The present invention provides a polishing composition for use in polishing a material having a Vickers hardness of 1500 Hv or higher. The polishing composition comprises an alumina abrasive and water. The alumina abrasive has an isoelectric point that is below 8.0 and is lower than the pH of the polishing composition.

A slurry for chemical mechanical planarization includes a surfactant, and abrasive particles having an average diameter between 20 and 30 nm and an outer surface of ceria. The abrasive particles are formed using a hydrothermal synthesis process. The abrasive particles are between 0.1 and 3 wt % of the slurry.

The present invention discloses STI CMP polishing compositions, methods and systems that significantly reduce oxide trench dishing and improve over-polishing window stability in addition to provide high and tunable silicon oxide removal rates, low silicon nitride removal rates, and tunable high selectivity of SiO.sub.2:SiN through the use of an unique combination of ceria inorganic oxide particles, such as ceria coated silica particles as abrasives, and an oxide trench dishing reducing additive of poly(methacrylic acids), its derivatives, its salts, or combinations thereof.

Composite particles with lower mean particle size and smaller size distribution are obtained through refining treatments. The refined composite particles, such as ceria coated silica particles are used in Chemical Mechanical Planarization (CMP) compositions to offer higher removal rate; very low within wafer (WWNU) for removal rate, low dishing and low defects for polishing oxide films.

A display device comprises a display panel and a cover plate stacked with the display panel. An antistatic layer is provided on a side of the cover plate facing toward the display panel. The antistatic layer surrounds a display region (AA) of the display device, and the antistatic layer is grounded. The display device can achieve the antistatic protection function without reducing the light transmittance while meeting the requirement of the narrow bazel display device.

A magnetizable abrasive particle. The magnetizable abrasive particle has a ceramic particle having an outer surface; and a continuous metal coating on the outer surface; wherein the core hardness of the ceramic particle is at least 15 GPa; wherein the continuous metal coating comprises a solution phase thermally deposed layer of iron, cobalt or an alloy of iron and cobalt; and wherein the thickness of the continuous metal coating is less than 1000 nm. A method of making the magnetizable abrasive particle is also disclosed.

This invention provides core shell silica particles, wherein each core shell silica particle comprises a silica core, and a surface of the silica core etched with group I metal silicate. These core shell silica particles have high surface charge density and anti-bacterial activity. Also provided are compositions comprising core shell silica particles, process of making the core shell silica particles and methods of reducing or inhibiting bacterial activity by administering the core shell silica particles or compositions thereof.

An abrasive particle having an irregular surface, wherein the surface roughness of the particle is less than about 0.95. A method for producing modified abrasive particles, including providing a plurality of abrasive particles, providing a reactive coating on said particles, heating said coated particles; and recovering modified abrasive particles.

According to one embodiment, a method of making an abrasive article is disclosed. The method can comprise: disposing a layer of a curable composition into a mold having a circular mold cavity with a central hub, wherein the circular mold cavity has an outer circumference and a rotational axis extending through the central hub, and wherein the curable composition is comprised of at least some magnetizable abrasive particles dispersed therein; and varying a magnetic field relative to the curable composition such that a majority of the magnetizable abrasive particles are at least one of oriented and aligned in a non-random manner relative to a surface of the mold; and at least partially curing the curable composition to provide the bonded abrasive article.

The present invention relates to core shell silica particles, wherein each core shell silica particle comprises a silica core, and a surface of the silica core is etched with metal silicate, the core shell silica particles prepared by: i) admixing an amount of silica particles in water with an amount of a base, wherein the base comprises a monovalent metal ion, to produce core shell silica particles, each core shell silica particle comprising a silica core, and a surface of the silica core etched with a silicate of the monovalent metal ion; and ii) reacting the core shell silica particles formed in step i) with a metal salt comprising a second metal ion, to form core shell silica particles comprising silicate of the second metal ion on the surface of the silica core.