to the method is formed are disclosed. The method includes forming a preliminary photoresist pattern on a substrate; coating an organic topcoat composition including an acrylic polymer, the acrylic polymer including a structural unit containing a hydroxy group and a fluorine, and an acid compound on the preliminary photoresist pattern; drying and heating the substrate on which the organic topcoat composition is coated to coat it with a topcoat; and spraying a rinse solution including an acetate-based compound on the substrate coated with the topcoat to remove the topcoat.

A soft water- and oil-repellent comprising, as an active ingredient, a copolymer of a perfluoropolyether alcohol (meth)acrylic acid derivative represented by the general formula:

CH.sub.2═CR.sub.1COOCH.sub.2CF(CF.sub.3)[OCF.sub.2CF(CF.sub.3)].sub.nOC.sub.3F.sub.7  [I]

(wherein R.sub.1 is a hydrogen atom or a methyl group, and n is an integer of 1 to 20), and a (meth)acrylic acid ester represented by the general formula:

CH.sub.2═CR.sub.1COOR.sub.2  [II]

(wherein R.sub.1 is a hydrogen atom or a methyl group, and R.sub.2 is an alkyl group, an alkoxyalkyl group, a cycloalkyl group, an aryl group, or an aralkyl group) and having a glass transition temperature Tg of 51 to 120° C. The soft water- and oil-repellent gives a coating film formed from a coating agent which closely follows the deformation of rubber or resin, and exhibits water- and oil-repellency.

A soft water- and oil-repellent comprising, as an active ingredient, a copolymer of a perfluoropolyether alcohol (meth)acrylic acid derivative represented by the general formula:

CH.sub.2═CR.sub.1COOCH.sub.2CF(CF.sub.3)[OCF.sub.2CF(CF.sub.3)].sub.nOC.sub.3F.sub.7  [I]

(wherein R.sub.1 is a hydrogen atom or a methyl group, and n is an integer of 1 to 20), and a (meth)acrylic acid ester represented by the general formula:

CH.sub.2═CR.sub.1COOR.sub.2  [II]

(wherein R.sub.1 is a hydrogen atom or a methyl group, and R.sub.2 is an alkyl group, an alkoxyalkyl group, a cycloalkyl group, an aryl group, or an aralkyl group) and having a glass transition temperature Tg of 51 to 120° C. The soft water- and oil-repellent gives a coating film formed from a coating agent which closely follows the deformation of rubber or resin, and exhibits water- and oil-repellency.

A polymer includes: structural units A derived from at least one selected from the group consisting of ethylene and propylene; structural units B represented by a formula (1) below; and structural units C represented by a formula (2) below. In the formula (1), L.sup.16 represents —(CH.sub.2).sub.n—(R.sup.f2O).sub.p—R.sup.f1, R.sup.f1 represents a C.sub.1-15 alkyl group having one or more hydrogen atoms thereof substituted with one or more fluorine atoms, R.sup.f2 represents a C.sub.1-15 alkylene group having one or more hydrogen atoms thereof substituted with one or more fluorine atoms, p represents an integer of 0 to 15, and n represents an integer of 0 to 10. In the formula (2), L.sup.26 represents —(CH.sub.2).sub.n— (R.sup.r2O).sub.q—R.sup.r1, R.sup.r1 represents a hydrogen atom or a C.sub.1-15 alkyl group, R.sup.r2 represents a C.sub.1-15 alkylene group, q represents an integer of 0 to 1000000, and n represents an integer of 0 to 10.

##STR00001##

A first object of the present invention is to provide a composition having excellent coatability. In addition, a second object of the present invention is to provide a composition, a transfer film, a manufacturing method for a laminate, a manufacturing method for a circuit wire, and an electronic device, which are related to the composition.

A composition of the present invention includes a compound A having one or more specific structures selected from the group consisting of (a), (b), and (c), and a resin. (a) a perfluoroalkenyl group, (b) a perfluoropolyether group, and (c) a group represented by General Formula (C1) or General Formula (C2),

*—Cm.sup.+Am.sup.−[-L.sup.m-(Rf).sub.m2].sub.m1  (C1)

*-An.sup.−Cn.sup.+[-L.sup.n-(Rf).sub.n2].sub.n1  (C2)

The present disclosure provides a styrene derivative and a preparation method thereof, and a modified organic silicone resin and a preparation method and use thereof, and belongs to the technical field of back coating solutions. The styrene derivative is specifically 2,3-difluoro-4-methoxystyrene. A fluorine atom is introduced into a benzene ring structure, and the obtained styrene derivative contains a C—F bond with a relatively high chemical bond energy, such that the styrene derivative has a relatively high thermal stability. The styrene derivative can be introduced into an organic silicone resin to make the obtained modified organic silicone resin have a higher thermal stability. The modified organic silicone resin can be used as a back coating solution to effectively improve a heat resistance of barcode thermal transfer ribbons.