Hard surface rinse aid compositions incorporating surfactant systems compatible with plastics and plastics containing metals, such as aluminum, are disclosed. The hard surface rinse aid compositions are particularly well suited for use in high concentrations at low temperatures without causing foaming and/or debris or film on the treated surface. In particular, the plastic and aluminum-compatible hard surface rinse aid compositions containing a surfactant system combining nonionic alcohol alkoxylates and a polymer surfactant can be used in treating hard surfaces requiring good sheeting, wetting and drying properties. The methods are particularly well suited for rinsing automotive parts, including those needing painting.

A laundry scent additive having polyethylene glycol and perfume. The laundry scent additive enables consumers to control the amount of scent imparted to their laundry.

A laundry scent additive having polyethylene glycol and perfume. The laundry scent additive enables consumers to control the amount of scent imparted to their laundry.

A laundry product comprising; polyethylene glycol having a molecular weight of 2 000 to 30 000; and free oil perfume comprising phenolic aldehyde, characterised in that the composition further comprises at least 1 w.t. % of starch or starch derivative.

A laundry scent additive having polyethylene glycol and perfume. The laundry scent additive enables consumers to control the amount of scent imparted to their laundry.

The present invention relates to 2-(2,4,5-trimethylcyclohex-2-en-1-yl)acetaldehyde and derivatives thereof, to a process for preparing said compounds, to the use of 2-(2,4,5-trimethylcyclohex-2-en-1-yl)acetaldehyde or a specific derivative thereof or of mixtures of said compounds or of a stereoisomer thereof or of a mixture of two or more stereoisomers thereof as aroma chemicals; to the use of 2-(2,4,5-trimethylcyclohex-2-en-1-yl)acetaldehyde or a specific derivative thereof for modifying the scent character of a fragranced composition; to compositions containing 2-(2,4,5-trimethylcyclohex-2-en-1-yl)acetaldehyde or a specific derivative thereof or a mixture of said compounds or a stereoisomer thereof or a mixture of two or more stereoisomers thereof; and to a method of preparing a fragranced composition or for modifying the scent character of a fragranced composition, comprising incorporating 2-(2,4,5-trimethylcyclohex-2-en-1-yl)-acetaldehyde or a specific derivative thereof or a mixture of said compounds or a stereoisomer thereof or a mixture of two or more stereoisomers thereof into said composition.

To provide a substrate pattern filling composition capable of suppressing pattern collapse and a method for using the same. A substrate pattern filling composition comprising a first solute (A), a second a solute (B) and a solvent (C), and a method for using the same.

Microcapsule compositions as disclosed comprising a microcapsule dispersed in an aqueous phase. The microcapsule has a microcapsule core and a microcapsule wall encapsulating the microcapsule core. The microcapsule core contains an active material. The microcapsule wall is formed of a polymeric network comprising a first moiety derived from a protein, and a second moiety derived from a multi-functional electrophile. Also disclosed are preparation methods and consumer products containing the microcapsule compositions.

The present invention relates to personal care compositions comprising malodor reduction compositions and methods of making and using such personal care compositions. Such personal care compositions comprising the malodor control technologies disclosed herein provide malodor control without leaving an undesirable scent and when perfume is used to scent such compositions, such scent is not unduly altered by the malodor control technology.

Provided is a composition for shrinking a photoresist pattern, which is capable of shrinking a photoresist pattern using a photoresist during the fabrication of a semiconductor, and to a method of shrinking a pattern using the composition, whereby a pattern to be formed can be shrunken in a photoresist-patterning process, thus remarkably decreasing the number of steps of a semiconductor fabrication process and reducing the fabrication time and costs.