A cleaning composition for removing cement-based residues from tiles, such as cementitious grout used for installing flooring and for filling the joints is presented. The composition includes: sulfamic acid, a glycol solvent, and water.

The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.

Systems, methods, apparatus, and articles of manufacture for portable cooling tower cleaning are provided.

The present invention provides a process for the removal of chromium contaminants on a spent ruthenium sputtering target used in Plasma Vapor Deposition by the steps of grit abrasion, organic solvent cleaning, and being subjected to an electric field in an acidic bath including a surfactant, and followed by subsequent water and air rinse and further grit abrasion. Removal of the contaminants is verified by spectroscopy.

A cleaning solution includes a first solvent having Hansen solubility parameters 25>δ.sub.d>13, 25>δ.sub.p>3, and 30>δ.sub.h>4; an acid having an acid dissociation constant, pKa, of −11<pKa<4, or a base having a pKa of 40 > pKa>9.5; and a surfactant. The surfactant is one or more of an ionic surfactant, a polyethylene oxide and a polypropylene oxide, a non-ionic surfactant, and combinations thereof.

A water softener, detergent compositions and co-granulates contain an effervescent agent and pectin. Unit portions contain the co-granulates or compositions. The compositions or co-granulates can be used in a water-soluble and/or water-dispersible water softening, cleaning or detergent formulations, and pectin can be used to stabilize effervescent tablets. The effervescent agent can contain an acidic component such as a tricarboxylic acid, a dicarboxylic acid other than tartaric acid, inorganic acids, and a basic component.

The invention provides an aqueous solution capable of selectively protecting a nitrogen-containing silicon compound from corrosion by a treating solution for etching, cleaning or the like, etching oxygen-containing, carbon-containing silicon in particular, and making a large etch rate difference between a nitrogen-containing silicon compound and an oxygen-containing silicon compound, and a process for producing electronic parts as well. The invention is embodied by a treating solution for electronic parts that is an aqueous solution containing one or two or more of anionic surface active agents represented by the following formulae (1), (2) and (3), and a process for producing an electronic part. ##STR00001## wherein R.sub.1, R.sub.2, and R.sub.3 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, and X.sub.1 stands for a functional group capable of becoming an anionic ion. ##STR00002## wherein R.sub.4 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, X.sub.2 stands for a functional group capable of becoming an anionic ion, and n stands for a natural number of greater than 2. ##STR00003## wherein R.sub.5 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, and X.sub.3, and X.sub.4 stands for a functional group capable of becoming an anionic ion.

Acidic viscoelastic cleaning compositions are disclosed which use non polymer thickening agents. According to the invention, cleaning compositions have been developed using viscoelastic surfactants in acidic cleaning formulations. These provide the dual benefit of thickening as well as an additional cleaning, thereby improving performance. Applicants have also identified several pseudo linking agents which when, used with viscoelastic surfactants provide enhanced viscoelasticity and cleaning.

Compositions including one or more fluorochemical surfactants of the formula: (I) where R.sub.f is a perfluoroalkyl group, each of R.sup.1, R.sup.2 and R.sup.3 are C.sub.1-C.sub.20 alkyl, alkoxy, or aryl; and R.sup.4 is alkylene, arylene of a combination thereof. R.sup.4 is preferably an alkylene of 1-20 carbons that may be cyclic or acyclic, may optionally contain catenated or terminal heteroatoms selected from the group consisting of N, O, and S. Most preferably R.sup.4 is an alkylene of 2-10 carbon atoms. Described are anionic N-substituted fluorinated amine oxide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.

##STR00001##

The disclosure is directed to cleaning compositions, methods of making the cleaning compositions, and methods of using the cleaning compositions. The cleaning compositions comprise an enzyme composition, a nonionic surfactant, and a quaternary amine. Preferably, the enzyme compositions included in the cleaning compositions comprise a cellulase, an AA9 polypeptide having cellulolytic enhancing activity, a hemicellulase, an esterase, an expansin, a laccase, a ligninolytic enzyme, a pectinase, a peroxidase, a protease, a swollenin, or a combination or mixture thereof. The compositions are useful for degradation of bacterial cellulose.