C09D133/16

METHOD OF MANUFACTURING ANTIFOULING COATING POLYMER USING INITIATED CHEMICAL VAPOR DEPOSITION

The present disclosure relates to an antifouling coating layer, and in detail, provides a method of manufacturing an antifouling coating layer having excellent antifouling characteristic and durability through quick deposition using iCVD.

Aqueous coating composition

An aqueous coating composition capable of providing coating films with balanced properties of low gloss, high clarity, and good water resistance and alcohol resistance, and a process of making and using such aqueous coating composition.

Aqueous coating composition

An aqueous coating composition capable of providing coating films with balanced properties of low gloss, high clarity, and good water resistance and alcohol resistance, and a process of making and using such aqueous coating composition.

FLUORINATED COUPLING AGENTS AND FLUORINATED (CO)POLYMER LAYERS MADE USING THE SAME

Fluorinated coupling agents and polymerizable compositions including such fluorinated coupling agents and at least one free-radically polymerizable monomer, oligomer, or mixture thereof. Multilayer films including a substrate and at least a first layer overlaying a surface of the substrate also are described, in which the at least first layer includes a (co)polymer obtained by polymerizing the foregoing polymerizable compositions. Processes for making a multilayer film using the polymerizable composition also are taught. Articles including the multilayer film also are disclosed, in which the article preferably is selected from a photovoltaic device, a display device, a solid-state lighting device, a sensor, a medical or biological diagnostic device, an electrochromic device, light control device, or a combination thereof.

FLUORINATED COUPLING AGENTS AND FLUORINATED (CO)POLYMER LAYERS MADE USING THE SAME

Fluorinated coupling agents and polymerizable compositions including such fluorinated coupling agents and at least one free-radically polymerizable monomer, oligomer, or mixture thereof. Multilayer films including a substrate and at least a first layer overlaying a surface of the substrate also are described, in which the at least first layer includes a (co)polymer obtained by polymerizing the foregoing polymerizable compositions. Processes for making a multilayer film using the polymerizable composition also are taught. Articles including the multilayer film also are disclosed, in which the article preferably is selected from a photovoltaic device, a display device, a solid-state lighting device, a sensor, a medical or biological diagnostic device, an electrochromic device, light control device, or a combination thereof.

POLYMERS INCLUDING A METHYLENE BETA-KETOESTER AND PRODUCTS FORMED THEREFROM

The present teachings are directed at 1,1-disubstituted alkene monomers (e.g., methylene beta-ketoester monomers), methods for producing the same, polymerizable compositions including a methylene beta-ketoester monomer, and polymers, compositions and products formed therefrom. The monomer preferably is a high purity monomer. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester may be reacted with a source of formaldehyde. The methylene beta-ketoester monomers may be used in monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).

POLYMERS INCLUDING A METHYLENE BETA-KETOESTER AND PRODUCTS FORMED THEREFROM

The present teachings are directed at 1,1-disubstituted alkene monomers (e.g., methylene beta-ketoester monomers), methods for producing the same, polymerizable compositions including a methylene beta-ketoester monomer, and polymers, compositions and products formed therefrom. The monomer preferably is a high purity monomer. In the method for producing the methylene beta-ketoesters of the invention, a beta-ketoester may be reacted with a source of formaldehyde. The methylene beta-ketoester monomers may be used in monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).

Film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same

A film-forming composition according to the present invention include fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent. ##STR00001##
In the general formula (1), R.sup.1 each independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and R.sup.2 each independently represents C.sub.1-C.sub.15 straight, C.sub.3-C.sub.15 branched or C.sub.3-C.sub.15cyclic fluorine-containing hydrocarbon gr which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

Film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same

A film-forming composition according to the present invention include fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent. ##STR00001##
In the general formula (1), R.sup.1 each independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and R.sup.2 each independently represents C.sub.1-C.sub.15 straight, C.sub.3-C.sub.15 branched or C.sub.3-C.sub.15cyclic fluorine-containing hydrocarbon gr which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

Liquid repellent composition, liquid repellent processing method, and article having liquid repellent film

To provide a liquid repellent composition which is excellent in liquid repellency and durability and an article having a liquid repelling film. A liquid repellent composition comprising a copolymer (I) and a copolymer (II), characterized in that the copolymer (I) containing from 65 to 95 mass % of a polymerized unit (a) (referred to as “[a.sub.1]”) and from 1 to 30 mass % of a polymerized unit (b); and the copolymer (II) containing from 25 to 80 mass % of a polymerized unit (a) (referred to as “[a.sub.2]”) and from 1 to 50 mass % of a polymerized unit (c) are contained in an amount of the copolymer (I)/the copolymer (II)=10/90 to 95/5 (mass ratio), and [a.sub.1]−[a.sub.2]≧10 (mass %).